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Patent applications and USPTO patent grants for Navala; Sergiy Yakovlevich.The latest application filed is for "plasma generating apparatus and plasma processing apparatus".
Patent | Date |
---|---|
Ionized physical vapor deposition apparatus using helical self-resonant coil Grant 7,404,879 - Tolmachev , et al. July 29, 2 | 2008-07-29 |
Gas injection apparatus for semiconductor processing system Grant 7,252,716 - Kim , et al. August 7, 2 | 2007-08-07 |
High-density plasma processing apparatus Grant 7,210,424 - Tolmachev , et al. May 1, 2 | 2007-05-01 |
Magnetron cathode and magnetron sputtering apparatus comprising the same Grant 7,052,583 - Navala , et al. May 30, 2 | 2006-05-30 |
Plasma generating apparatus and plasma processing apparatus App 20050173069 - Tolmachev, Yuri Nikolaevich ;   et al. | 2005-08-11 |
Ionized physical vapor deposition apparatus using helical self-resonant coil App 20050103623 - Tolmachev, Yuri Nikolaevich ;   et al. | 2005-05-19 |
High-density plasma processing apparatus App 20040261720 - Tolmachev, Yuri Nikolaevich ;   et al. | 2004-12-30 |
Magnetron cathode and magnetron sputtering apparatus comprising the same App 20040140204 - Navala, Sergiy Yakovlevich ;   et al. | 2004-07-22 |
Gas injection apparatus for semiconductor processing system App 20040099378 - Kim, Tae-Wan ;   et al. | 2004-05-27 |
Magnetron sputtering apparatus and magnetron sputtering method using the same App 20040094412 - Navala, Sergiy Yakovlevich ;   et al. | 2004-05-20 |
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