| Patent | Date |
|---|
High flow velocity, gas-purged, side storage pod apparatus, assemblies, and methods
Grant 11,244,844 - Reuter , et al. February 8, 2 | 2022-02-08 |
Oxidation Inhibiting Gas In A Manufacturing System
App 20210257233 - Narasimhan; Murali ; et al. | 2021-08-19 |
Side Storage Pods, Equipment Front End Modules, And Methods For Operating Equipment Front End Modules
App 20200135499 - Pannese; Patrick ; et al. | 2020-04-30 |
High Flow Velocity, Gas-purged, Side Storage Pod Apparatus, Assemblies, And Methods
App 20200135521 - Reuter; Paul B. ; et al. | 2020-04-30 |
BEOL interconnect with carbon nanotubes
Grant 9,305,838 - Narwankar , et al. April 5, 2 | 2016-04-05 |
BEOL Interconnect With Carbon Nanotubes
App 20130228933 - Narwankar; Pravin K. ; et al. | 2013-09-05 |
Methods For Contact Clean
App 20120225558 - CHANG; MEI ; et al. | 2012-09-06 |
Method and apparatus of forming a sputtered doped seed layer
App 20020182887 - Pavate, Vikram ; et al. | 2002-12-05 |
Method and apparatus of forming a sputtered doped seed layer
Grant 6,432,819 - Pavate , et al. August 13, 2 | 2002-08-13 |
Adhesion of diffusion barrier and fluorinated silicon dioxide using hydrogen based preclean technology
App 20020102365 - Narasimhan, Murali ; et al. | 2002-08-01 |
Method of metallization using a nickel-vanadium layer
App 20020093101 - Iyer, Subramoney ; et al. | 2002-07-18 |
Method of enhancing hardness of sputter deposited copper films
App 20020088716 - Pavate, Vikram ; et al. | 2002-07-11 |
Method of enhancing hardness of sputter deposited copper films
Grant 6,391,163 - Pavate , et al. May 21, 2 | 2002-05-21 |
Coil for sputter deposition
App 20020047116 - Pavate, Vikram ; et al. | 2002-04-25 |
Method of improving adhesion of diffusion layers on fluorinated silicon dioxide
Grant 6,372,301 - Narasimhan , et al. April 16, 2 | 2002-04-16 |
Method for manufacturing metal sputtering target for use in DC magnetron so that target has reduced number of conduction anomalies
Grant 6,228,186 - Pavate , et al. May 8, 2 | 2001-05-08 |
Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
Grant 6,171,455 - Pavate , et al. January 9, 2 | 2001-01-09 |
Copper target for sputter deposition
Grant 6,139,701 - Pavate , et al. October 31, 2 | 2000-10-31 |
Shield to prevent cryopump charcoal array from shedding during cryo-regeneration
Grant 6,122,921 - Brezoczky , et al. September 26, 2 | 2000-09-26 |
Pedestal insulator for a pre-clean chamber
Grant 6,077,353 - Al-Sharif , et al. June 20, 2 | 2000-06-20 |
Adjustment of deposition uniformity in an inductively coupled plasma source
Grant 6,042,700 - Gopalraja , et al. March 28, 2 | 2000-03-28 |
Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
Grant 6,001,227 - Pavate , et al. December 14, 1 | 1999-12-14 |
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