Nenyei; Zsolt

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nenyei; Zsolt.The latest application filed is for "method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures".

Company Profile

0.14.8

Nenyei; Zsolt - Blaustein DE
Nenyei; Zsolt - Wippingen DE
Nenyei; Zsolt - Blaustein-Herrlingen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Monitoring witness structures for temperature control in RTP systems Grant 8,575,521 - Nenyei , et al. November 5, 2	2013-11-05
Method And Apparatus For Growing Thin Oxide Films On Silicon While Minimizing Impact On Existing Structures App 20120298039 - PEUSE; Bruce W. ; et al.	2012-11-29
Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures Grant 8,236,706 - Peuse , et al. August 7, 2	2012-08-07
Method and system for thermally processing a plurality of wafer-shaped objects Grant 7,977,258 - Nenyei , et al. July 12, 2	2011-07-12
Method And Apparatus For Growing Thin Oxide Films On Silicon While Minimizing Impact On Existing Structures App 20100151694 - Peuse; Bruce W. ; et al.	2010-06-17
Method for the thermal treatment of disk-shaped substrates Grant 7,704,898 - Nenyei , et al. April 27, 2	2010-04-27
Monitoring Witness Structures for Temperature Control in RTP Systems App 20090242543 - Nenyei; Zsolt ; et al.	2009-10-01
Method for the Thermal Treatment of Disk-Shaped Substrates App 20080311761 - Nenyei; Zsolt ; et al.	2008-12-18
Method and system for thermally processing a plurality of wafer-shaped objects App 20080248657 - Nenyei; Zsolt ; et al.	2008-10-09
Process for the production of a nitrogenous layer a semiconductor or metal surface App 20070117413 - Nenyei; Zsolt	2007-05-24
Method of forming and/or modifying a dielectric film on a semiconductor surface Grant 7,101,812 - Eisele , et al. September 5, 2	2006-09-05
Method for the removing of adsorbed molecules from a chamber Grant 6,830,631 - Nenyei , et al. December 14, 2	2004-12-14
Method of forming and/or modifying a dielectric film on a semiconductor surface App 20040058557 - Eisele, Ignaz ; et al.	2004-03-25
Method for the removing of adsorbed molecules from a chamber App 20030155000 - Nenyei, Zsolt ; et al.	2003-08-21
Method for rapid thermal processing (RTP) of silicon substrates Grant 6,100,149 - Nenyei , et al. August 8, 2	2000-08-08
Apparatus and method for rapid thermal processing Grant 5,872,889 - Kaltenbrunner , et al. February 16, 1	1999-02-16
Method and apparatus for rapid thermal processing Grant 5,861,609 - Kaltenbrunner , et al. January 19, 1	1999-01-19
Method and apparatus for improved temperature control in rapid thermal processing (RTP) systems Grant 5,841,110 - Nenyei , et al. November 24, 1	1998-11-24
Apparatus and method for rapid thermal processing Grant 5,837,555 - Kaltenbrunner , et al. November 17, 1	1998-11-17
Method and apparatus for wavevector selective pyrometry in rapid thermal processing systems Grant 5,628,564 - Nenyei , et al. May 13, 1	1997-05-13
Method and apparatus for a rapid thermal processing of delicate components Grant 5,359,693 - Nenyei , et al. October 25, 1	1994-10-25

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