Nam; Shin-Woo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nam; Shin-Woo.The latest application filed is for "apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the same".

Company Profile

3.9.14

Nam; Shin-Woo - Gyeonggi-do KR
Nam; Shin-Woo - Yongin-si KR
NAM; Shin-Woo - Yogin-si KR
Nam; Shin-woo - Kyungki-do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate treating apparatus and substrate treating method Grant 11,244,847 - Melikyan , et al. February 8, 2	2022-02-08
Plasma generating unit and substrate treating apparatus comprising the same Grant 11,195,705 - Galstyan , et al. December 7, 2	2021-12-07
Apparatus For Monitoring Pulsed High-frequency Power And Substrate Processing Apparatus Including The Same App 20210050184 - AN; Jong Hwan ; et al.	2021-02-18
Apparatus and method for treating substrate Grant 10,867,775 - Gu , et al. December 15, 2	2020-12-15
Method, system, and apparatus for controlling a temperature of a substrate in a plasma processing chamber Grant 10,563,919 - Won , et al. Feb	2020-02-18
Apparatus for supplying power and apparatus for treating substrate including the same Grant 10,319,566 - Melikyan , et al.	2019-06-11
Substrate Treating Apparatus And Substrate Treating Method App 20190131159 - Melikyan; Harutyun ; et al.	2019-05-02
Apparatus For Supplying Power And Apparatus For Treating Substrate Including The Same App 20180315580 - MELIKYAN; Harutyun ; et al.	2018-11-01
Plasma Generating Unit And Substrate Treating Apparatus Comprising The Same App 20180286641 - GALSTYAN; OGSEN ; et al.	2018-10-04
Substrate Support Unit, Substrate Treating Apparatus Including The Same, And Method For Controlling The Same App 20180102238 - GU; Jamyung ; et al.	2018-04-12
Apparatus And Method For Treating Substrate App 20180033594 - GU; JAMYUNG ; et al.	2018-02-01
Apparatus And Method For Treating A Substrate App 20170316920 - MELIKYAN; Harutyun ; et al.	2017-11-02
Apparatus For Controlling Temperature Of Substrate, Apparatus For Treating Substrate Comprising The Same, And Method Of Controlling The Same App 20170318627 - WON; Jung Min ; et al.	2017-11-02
Apparatus For Monitoring Pulsed High-frequency Power And Substrate Processing Apparatus Including The Same App 20170103871 - AN; Jong Hwan ; et al.	2017-04-13
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates App 20060278341 - Park; Jeong-hyuck ; et al.	2006-12-14
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates Grant 6,797,109 - Park , et al. September 28, 2	2004-09-28
Methods of manufacturing semiconductor devices having chamfered silicide layers therein Grant 6,740,550 - Choi , et al. May 25, 2	2004-05-25
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates App 20030013315 - Park, Jeong-hyuck ; et al.	2003-01-16
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates App 20030000648 - Park, Jeong-Hyuck ; et al.	2003-01-02
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates App 20030000459 - Park, Jeong-hyuck ; et al.	2003-01-02
Semiconductor device having chamfered silicide layer and method for manufacturing the same App 20020175381 - Choi, Chang-won ; et al.	2002-11-28
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates Grant 6,464,794 - Park , et al. October 15, 2	2002-10-15
Semiconductor device having chamfered silicide layer and method for manufacturing the same Grant 6,437,411 - Choi , et al. August 20, 2	2002-08-20

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