Narendrnath; Kadthala Ramaya
Patent Applications and Registrations
Patent applications and USPTO patent grants for Narendrnath; Kadthala Ramaya.The latest application filed is for "window in thin polishing pad".
- Narendrnath; Kadthala Ramaya - San Jose CA
| Patent | Date |
|---|---|
| Edge ring for a substrate processing chamber Grant 11,417,561 - Raj , et al. August 16, 2 | 2022-08-16 |
| Window In Thin Polishing Pad App 20220023990 - Hu; Yongqi ; et al. | 2022-01-27 |
| Electrostatic chuck optimized for refurbishment Grant 11,179,965 - Parkhe , et al. November 23, 2 | 2021-11-23 |
| Window in thin polishing pad Grant 11,161,218 - Hu , et al. November 2, 2 | 2021-11-02 |
| Printing Chemical Mechanical Polishing Pad Having Window Or Controlled Porosity App 20210245322 - Murugesh; Laxman ; et al. | 2021-08-12 |
| Method of Making Carrier Head Membrane With Regions of Different Roughness App 20210245323 - Paik; Young J. ; et al. | 2021-08-12 |
| Carrier head membrane with regions of different roughness Grant 11,007,619 - Paik , et al. May 18, 2 | 2021-05-18 |
| Edge Ring For A Substrate Processing Chamber App 20200161165 - RAJ; Govinda ; et al. | 2020-05-21 |
| Window in Thin Polishing Pad App 20190152017 - Hu; Yongqi ; et al. | 2019-05-23 |
| Carrier Head Membrane With Regions of Different Roughness App 20190118336 - Paik; Young J. ; et al. | 2019-04-25 |
| Method of placing window in thin polishing pad Grant 10,213,894 - Hu , et al. Feb | 2019-02-26 |
| Carrier head membrane roughness to control polishing rate Grant 10,160,093 - Paik , et al. Dec | 2018-12-25 |
| Methods for bonding substrates Grant 10,131,126 - Narendrnath , et al. November 20, 2 | 2018-11-20 |
| Electrostatic Chuck Optimized For Refurbishment App 20180319205 - Parkhe; Vijay D. ; et al. | 2018-11-08 |
| Printing Chemical Mechanical Polishing Pad Having Window Or Controlled Porosity App 20180236632 - Murugesh; Laxman ; et al. | 2018-08-23 |
| Electrostatic chuck optimized for refurbishment Grant 10,056,284 - Parkhe , et al. August 21, 2 | 2018-08-21 |
| Printed chemical mechanical polishing pad having printed window Grant 9,993,907 - Murugesh , et al. June 12, 2 | 2018-06-12 |
| Substrate Support Assembly App 20170345691 - Parkhe; Vijay D. ; et al. | 2017-11-30 |
| Substrate Support Assembly Having Metal Bonded Protective Layer App 20170271179 - Parkhe; Vijay D. ; et al. | 2017-09-21 |
| Window In Thin Polishing Pad App 20170246722 - Hu; Yongqi ; et al. | 2017-08-31 |
| Electrostatic Chuck Optimized For Refurbishment App 20170250101 - Parkhe; Vijay D. ; et al. | 2017-08-31 |
| Methods For Bonding Substrates App 20170173934 - NARENDRNATH; Kadthala Ramaya ; et al. | 2017-06-22 |
| Substrate support assembly having metal bonded protective layer Grant 9,685,356 - Parkhe , et al. June 20, 2 | 2017-06-20 |
| Electrostatic chuck refurbishment Grant 9,669,653 - Parkhe , et al. June 6, 2 | 2017-06-06 |
| Methods for bonding substrates Grant 9,627,231 - Narendrnath , et al. April 18, 2 | 2017-04-18 |
| Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing Grant 9,202,736 - Narendrnath , et al. December 1, 2 | 2015-12-01 |
| Printed Chemical Mechanical Polishing Pad Having Controlled Porosity App 20150174826 - Murugesh; Laxman ; et al. | 2015-06-25 |
| Electrostatic Chuck Refurbishment App 20140263176 - Parkhe; Vijay D. ; et al. | 2014-09-18 |
| Substrate Support Assembly Having Metal Bonded Protective Layer App 20140159325 - Parkhe; Vijay D. ; et al. | 2014-06-12 |
| Methods For Bonding Substrates App 20140099485 - NARENDRNATH; Kadthala Ramaya ; et al. | 2014-04-10 |
| Leak proof pad for CMP endpoint detection Grant 8,662,957 - Paik , et al. March 4, 2 | 2014-03-04 |
| Carrier head membrane Grant 8,475,231 - Paik , et al. July 2, 2 | 2013-07-02 |
| Chemical Mechanical Planarization Pad With Surface Characteristics App 20110105000 - Hu; Yongqi ; et al. | 2011-05-05 |
| Leak Proof Pad For Cmp Endpoint Detection App 20100330879 - Paik; Young J. ; et al. | 2010-12-30 |
| Carrier Head Membrane App 20100311311 - Paik; Young J. ; et al. | 2010-12-09 |
| Carrier Head Membrane Roughness to Control Polishing Rate App 20100173566 - Paik; Young J. ; et al. | 2010-07-08 |
| Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing App 20090034147 - Narendrnath; Kadthala Ramaya ; et al. | 2009-02-05 |
| Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing App 20090034149 - Lubomirsky; Dmitry ; et al. | 2009-02-05 |
| Method of making an electrostatic chuck with reduced plasma penetration and arcing App 20090034148 - Lubomirsky; Dmitry ; et al. | 2009-02-05 |
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