NARIMATSU; Koichiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for NARIMATSU; Koichiro.The latest application filed is for "fluctuation amount estimation device in machine tool and correction amount calculation device".

Company Profile

0.9.6

NARIMATSU; Koichiro - Nara JP
Narimatsu; Koichiro - Hyogo JP
Narimatsu; Koichiro - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fluctuation Amount Estimation Device In Machine Tool And Correction Amount Calculation Device App 20220197242 - NARIMATSU; Koichiro ; et al.	2022-06-23
Thermal Displacement Correction Method For Machine Tool App 20210405608 - IRINO; Naruhiro ; et al.	2021-12-30
Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method Grant 6,943,458 - Narimatsu September 13, 2	2005-09-13
Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof Grant 6,849,957 - Takeuchi , et al. February 1, 2	2005-02-01
Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method App 20040004297 - Narimatsu, Koichiro	2004-01-08
Semiconductor device having a plurality of capacitors aligned at regular intervals Grant 6,667,505 - Narimatsu , et al. December 23, 2	2003-12-23
Antireflection coating and semiconductor device manufacturing method Grant 6,607,992 - Tsujita , et al. August 19, 2	2003-08-19
Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method Grant 6,596,603 - Narimatsu July 22, 2	2003-07-22
Semiconductor device and manufacturing method thereof App 20030001180 - Narimatsu, Koichiro ; et al.	2003-01-02
Antireflection coating and semiconductor device manufacturing method App 20020123245 - Tsujita, Kouichirou ; et al.	2002-09-05
Photomask including auxiliary mark area, semiconductor device and manufacturing method thereof App 20010048145 - Takeuchi, Masahiko ; et al.	2001-12-06
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof Grant 6,323,560 - Narimatsu , et al. November 27, 2	2001-11-27
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof Grant 6,068,952 - Narimatsu , et al. May 30, 2	2000-05-30
Step and scan exposure system and semiconductor device manufactured using said system Grant 5,991,007 - Narimatsu November 23, 1	1999-11-23
Registration accuracy measurement mark for semiconductor devices Grant 5,646,452 - Narimatsu July 8, 1	1997-07-08

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