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Patent applications and USPTO patent grants for Neal; Michelle Lynn.The latest application filed is for "plasma enhanced chemical vapor deposition (pecvd) source".
Patent | Date |
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Plasma enhanced chemical vapor deposition (PECVD) source Grant 9,406,487 - Crowley , et al. August 2, 2 | 2016-08-02 |
Plasma Enhanced Chemical Vapor Deposition (pecvd) Source App 20140184073 - Crowley; Daniel Theodore ;   et al. | 2014-07-03 |
Rotary Cathodes For Magnetron Sputtering System App 20130032476 - Crowley; Daniel Theodore ;   et al. | 2013-02-07 |
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