Patent | Date |
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Method for removal of metallic residue after plasma etching of a metal layer Grant 7,320,942 - Chen , et al. January 22, 2 | 2008-01-22 |
Method of plasma etching high-K dielectric materials with high selectivity to underlying layers Grant 7,217,665 - Nallan , et al. May 15, 2 | 2007-05-15 |
Method of etching a magnetic material Grant 7,105,361 - Chen , et al. September 12, 2 | 2006-09-12 |
Method of etching metals with high selectivity to hafnium-based dielectric materials App 20060060565 - Nallan; Padmapani C. ;   et al. | 2006-03-23 |
Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer Grant 6,984,585 - Ying , et al. January 10, 2 | 2006-01-10 |
Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask Grant 6,964,928 - Ying , et al. November 15, 2 | 2005-11-15 |
Method of etching magnetic and ferroelectric materials using a pulsed bias source Grant 6,942,813 - Ying , et al. September 13, 2 | 2005-09-13 |
Method of etching ferroelectric layers Grant 6,943,039 - Ying , et al. September 13, 2 | 2005-09-13 |
Method for fabricating a notched gate structure of a field effect transistor App 20050176191 - Kumar, Ajay ;   et al. | 2005-08-11 |
Method for plasma etching of high-K dielectric materials Grant 6,902,681 - Nallan , et al. June 7, 2 | 2005-06-07 |
Method of preventing short circuits in magnetic film stacks Grant 6,893,893 - Nallan , et al. May 17, 2 | 2005-05-17 |
Method for fabricating a gate structure Grant 6,855,643 - Nallan , et al. February 15, 2 | 2005-02-15 |
Method of etching metal layers App 20040242005 - Ying, Chentsau ;   et al. | 2004-12-02 |
Method for fabricating a gate structure of a field effect transistor App 20040209468 - Kumar, Ajay ;   et al. | 2004-10-21 |
Method of etching metals with high selectivity to hafnium-based dielectric materials App 20040206724 - Nallan, Padmapani C. ;   et al. | 2004-10-21 |
Method of plasma etching of high-K dielectric materials with high selectivity to underlying layers Grant 6,806,095 - Nallan , et al. October 19, 2 | 2004-10-19 |
Method of etching magnetic and ferroelectric materials using a pulsed bias source App 20040173570 - Ying, Chentsau ;   et al. | 2004-09-09 |
Method of plasma etching of high-K dielectric materials with high selectivity to underlying layers App 20040173572 - Nallan, Padmapani C. ;   et al. | 2004-09-09 |
Method of etching metallic materials to form a tapered profile App 20040171272 - Jin, Guangxiang ;   et al. | 2004-09-02 |
Method of etching ferroelectric layers App 20040157459 - Ying, Chentsau ;   et al. | 2004-08-12 |
Method of fabricating a gate structure of a field effect transistor using an alpha-carbon mask Grant 6,767,824 - Nallan , et al. July 27, 2 | 2004-07-27 |
Method of etching a magnetic material App 20040129361 - Chen, Xiaoyi ;   et al. | 2004-07-08 |
Method of etching high-K dielectric materials App 20040132311 - Nallan, Padmapani C. ;   et al. | 2004-07-08 |
Method of etching a trench in a silicon-on-insulator (SOI) structure Grant 6,759,340 - Nallan , et al. July 6, 2 | 2004-07-06 |
Method of patterning a layer of magnetic material Grant 6,759,263 - Ying , et al. July 6, 2 | 2004-07-06 |
Method of fabricating a gate structure of a field effect transistor using a hard mask Grant 6,759,286 - Kumar , et al. July 6, 2 | 2004-07-06 |
Method and apparatus for etching a deep trench App 20040097077 - Nallan, Padmapani C. ;   et al. | 2004-05-20 |
Method of plasma etching high-K dielectric materials with high selectivity to underlying layers App 20040097092 - Nallan, Padmapani C. ;   et al. | 2004-05-20 |
Method for laterally etching a semiconductor structure App 20040077178 - Yang, Chan-Syun ;   et al. | 2004-04-22 |
Method of fabricating a gate structure of a field effect transistor using an alpha-carbon mask App 20040058517 - Nallan, Padmapani C. ;   et al. | 2004-03-25 |
Method of fabricating a gate structure of a field effect transistor using a hard mask App 20040053484 - Kumar, Ajay ;   et al. | 2004-03-18 |
Method of patterning a layer of magnetic material App 20040043526 - Ying, Chentsau ;   et al. | 2004-03-04 |
Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask App 20040043620 - Ying, Chentsau ;   et al. | 2004-03-04 |
Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer App 20040029393 - Ying, Chentsau ;   et al. | 2004-02-12 |
Method of etching magnetic materials App 20040026369 - Ying, Chentsau ;   et al. | 2004-02-12 |
Method for fabricating a gate structure App 20040009634 - Nallan, Padmapani C. ;   et al. | 2004-01-15 |
Method for plasma etching of high-K dielectric materials App 20040002223 - Nallan, Padmapani C. ;   et al. | 2004-01-01 |
Method of increasing selectivity to mask when etching tungsten or tungsten nitride App 20030235995 - Oluseyi, Hakeem M. ;   et al. | 2003-12-25 |
Method for removal of metallic residue after plasma etching of a metal layer App 20030219912 - Chen, Xiaoyi ;   et al. | 2003-11-27 |
Method of etching a trench in a silicon-on-insulator (SOI) structure App 20030211753 - Nallan, Padmapani C. ;   et al. | 2003-11-13 |
Method for dicing a semiconductor wafer Grant 6,642,127 - Kumar , et al. November 4, 2 | 2003-11-04 |
Methods used in fabricating gates in integrated circuit device structures Grant 6,638,874 - Yi , et al. October 28, 2 | 2003-10-28 |
Methods Used In Fabricating Gates In Integrated Circuit Device Structures App 20030186556 - Yi, Sang In ;   et al. | 2003-10-02 |
Method of preventing short circuits in magnetic film stacks App 20030180968 - Nallan, Padmapani C. ;   et al. | 2003-09-25 |
Method of etching a magnetic material film stack using a hard mask App 20030181056 - Kumar, Ajay ;   et al. | 2003-09-25 |
Method of plasma etching of high-K dielectric materials with high selectivity to underlying layers App 20030170986 - Nallan, Padmapani C. ;   et al. | 2003-09-11 |
Method and apparatus for providing modulated bias power to a plasma etch reactor App 20030153195 - Weikmann, Elisabeth ;   et al. | 2003-08-14 |
Apparatus for controlling a thermal conductivity profile for a pedestal in a semiconductor wafer processing chamber App 20030089457 - Nallan, Padmapani C. ;   et al. | 2003-05-15 |
Method for dicing a semiconductor wafer App 20030077878 - Kumar, Ajay ;   et al. | 2003-04-24 |
Plasma etching of silicon using a chlorine chemistry augmented with sulfur dioxide Grant 6,415,198 - Nallan , et al. July 2, 2 | 2002-07-02 |
Method of etching silicon nitride App 20020003126 - Kumar, Ajay ;   et al. | 2002-01-10 |