Ngai; Christopher S.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ngai; Christopher S..The latest application filed is for "film structure for electric field assisted bake process".
Company Profile
7.22.27
- Ngai; Christopher S. - Burlingame CA
- Ngai; Christopher S. - Santa Clara CA
- Ngai; Christopher S - Burlingame CA
Patent Activity
| Patent | Date |
|---|---|
| Contact over active gate structure Grant 11,437,284 - Wang , et al. September 6, 2 | 2022-09-06 |
| Lithography process window enhancement for photoresist patterning Grant 11,429,026 - Dai , et al. August 30, 2 | 2022-08-30 |
| Film Structure For Electric Field Assisted Bake Process App 20220091513 - BANGAR; Mangesh Ashok ; et al. | 2022-03-24 |
| Spin-orbit Torque Mram Structure And Manufacture Thereof App 20210351342 - YUI; Minrui ; et al. | 2021-11-11 |
| Lithography Process Window Enhancement For Photoresist Patterning App 20210294216 - Dai; Huixiong ; et al. | 2021-09-23 |
| Method for forming a layer Grant 10,957,590 - Wang , et al. March 23, 2 | 2021-03-23 |
| Contact over active gate structure Grant 10,930,555 - Wang , et al. February 23, 2 | 2021-02-23 |
| Contact over active gate structure Grant 10,930,556 - Wang , et al. February 23, 2 | 2021-02-23 |
| Film Structure For Electric Field Guided Photoresist Patterning Process App 20200233307 - DAI; Huixiong ; et al. | 2020-07-23 |
| Method For Forming A Layer App 20200161181 - WANG; Wenhui ; et al. | 2020-05-21 |
| Contact Over Active Gate Structure App 20200075422 - Wang; Wenhui ; et al. | 2020-03-05 |
| Contact Over Active Gate Structure App 20200075409 - Wang; Wenhui ; et al. | 2020-03-05 |
| Contact Over Active Gate Structure App 20200075408 - Wang; Wenhui ; et al. | 2020-03-05 |
| PVD Films For EUV Lithography App 20190212656 - Dai; Huixiong ; et al. | 2019-07-11 |
| Surface Treatment For EUV Lithography App 20180135183 - Zeng; Weimin ; et al. | 2018-05-17 |
| Nanocrystalline diamond carbon film for 3D NAND hardmask application Grant 9,865,464 - Chen , et al. January 9, 2 | 2018-01-09 |
| Roll to roll wafer backside particle and contamination removal Grant 9,815,091 - Ngai , et al. November 14, 2 | 2017-11-14 |
| Multi materials and selective removal enabled reverse tone process Grant 9,728,406 - Dai , et al. August 8, 2 | 2017-08-08 |
| Nanocrystaline Diamond Carbon Film For 3d Nand Hardmask Application App 20170062216 - CHEN; Yongmei ; et al. | 2017-03-02 |
| Nanocrystalline diamond carbon film for 3D NAND hardmask application Grant 9,502,262 - Chen , et al. November 22, 2 | 2016-11-22 |
| Method for critical dimension reduction using conformal carbon films Grant 9,337,051 - Mebarki , et al. May 10, 2 | 2016-05-10 |
| Nanocrystaline Diamond Carbon Film For 3d Nand Hardmask Application App 20160064500 - CHEN; Yongmei ; et al. | 2016-03-03 |
| Method For Critical Dimension Reduction Using Conformal Carbon Films App 20160049305 - MEBARKI; Bencherki ; et al. | 2016-02-18 |
| Multi Materials And Selective Removal Enabled Reserve Tone Process App 20160042950 - DAI; Huixiong ; et al. | 2016-02-11 |
| Roll To Roll Wafer Backside Particle And Contamination Removal App 20150371879 - NGAI; Christopher S. ; et al. | 2015-12-24 |
| Line edge roughness reduction and double patterning Grant 8,501,395 - Dai , et al. August 6, 2 | 2013-08-06 |
| Dry Etch Processes App 20130115778 - Xue; Jun ; et al. | 2013-05-09 |
| Semiconductor device having silicon carbide and conductive pathway interface Grant 8,183,150 - Huang , et al. May 22, 2 | 2012-05-22 |
| Self Aligned Triple Patterning App 20120085733 - Mebarki; Bencherki ; et al. | 2012-04-12 |
| Line edge roughness reduction and double patterning App 20090142926 - Dai; Huixiong ; et al. | 2009-06-04 |
| Semiconductor Device Having Silicon Carbide And Conductive Pathway Interface App 20090050902 - Huang; Judy H. ; et al. | 2009-02-26 |
| Method of depositing an amorphous carbon layer Grant 7,335,462 - Fairbairn , et al. February 26, 2 | 2008-02-26 |
| Method of depositing an amorphous carbon layer Grant 7,223,526 - Fairbairn , et al. May 29, 2 | 2007-05-29 |
| Ashable layers for reducing critical dimensions of integrated circuit features Grant 7,105,442 - Shan , et al. September 12, 2 | 2006-09-12 |
| Semiconductor device having silicon carbide and conductive pathway interface App 20050263900 - Huang, Judy H. ; et al. | 2005-12-01 |
| Plasma treatment for copper oxide reduction Grant 6,946,401 - Huang , et al. September 20, 2 | 2005-09-20 |
| Method of depositing an amrphous carbon layer App 20050112509 - Fairbairn, Kevin ; et al. | 2005-05-26 |
| Method of depositing an amorphous carbon layer Grant 6,841,341 - Fairbairn , et al. January 11, 2 | 2005-01-11 |
| Plasma treatment for copper oxide reduction App 20040046260 - Huang, Judy H. ; et al. | 2004-03-11 |
| Semiconductor device having reduced oxidation interface Grant 6,700,202 - Huang , et al. March 2, 2 | 2004-03-02 |
| Method for forming silicon containing layers on a substrate Grant 6,656,840 - Rajagopalan , et al. December 2, 2 | 2003-12-02 |
| Ashable layers for reducing critical dimensions of integrated circuit features App 20030219988 - Shan, Hongqing ; et al. | 2003-11-27 |
| Method For Forming Silicon Containing Layers On A Substrate App 20030203614 - Rajagopalan, Nagarajan ; et al. | 2003-10-30 |
| Method for depositing an amorphous carbon layer Grant 6,573,030 - Fairbairn , et al. June 3, 2 | 2003-06-03 |
| Method of depositing an amorphous carbon layer App 20030091938 - Fairbairn, Kevin ; et al. | 2003-05-15 |
| Apparatus for reducing copper oxidation and contamination in a semiconductor device App 20020081856 - Huang, Judy H. ; et al. | 2002-06-27 |
| Method and apparatus for reducing copper oxidation and contamination in a semiconductor device Grant 6,355,571 - Huang , et al. March 12, 2 | 2002-03-12 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 