Nemani; Srinivas

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nemani; Srinivas.The latest application filed is for "process chamber for etching low k and other dielectric films".

Company Profile

9.32.40

Nemani; Srinivas - Sunnyvale CA
Nemani; Srinivas - Santa Clara CA
Nemani; Srinivas - San Jose CA
Nemani; Srinivas - Milpitas CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process chamber for etching low k and other dielectric films Grant 11,410,860 - Lubomirsky , et al. August 9, 2	2022-08-09
Gas abatement apparatus Grant 11,110,383 - Khan , et al. September 7, 2	2021-09-07
Process Chamber For Etching Low K And Other Dielectric Films App 20210134618 - Lubomirsky; Dmitry ; et al.	2021-05-06
Residual removal Grant 10,964,527 - Kim , et al. March 30, 2	2021-03-30
Method and system for three-dimensional (3D) structure fill Grant 10,943,779 - Yieh , et al. March 9, 2	2021-03-09
Process chamber for etching low K and other dielectric films Grant 10,923,367 - Lubomirsky , et al. February 16, 2	2021-02-16
Gas Abatement Apparatus App 20200368666 - KHAN; Adib ; et al.	2020-11-26
Selective oxidation for 3D device isolation Grant 10,790,183 - Sun , et al. September 29, 2	2020-09-29
Gas abatement apparatus Grant 10,675,581 - Khan , et al.	2020-06-09
Gas Abatement Apparatus App 20200038797 - KHAN; Adib ; et al.	2020-02-06
Method and apparatus for backside cleaning of substrates Grant 10,549,324 - Thirunavukarasu , et al. Fe	2020-02-04
Residual Removal App 20190393024 - KIM; Jong Mun ; et al.	2019-12-26
Selective Oxidation For 3d Device Isolation App 20190371650 - SUN; Shiyu ; et al.	2019-12-05
Selective deposition of metal silicides Grant 10,475,655 - Hung , et al. Nov	2019-11-12
Process Chamber For Etching Low K And Other Dielectric Films App 20180358244 - LUBOMIRSKY; Dmitry ; et al.	2018-12-13
Selective Deposition Of Metal Silicides App 20180342395 - HUNG; Raymond ; et al.	2018-11-29
Process chamber for etching low K and other dielectric films Grant 10,096,496 - Lubomirsky , et al. October 9, 2	2018-10-09
Pulsed plasma for film deposition Grant 10,096,466 - Xue , et al. October 9, 2	2018-10-09
Method And Apparatus For Backside Cleaning Of Substrates App 20180257116 - THIRUNAVUKARASU; SRISKANTHARAJAH ; et al.	2018-09-13
Method of etching a porous dielectric material Grant 10,062,602 - Posseme , et al. August 28, 2	2018-08-28
Selective Etch Using Material Modification And Rf Pulsing App 20180082861 - Citla; Bhargav ; et al.	2018-03-22
Low-temperature Atomic Layer Deposition Of Boron Nitride And Bn Structures App 20180040476 - WOLF; Steven ; et al.	2018-02-08
Selective etch using material modification and RF pulsing Grant 9,865,484 - Citla , et al. January 9, 2	2018-01-09
Selective Etch Using Material Modification And Rf Pulsing App 20180005850 - Citla; Bhargav ; et al.	2018-01-04
Process Chamber For Etching Low K And Other Dielectric Films App 20170229325 - LUBOMIRSKY; Dmitry ; et al.	2017-08-10
Process chamber for etching low k and other dielectric films Grant 9,666,414 - Lubomirsky , et al. May 30, 2	2017-05-30
Method And System For Three-dimensional (3d) Structure Fill App 20170069488 - Yieh; Ellie ; et al.	2017-03-09
Method for forming spacers for a transistor gate Grant 9,583,339 - Posseme , et al. February 28, 2	2017-02-28
Method and system for three-dimensional (3D) structure fill Grant 9,530,674 - Yieh , et al. December 27, 2	2016-12-27
Method For Forming Spacers For A Transistor Gate App 20160300709 - POSSEME; Nicolas ; et al.	2016-10-13
Pulsed Plasma For Film Deposition App 20160276150 - Xue; Jun ; et al.	2016-09-22
Semiconductor System Assemblies And Methods Of Operation App 20160217981 - Nguyen; Andrew ; et al.	2016-07-28
Semiconductor system assemblies and methods of operation Grant 9,287,095 - Nguyen , et al. March 15, 2	2016-03-15
Technique for forming a FinFET device using selective ion implantation Grant 9,190,498 - Brand , et al. November 17, 2	2015-11-17
Semiconductor System Assemblies And Methods Of Operation App 20150170879 - Nguyen; Andrew ; et al.	2015-06-18
Semiconductor System Assemblies And Methods Of Operation App 20150170924 - Nguyen; Andrew ; et al.	2015-06-18
Semiconductor System Assemblies And Methods Of Operation App 20150170943 - Nguyen; Andrew ; et al.	2015-06-18
Pattern Formation And Transfer Directly On Silicon Based Films App 20150132959 - TEDESCHI; Leonard ; et al.	2015-05-14
Method And System For Three-dimensional (3d) Structure Fill App 20150093907 - YIEH; Ellie ; et al.	2015-04-02
Method Of Depositing Thin Metal-organic Films App 20150079301 - NEMANI; Srinivas ; et al.	2015-03-19
Three-dimensional (3d) Processing And Printing With Plasma Sources App 20150042017 - RAMASWAMY; Kartik ; et al.	2015-02-12
Method For Forming Spacers For A Transitor Gate App 20140187046 - POSSEME; Nicolas ; et al.	2014-07-03
Method Of Etching A Porous Dielectric Material App 20140187035 - POSSEME; Nicolas ; et al.	2014-07-03
Technique For Forming A FinFET Device App 20140080276 - Brand; Adam ; et al.	2014-03-20
Process Chamber For Etching Low K And Other Dielectric Films App 20130105303 - LUBOMIRSKY; Dmitry ; et al.	2013-05-02
Dielectric Gap Fill With Oxide Selectively Deposited Over Silicon Liner App 20070087522 - Nemani; Srinivas ; et al.	2007-04-19
Method of depositing low dielectric constant silicon carbide layers Grant 7,200,460 - Campana , et al. April 3, 2	2007-04-03
Dielectric gap fill with oxide selectively deposited over silicon liner Grant 7,176,105 - Nemani , et al. February 13, 2	2007-02-13
Dielectric gap fill with oxide selectively deposited over silicon liner App 20050266655 - Nemani, Srinivas ; et al.	2005-12-01
Method of depositing low dielectric constant silicon carbide layers Grant 6,855,484 - Campana , et al. February 15, 2	2005-02-15
Method of depositing low dielectric constant silicon carbide layers App 20030148223 - Campana, Francimar ; et al.	2003-08-07
Method of depositing low dielectric constant silicon carbide layers App 20030148020 - Campana, Francimar ; et al.	2003-08-07
Method of depositing low dielectric constant silicon carbide layers Grant 6,537,733 - Campana , et al. March 25, 2	2003-03-25
Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers App 20030008069 - Nemani, Srinivas ; et al.	2003-01-09
Deposition of silicon oxide films App 20020155730 - Mukai, Kevin ; et al.	2002-10-24
Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers Grant 6,465,366 - Nemani , et al. October 15, 2	2002-10-15
Plasma treatment of organosilicate layers App 20020142104 - Nemani, Srinivas ; et al.	2002-10-03
Method of depositing low dielectric constant silicon carbide layers App 20020119250 - Campana, Francimar ; et al.	2002-08-29
Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound Grant 6,413,583 - Moghadam , et al. July 2, 2	2002-07-02
Methods and apparatus for gettering fluorine from chamber material surfaces Grant 6,347,636 - Xia , et al. February 19, 2	2002-02-19
Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions Grant 6,348,099 - Xia , et al. February 19, 2	2002-02-19
Methods for shallow trench isolation Grant 6,114,216 - Yieh , et al. September 5, 2	2000-09-05
Throttle valve providing enhanced cleaning Grant 6,090,206 - Bang , et al. July 18, 2	2000-07-18
Methods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions Grant 5,963,840 - Xia , et al. October 5, 1	1999-10-05
Method and apparatus for gettering fluorine from chamber material surfaces Grant 5,935,340 - Xia , et al. August 10, 1	1999-08-10
Methods and apparatus for cleaning surfaces in a substrate processing system Grant 5,812,403 - Fong , et al. September 22, 1	1998-09-22