Namai; Hayato

Patent Applications and Registrations

Patent applications and USPTO patent grants for Namai; Hayato.The latest application filed is for "composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate".

Company Profile

0.25.31

Namai; Hayato - Tokyo JP
Namai; Hayato - San Jose CA US
Namai; Hayato - Osaka JP
Namai; Hayato - Sakai-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate Grant 11,320,739 - Wakamatsu , et al. May 3, 2	2022-05-03
Radiation-sensitive resin composition and resist pattern-forming method Grant 10,824,073 - Nishikori , et al. November 3, 2	2020-11-03
Resin composition, resist pattern-forming method and polymer Grant 10,331,031 - Namai	2019-06-25
Composition For Resist Underlayer Film Formation, Resist Underlayer Film And Method For Producing Patterned Substrate App 20180348633 - Wakamatsu; Goji ; et al.	2018-12-06
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20180329298 - NISHIKORI; Katsuaki ; et al.	2018-11-15
Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method Grant 10,088,750 - Namai , et al. October 2, 2	2018-10-02
Radiation-sensitive resin composition and resist pattern-forming method Grant 9,874,816 - Namai January 23, 2	2018-01-23
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20170363961 - NAMAI; Hayato	2017-12-21
Radiation-sensitive resin composition and resist pattern-forming method Grant 9,760,004 - Miyata , et al. September 12, 2	2017-09-12
Photoresist composition, compound, and production method thereof Grant 9,720,322 - Namai , et al. August 1, 2	2017-08-01
Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound Grant 9,703,195 - Namai , et al. July 11, 2	2017-07-11
Acid Diffusion Control Agent, Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Compound, And Production Method App 20170131632 - NAMAI; Hayato ; et al.	2017-05-11
Resin Composition, Resist Pattern-forming Method And Polymer App 20170115570 - NAMAI; Hayato	2017-04-27
Resist pattern-forming method and photoresist composition Grant 9,594,303 - Osaki , et al. March 14, 2	2017-03-14
Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method Grant 9,588,423 - Namai , et al. March 7, 2	2017-03-07
Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound Grant 9,557,641 - Namai January 31, 2	2017-01-31
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound Grant 9,529,259 - Namai December 27, 2	2016-12-27
Photoresist Composition, Compound, And Production Method Thereof App 20160370700 - NAMAI; Hayato ; et al.	2016-12-22
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20160363859 - NAMAI; Hayato	2016-12-15
Photoresist composition, compound, and production method thereof Grant 9,477,149 - Namai , et al. October 25, 2	2016-10-25
Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming method Grant 9,412,593 - Namai , et al. August 9, 2	2016-08-09
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20160202608 - NAMAI; Hayato	2016-07-14
Resin Composition, Resist Pattern-forming Method And Polymer App 20160185999 - NAMAI; Hayato	2016-06-30
Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base Grant 9,323,146 - Namai , et al. April 26, 2	2016-04-26
Method for improving self-assembled polymer features Grant 9,233,840 - Cheng , et al. January 12, 2	2016-01-12
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Acid Diffusion Control Agent, Compound, And Method For Producing Compound App 20150355539 - NAMAI; Hayato	2015-12-10
Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Polymer, And Method For Producing Compound App 20150323866 - NAMAI; Hayato ; et al.	2015-11-12
Photoresist Composition, Resist Pattern-forming Method, Acid Diffusion Control Agent, And Compound App 20150309406 - NAMAI; Hayato	2015-10-29
Composition For Film Formation, Resist Underlayer Film, And Forming Method Of Resist Underlayer Film, And Pattern-forming Method App 20150267046 - NAMAI; Hayato ; et al.	2015-09-24
Insulation pattern-forming method and insulation pattern-forming material Grant 9,126,231 - Dei , et al. September 8, 2	2015-09-08
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20150093703 - MIYATA; Hiromu ; et al.	2015-04-02
Acid Diffusion Control Agent, Radiation-sensitive Resin Composition, Resist Pattern-forming Method, Compound, And Production Method App 20150079520 - NAMAI; Hayato ; et al.	2015-03-19
Pattern-forming method Grant 8,968,586 - Namai March 3, 2	2015-03-03
Resist Pattern-forming Method And Photoresist Composition App 20150010866 - Osaki; Hitoshi ; et al.	2015-01-08
Photoresist Composition, Compound, And Production Method Thereof App 20150004545 - NAMAI; Hayato ; et al.	2015-01-01
Photoresist Composition, Resist Pattern-forming Method, Acid Diffusion Control Agent, And Compound App 20150004544 - NAMAI; Hayato	2015-01-01
Photoresist Composition, Resist Pattern-forming Method, Compound, Acid Generating Agent, And Photodegradable Base App 20140363769 - NAMAI; Hayato ; et al.	2014-12-11
Method for forming pattern Grant 8,883,023 - Wakamatsu , et al. November 11, 2	2014-11-11
Radiation-sensitive Resin Composition, Polymer, Compound, And Method For Producing Compound App 20140186771 - NAMAI; Hayato	2014-07-03
Methods of forming topographical features using segregating polymer mixtures Grant 8,734,904 - Cheng , et al. May 27, 2	2014-05-27
Pattern-forming method Grant 8,703,395 - Namai , et al. April 22, 2	2014-04-22
Pattern-forming Method App 20130206727 - NAMAI; Hayato	2013-08-15
Pattern-forming Method App 20130107235 - NAMAI; Hayato ; et al.	2013-05-02
Method For Forming Pattern App 20130098870 - WAKAMATSU; Goji ; et al.	2013-04-25
Insulation Pattern-forming Method And Insulation Pattern-forming Material App 20130084394 - Dei; Satoshi ; et al.	2013-04-04
Methods Of Forming Topographical Features Using Segregating Polymer Mixtures App 20120135146 - Cheng; Joy ; et al.	2012-05-31
Method For Improving Self-assembled Polymer Features App 20120103935 - Cheng; Joy ; et al.	2012-05-03
Negative-tone Radiation-sensitive Composition, Cured Pattern Forming Method, And Cured Pattern App 20100167024 - Natsume; Norihiro ; et al.	2010-07-01
Luminescence System, Method Of Luminescence, And Chemical Substance For Luminescence App 20090163743 - HOSHI; Yousuke ; et al.	2009-06-25
Luminescence system, method of luminescence, and chemical substance for luminescence App 20070138945 - Hoshi; Yousuke ; et al.	2007-06-21

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.