Nallan; Padmapani

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nallan; Padmapani.The latest application filed is for "method of plasma etching of high-k dielectric materials".

Company Profile

0.8.11

Nallan; Padmapani - San Jose CA
Nallan; Padmapani - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of plasma etching of high-K dielectric materials Grant 7,838,434 - Jin , et al. November 23, 2	2010-11-23
Method Of Plasma Etching Of High-k Dielectric Materials App 20070077767 - Jin; Guangxiang ; et al.	2007-04-05
Method of plasma etching of high-K dielectric materials Grant 7,094,704 - Jin , et al. August 22, 2	2006-08-22
Method for plasma etching of high-K dielectric materials App 20040007561 - Nallan, Padmapani ; et al.	2004-01-15
Apparatus for plasma etching at a constant etch rate Grant 6,660,127 - Nallan , et al. December 9, 2	2003-12-09
Method of forming a capacitor using a high K dielectric material App 20030222296 - Kumar, Ajay ; et al.	2003-12-04
Method of plasma etching of high-K dielectric materials App 20030211748 - Jin, Guangxiang ; et al.	2003-11-13
Techniques for plasma etching silicon-germanium Grant 6,642,151 - Khan , et al. November 4, 2	2003-11-04
Techniques For Plasma Etching Silicon-germanium App 20030176075 - Khan, Anisul ; et al.	2003-09-18
Method of etching tantalum App 20030109138 - Nallan, Padmapani	2003-06-12
Method of etching titanium nitride Grant 6,531,404 - Nallan , et al. March 11, 2	2003-03-11
Method of etching a tantalum nitride layer in a high density plasma Grant 6,503,845 - Nallan January 7, 2	2003-01-07
Method of etching tungsten or tungsten nitride in semiconductor structures App 20030003757 - Nallan, Padmapani ; et al.	2003-01-02
Method Of Etching A Tantalum Nitride Layer In A High Density Plasma App 20020195416 - Nallan, Padmapani	2002-12-26
Plasma etching at a constant etch rate App 20020137352 - Nallan, Padmapani ; et al.	2002-09-26
Method of etching tantalum App 20020132488 - Nallan, Padmapani	2002-09-19
Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures Grant 6,423,644 - Nallan , et al. July 23, 2	2002-07-23
Method of etching tungsten or tungsten nitride electrode gates in semiconductor structures App 20020028582 - Nallan, Padmapani ; et al.	2002-03-07
Process for etching silicon-containing material on substrates Grant 6,322,714 - Nallan , et al. November 27, 2	2001-11-27

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