loadpatents
name:-0.0091571807861328
name:-0.0048551559448242
name:-0.001115083694458
Navala; Sergiy Yakovlevich Patent Filings

Navala; Sergiy Yakovlevich

Patent Applications and Registrations

Patent applications and USPTO patent grants for Navala; Sergiy Yakovlevich.The latest application filed is for "plasma generating apparatus and plasma processing apparatus".

Company Profile
0.4.6
  • Navala; Sergiy Yakovlevich - Gyeonggi-do KR
  • Navala; Sergiy Yakovlevich - Suwon KR
  • Navala; Sergiy Yakovlevich - Suwon-si KR
  • Navala, Sergiy Yakovlevich - Suwon-city KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Ionized physical vapor deposition apparatus using helical self-resonant coil
Grant 7,404,879 - Tolmachev , et al. July 29, 2
2008-07-29
Gas injection apparatus for semiconductor processing system
Grant 7,252,716 - Kim , et al. August 7, 2
2007-08-07
High-density plasma processing apparatus
Grant 7,210,424 - Tolmachev , et al. May 1, 2
2007-05-01
Magnetron cathode and magnetron sputtering apparatus comprising the same
Grant 7,052,583 - Navala , et al. May 30, 2
2006-05-30
Plasma generating apparatus and plasma processing apparatus
App 20050173069 - Tolmachev, Yuri Nikolaevich ;   et al.
2005-08-11
Ionized physical vapor deposition apparatus using helical self-resonant coil
App 20050103623 - Tolmachev, Yuri Nikolaevich ;   et al.
2005-05-19
High-density plasma processing apparatus
App 20040261720 - Tolmachev, Yuri Nikolaevich ;   et al.
2004-12-30
Magnetron cathode and magnetron sputtering apparatus comprising the same
App 20040140204 - Navala, Sergiy Yakovlevich ;   et al.
2004-07-22
Gas injection apparatus for semiconductor processing system
App 20040099378 - Kim, Tae-Wan ;   et al.
2004-05-27
Magnetron sputtering apparatus and magnetron sputtering method using the same
App 20040094412 - Navala, Sergiy Yakovlevich ;   et al.
2004-05-20

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