Ness; Richard M.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ness; Richard M..The latest application filed is for "laser cutter and safe power system therefor".
Company Profile
0.45.36
- Ness; Richard M. - San Diego CA
- Ness; Richard M. - Poway CA
Patent Activity
| Patent | Date |
|---|---|
| Laser Cutter and Safe Power System Therefor App 20210316394 - Herman; Gregory A. ; et al. | 2021-10-14 |
| 6 KHz and above gas discharge laser system Grant 8,855,166 - Ujazdowski , et al. October 7, 2 | 2014-10-07 |
| 6 Khz And Above Gas Discharge Laser System App 20120120974 - Ujazdowski; Richard C. ; et al. | 2012-05-17 |
| Control system for a two chamber gas discharge laser system Grant RE42,588 - Fallon , et al. August 2, 2 | 2011-08-02 |
| Timing control for two-chamber gas discharge laser system Grant 7,852,899 - Ershov , et al. December 14, 2 | 2010-12-14 |
| Extreme ultraviolet light source App 20100176313 - Melnychuk; Stephan T. ; et al. | 2010-07-15 |
| Gas discharge laser system electrodes and power supply for delivering electrical energy to same Grant 7,706,424 - Amada , et al. April 27, 2 | 2010-04-27 |
| Control system for a two chamber gas discharge laser Grant 7,596,164 - Fallon , et al. September 29, 2 | 2009-09-29 |
| 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements App 20090238225 - Huang; Chaofeng ; et al. | 2009-09-24 |
| Very narrow band, two chamber, high rep-rate gas discharge laser system Grant 7,567,607 - Knowles , et al. July 28, 2 | 2009-07-28 |
| Extreme ultraviolet light source Grant 7,368,741 - Melnychuk , et al. May 6, 2 | 2008-05-06 |
| Extreme ultraviolet light source App 20080023657 - Melnychuk; Stephen T. ; et al. | 2008-01-31 |
| Line selected F.sub.2 two chamber laser system Grant 7,218,661 - Knowles , et al. May 15, 2 | 2007-05-15 |
| Timing control for two-chamber gas discharge laser system Grant 7,203,216 - Ershov , et al. April 10, 2 | 2007-04-10 |
| Gas discharge laser system electrodes and power supply for delivering electrical energy to same App 20070071058 - Amada; Yoshiho ; et al. | 2007-03-29 |
| 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements App 20070071047 - Huang; Chaofeng ; et al. | 2007-03-29 |
| Timing control for two-chamber gas discharge laser system App 20060251135 - Ershov; Alexander I. ; et al. | 2006-11-09 |
| 6 Khz and above gas discharge laser system App 20060222034 - Ujazdowski; Richard C. ; et al. | 2006-10-05 |
| Control system for a two chamber gas discharge laser App 20060209917 - Fallon; John P. ; et al. | 2006-09-21 |
| Control system for a two chamber gas discharge laser Grant 7,079,564 - Fallon , et al. July 18, 2 | 2006-07-18 |
| Very narrow band, two chamber, high rep-rate gas discharge laser system App 20060126697 - Knowles; David S. ; et al. | 2006-06-15 |
| Very narrow band, two chamber, high rep-rate gas discharge laser system Grant 7,061,961 - Knowles , et al. June 13, 2 | 2006-06-13 |
| Line selected F2 two chamber laser system Grant 7,058,107 - Knowles , et al. June 6, 2 | 2006-06-06 |
| Control system for a two chamber gas discharge laser Grant 7,039,086 - Fallon , et al. May 2, 2 | 2006-05-02 |
| Method and apparatus for cooling magnetic circuit elements Grant 7,002,443 - Ness , et al. February 21, 2 | 2006-02-21 |
| Very narrow band, two chamber, high reprate gas discharge laser system Grant 6,985,508 - Knowles , et al. January 10, 2 | 2006-01-10 |
| Very Narrow Band, Two Chamber, High Rep-rate Gas Discharge Laser System App 20050271109 - Knowles, David S. ; et al. | 2005-12-08 |
| Extreme ultraviolet light source Grant 6,972,421 - Melnychuk , et al. December 6, 2 | 2005-12-06 |
| Control system for a two chamber gas discharge laser App 20050265417 - Fallon, John P. ; et al. | 2005-12-01 |
| Extreme ultraviolet light source App 20050230645 - Melnychuk, Stephan T. ; et al. | 2005-10-20 |
| Six to ten KHz, or greater gas discharge laser system Grant 6,914,919 - Watson , et al. July 5, 2 | 2005-07-05 |
| Four KHz gas discharge laser system Grant 6,882,674 - Wittak , et al. April 19, 2 | 2005-04-19 |
| Timing control for two-chamber gas discharge laser system Grant 6,865,210 - Ershov , et al. March 8, 2 | 2005-03-08 |
| Timing control for two-chamber gas discharge laser system App 20050018739 - Ershov, Alexander I. ; et al. | 2005-01-27 |
| Method and apparatus for cooling magnetic circuit elements App 20040264521 - Ness, Richard M. ; et al. | 2004-12-30 |
| Line selected F2 two chamber laser system App 20040258122 - Knowles, David S. ; et al. | 2004-12-23 |
| Plasma focus light source with improved pulse power system Grant 6,815,700 - Melnychuk , et al. November 9, 2 | 2004-11-09 |
| Line selected F2 two chamber laser system Grant 6,801,560 - Knowles , et al. October 5, 2 | 2004-10-05 |
| Line selected F2 two chamber laser system App 20040174919 - Knowles, David S. ; et al. | 2004-09-09 |
| Four KHz gas discharge laser Grant 6,757,316 - Newman , et al. June 29, 2 | 2004-06-29 |
| Extreme ultraviolet light source App 20040108473 - Melnychuk, Stephan T. ; et al. | 2004-06-10 |
| Pulse power system for extreme ultraviolet and x-ray sources Grant 6,744,060 - Ness , et al. June 1, 2 | 2004-06-01 |
| Control system for a two chamber gas discharge laser App 20040057489 - Fallon, John P. ; et al. | 2004-03-25 |
| Very narrow band, two chamber, high reprate gas discharge laser system App 20040047385 - Knowles, David S. ; et al. | 2004-03-11 |
| Control system for a two chamber gas discharge laser Grant 6,690,704 - Fallon , et al. February 10, 2 | 2004-02-10 |
| Very narrow band, two chamber, high rep rate gas discharge laser system Grant 6,625,191 - Knowles , et al. September 23, 2 | 2003-09-23 |
| Injection seeded F2 laser with line selection and discrimination Grant 6,590,922 - Onkels , et al. July 8, 2 | 2003-07-08 |
| Plasma focus light source with active and buffer gas control Grant 6,586,757 - Melnychuk , et al. July 1, 2 | 2003-07-01 |
| Four KHz gas discharge laser system App 20030118072 - Wittak, Christian J. ; et al. | 2003-06-26 |
| Timing control for two-chamber gas discharge laser system App 20030099269 - Ershov, Alexander I. ; et al. | 2003-05-29 |
| Plasma focus light source with improved pulse power system Grant 6,566,667 - Partlo , et al. May 20, 2 | 2003-05-20 |
| Very narrow band, two chamber, high rep rate gas discharge laser system Grant 6,567,450 - Myers , et al. May 20, 2 | 2003-05-20 |
| Plasma focus light source with tandem ellipsoidal mirror units Grant 6,566,668 - Rauch , et al. May 20, 2 | 2003-05-20 |
| Injection seeded laser with precise timing control Grant 6,549,551 - Ness , et al. April 15, 2 | 2003-04-15 |
| Reliable, modular, production quality narrow-band high rep rate F2 laser Grant RE38,054 - Hofmann , et al. April 1, 2 | 2003-04-01 |
| Control system for a two chamber gas discharge laser App 20030031216 - Fallon, John P. ; et al. | 2003-02-13 |
| Six to ten KHz, or greater gas discharge laser system App 20030012234 - Watson, Tom A. ; et al. | 2003-01-16 |
| Plasma focus light source with improved pulse power system App 20030006383 - Melnychuk, Stephan T. ; et al. | 2003-01-09 |
| Injection seeded F2 laser with wavelength control App 20020186739 - Sandstrom, Richard L. ; et al. | 2002-12-12 |
| Pulse power system for extreme ultraviolet and x-ray sources App 20020163313 - Ness, Richard M. ; et al. | 2002-11-07 |
| Line selected F2 two chamber laser system App 20020154671 - Knowles, David S. ; et al. | 2002-10-24 |
| Very narrow band, two chamber, high rep rate gas discharge laser system App 20020154668 - Knowles, David S. ; et al. | 2002-10-24 |
| Extreme repetition rate gas discharge laser Grant 6,442,181 - Oliver , et al. August 27, 2 | 2002-08-27 |
| Injection seeded F2 laser with line selection and discrimination App 20020114370 - Onkels, Eckehard D. ; et al. | 2002-08-22 |
| Injection seeded laser with precise timing control App 20020085606 - Ness, Richard M. ; et al. | 2002-07-04 |
| Very narrow band, two chamber, high rep rate gas discharge laser system App 20020044586 - Myers, David W. ; et al. | 2002-04-18 |
| Four KHz gas discharge laser App 20020021728 - Newman, Peter C. ; et al. | 2002-02-21 |
| Plasma focus light source with active and buffer gas control App 20020014598 - Melnychuk, Stephan T. ; et al. | 2002-02-07 |
| Plasma focus light source with tandem ellipsoidal mirror units App 20020014599 - Rauch, John E. ; et al. | 2002-02-07 |
| Reliable, modular, production quality narrow-band high rep rate ArF excimer laser Grant 6,330,261 - Ishihara , et al. December 11, 2 | 2001-12-11 |
| High pulse rate pulse power system with liquid cooling Grant 6,240,112 - Partlo , et al. May 29, 2 | 2001-05-29 |
| High pulse rate pulse power system with fast rise time and low current Grant 6,151,346 - Partlo , et al. November 21, 2 | 2000-11-21 |
| Reliable modular production quality narrow-band high REP rate excimer laser Grant 6,128,323 - Myers , et al. October 3, 2 | 2000-10-03 |
| High pulse rate pulse power system with resonant power supply Grant 6,028,872 - Partlo , et al. February 22, 2 | 2000-02-22 |
| Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser Grant 6,018,537 - Hofmann , et al. January 25, 2 | 2000-01-25 |
| Magnetic modulator voltage and temperature timing compensation circuit Grant 6,016,325 - Ness , et al. January 18, 2 | 2000-01-18 |
| Reliable. modular, production quality narrow-band KRF excimer laser Grant 5,991,324 - Knowles , et al. November 23, 1 | 1999-11-23 |
| High voltage cable interlock circuit Grant 5,949,806 - Ness , et al. September 7, 1 | 1999-09-07 |
| Current reversal prevention circuit for a pulsed gas discharge laser Grant 5,940,421 - Partlo , et al. August 17, 1 | 1999-08-17 |
| High pulse rate pulse power system Grant 5,936,988 - Partlo , et al. August 10, 1 | 1999-08-10 |
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