Natsuaki; Nobuyoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Natsuaki; Nobuyoshi.The latest application filed is for "method for fabricating semiconductor intergrated circuit device".

Company Profile

0.30.20

Natsuaki; Nobuyoshi - Higashiyamato JP
Natsuaki; Nobuyoshi - Tokyo JP
Natsuaki; Nobuyoshi - Higashiyamato-shi Tokyo JP
Natsuaki; Nobuyoshi - Kodaira JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for fabricating semiconductor integrated circuit device Grant 7,799,690 - Tanabe , et al. September 21, 2	2010-09-21
Method for fabricating semiconductor intergrated circuit device App 20080045027 - Tanabe; Yoshikazu ; et al.	2008-02-21
Method for fabricating semiconductor integrated circuit device Grant 7,250,376 - Tanabe , et al. July 31, 2	2007-07-31
Fabrication process of a semiconductor integrated circuit device Grant 7,122,469 - Tanabe , et al. October 17, 2	2006-10-17
Method for fabricating semiconductor integrated circuit device Grant 7,053,007 - Tanabe , et al. May 30, 2	2006-05-30
Method for fabricating semiconductor integrated circuit device Grant 7,008,880 - Tanabe , et al. March 7, 2	2006-03-07
Fabrication process of a semiconductor integrated circuit device Grant 6,987,069 - Tanabe , et al. January 17, 2	2006-01-17
Fabrication process of a semiconductor integrated circuit device App 20050266630 - Tanabe, Yoshikazu ; et al.	2005-12-01
Method for fabricating semiconductor integrated circuit device Grant 6,962,880 - Tanabe , et al. November 8, 2	2005-11-08
Method for fabricating semiconductor integrated circuit device Grant 6,962,881 - Tanabe , et al. November 8, 2	2005-11-08
Method for fabricating semiconductor integrated circuit device App 20050227501 - Tanabe, Yoshikazu ; et al.	2005-10-13
Method for fabricating semiconductor integrated circuit device App 20050208731 - Tanabe, Yoshikazu ; et al.	2005-09-22
Method for fabricating semiconductor integrated circuit device Grant 6,855,642 - Tanabe , et al. February 15, 2	2005-02-15
Fabrication process of a semiconductor integrated circuit device App 20040198067 - Tanabe, Yoshikazu ; et al.	2004-10-07
Fabrication process of a semiconductor integrated circuit device Grant 6,784,116 - Tanabe , et al. August 31, 2	2004-08-31
Method for fabricating semiconductor integrated circuit device App 20040161945 - Tanabe, Yoshikazu ; et al.	2004-08-19
Method for fabricating semiconductor intergrated circuit device App 20040157467 - Tanabe, Yoshikazu ; et al.	2004-08-12
Method for fabricating semiconductor integrated circuit device App 20040157468 - Tanabe, Yoshikazu ; et al.	2004-08-12
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process Grant 6,723,665 - Tanabe , et al. April 20, 2	2004-04-20
Method for fabricating semiconductor integrated circuit device App 20030219995 - Tanabe, Yoshikazu ; et al.	2003-11-27
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process App 20030203646 - Tanabe, Yoshikazu ; et al.	2003-10-30
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process Grant 6,602,808 - Tanabe , et al. August 5, 2	2003-08-05
Fabrication process of a semiconductor integrated circuit device App 20030143864 - Tanabe, Yoshikazu ; et al.	2003-07-31
Method for fabricating semiconductor integrated circuit device Grant 6,596,650 - Tanabe , et al. July 22, 2	2003-07-22
Method for fabricating semiconductor integrated circuit device Grant 6,569,780 - Tanabe , et al. May 27, 2	2003-05-27
Fabrication process of a semiconductor integrated circuit device Grant 6,528,403 - Tanabe , et al. March 4, 2	2003-03-04
Fabrication process of a semiconductor integrated circuit device Grant 6,503,819 - Tanabe , et al. January 7, 2	2003-01-07
Method for fabricating semiconductor integrated circuit device Grant 6,417,114 - Tanabe , et al. July 9, 2	2002-07-09
Fabrication process of a semiconductor integrated circuit device App 20020048967 - Tanabe, Yoshikazu ; et al.	2002-04-25
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process App 20020042211 - Tanabe, Yoshikazu ; et al.	2002-04-11
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process App 20020019149 - Tanabe, Yoshikazu ; et al.	2002-02-14
Method for fabricating semiconductor integrated circuit device App 20020009898 - Tanabe, Yoshikazu ; et al.	2002-01-24
Method for fabricating semiconductor integrated circuit device App 20020004315 - Tanabe, Yoshikazu ; et al.	2002-01-10
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process Grant 6,319,860 - Tanabe , et al. November 20, 2	2001-11-20
Fabrication process of a semiconductor integrated circuit device App 20010024870 - Tanabe, Yoshikazu ; et al.	2001-09-27
Method for fabricating semiconductor integrated circuit device App 20010010975 - Tanabe, Yoshikazu ; et al.	2001-08-02
Method for fabricating semiconductor integrated circuit device App 20010009813 - Tanabe, Yoshikazu ; et al.	2001-07-26
Method for fabricating semiconductor integrated circuit device App 20010006853 - Tanabe, Yoshikazu ; et al.	2001-07-05
Method for fabricating semiconductor integrated circuit device Grant 6,239,041 - Tanabe , et al. May 29, 2	2001-05-29
Fabrication process of a semiconductor integrated circuit device Grant 6,197,702 - Tanabe , et al. March 6, 2	2001-03-06
Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process Grant 6,066,508 - Tanabe , et al. May 23, 2	2000-05-23
Method of manufacturing an improved SOI (silicon-on-insulator) semiconductor integrated circuit device Grant 6,063,686 - Masuda , et al. May 16, 2	2000-05-16
Semiconductor device having a PN junction formed on an insulator film Grant 4,819,055 - Nakazato , et al. April 4, 1	1989-04-04
SOI process for forming a thin film transistor using solid phase epitaxy Grant 4,808,546 - Moniwa , et al. February 28, 1	1989-02-28
Method of fabricating a semiconductor device including selective etching of a silicide layer Grant 4,742,025 - Ohyu , et al. May 3, 1	1988-05-03
Method of forming twin doped regions of the same depth by high energy implant Grant 4,729,964 - Natsuaki , et al. March 8, 1	1988-03-08
Ion implantation process Grant 4,655,875 - Wada , et al. April 7, 1	1987-04-07
Method of producing single crystal film utilizing a two-step heat treatment Grant 4,565,584 - Tamura , et al. January 21, 1	1986-01-21
Method of manufacturing single-crystal film Grant 4,498,951 - Tamura , et al. February 12, 1	1985-02-12
Method of producing a semiconductor device Grant 4,351,674 - Yoshida , et al. September 28, 1	1982-09-28

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