Namatsu; Hideo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Namatsu; Hideo.The latest application filed is for "method for washing device substrate".

Company Profile

0.13.7

Namatsu; Hideo - Shinjuku-ku N/A JP
Namatsu; Hideo - Tokyo N/A JP
Namatsu; Hideo - Atsugi JP
Namatsu; Hideo - Atsugi-shi JP
Namatsu; Hideo - Kanagawa JP
Namatsu; Hideo - Isehara JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for washing device substrate Grant 8,568,534 - Okamoto , et al. October 29, 2	2013-10-29
Supercritical processing apparatus and supercritical processing method Grant 8,465,596 - Toshima , et al. June 18, 2	2013-06-18
Method for washing device substrate Grant 8,143,203 - Okamoto , et al. March 27, 2	2012-03-27
Method For Washing Device Substrate App 20120067379 - Okamoto; Hidekazu ; et al.	2012-03-22
Resist pattern forming method, supercritical processing solution for lithography process, and antireflection film forming method Grant 8,026,047 - Namatsu , et al. September 27, 2	2011-09-27
Supercritical Processing Apparatus And Supercritical Processing Method App 20110214694 - TOSHIMA; Takayuki ; et al.	2011-09-08
Resist pattern forming method Grant 7,977,036 - Namatsu , et al. July 12, 2	2011-07-12
Method For Cleaning With Fluorine Compound App 20110067733 - Okamoto; Hidekazu ; et al.	2011-03-24
Method For Washing Device Substrate App 20090029894 - Okamoto; Hidekazu ; et al.	2009-01-29
Resist Pattern Forming Method, Supercritical Processing Solution For Lithography Process, And Antireflection Film Forming Method App 20080124648 - Namatsu; Hideo ; et al.	2008-05-29
Resist Pattern Forming Method App 20080118871 - Namatsu; Hideo ; et al.	2008-05-22
Supercritical drying method and supercritical drying apparatus Grant 6,576,066 - Namatsu June 10, 2	2003-06-10
Pattern formation method and apparatus App 20020132192 - Namatsu, Hideo	2002-09-19
Pattern formation method and apparatus Grant 6,358,673 - Namatsu March 19, 2	2002-03-19
Method of fabricating semiconductor device with water protective film Grant 5,512,513 - Machida , et al. April 30, 1	1996-04-30
Semiconductor device and method of fabricating the same Grant 5,376,590 - Machida , et al. December 27, 1	1994-12-27
Intermediate layer material of three-layer resist system Grant 4,738,916 - Namatsu , et al. April 19, 1	1988-04-19
Intermediate layer material of three-layer resist system and method of forming resist pattern Grant 4,615,782 - Namatsu , et al. October 7, 1	1986-10-07

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