Neefs; Patricius Jacobus
Patent Applications and Registrations
Patent applications and USPTO patent grants for Neefs; Patricius Jacobus.The latest application filed is for "a method and system for determining overlay".
- Neefs; Patricius Jacobus - Raamsdonksveer NL
| Patent | Date |
|---|---|
| Lithographic apparatus and an object positioning system Grant RE49,142 - Koevoets , et al. July 19, 2 | 2022-07-19 |
| A Method And System For Determining Overlay App 20220171299 - BLOKS; Ruud Hendrikus Martinus Johannes ; et al. | 2022-06-02 |
| Lithography apparatus and a method of manufacturing a device Grant 10,534,271 - Hoefnagels , et al. Ja | 2020-01-14 |
| Measurement substrate and a measurement method Grant 10,508,896 - Nihtianov , et al. Dec | 2019-12-17 |
| Lithography Apparatus And A Method Of Manufacturing A Device App 20190361357 - HOEFNAGELS; Pieter Jeroen Johan Emanuel ; et al. | 2019-11-28 |
| Lithographic apparatus and an object positioning system Grant 9,939,738 - Koevoets , et al. April 10, 2 | 2018-04-10 |
| A Lithographic Apparatus And An Object Positioning System App 20170212429 - KOEVOETS; Adrianus Hendrik ; et al. | 2017-07-27 |
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