Nakayama; Toshimasa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakayama; Toshimasa.The latest application filed is for "phenol novolak resin, production process thereof, and positive photoresist composition using the same".

Company Profile

0.41.8

Nakayama; Toshimasa - Kanagawa JP
Nakayama; Toshimasa - Kawasaki JP
Nakayama; Toshimasa - Kanagawa-ken JP
Nakayama; Toshimasa - Chigasaki JP
Nakayama; Toshimasa - Hiratsuka JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Phenol novolak resin, production process thereof, and positive photoresist composition using the same Grant 6,939,926 - Miyagi , et al. September 6, 2	2005-09-06
Rinsing solution for lithography and method for processing substrate with the use of the same Grant 6,815,151 - Tanabe , et al. November 9, 2	2004-11-09
Phenol novolak resin, production process thereof, and positive photoresist composition using the same App 20040167312 - Miyagi, Ken ; et al.	2004-08-26
Positive resist composition Grant RE38,254 - Sato , et al. September 16, 2	2003-09-16
Positive photoresist composition and process for synthesizing polyphenol compound Grant 6,620,978 - Shimatani , et al. September 16, 2	2003-09-16
Positive photoresist composition and process for synthesizing polyphenol compound App 20030054283 - Shimatani, Satoshi ; et al.	2003-03-20
Positive photoresist composition and process for forming resist pattern using same App 20020119390 - Suzuki, Takako ; et al.	2002-08-29
Positive photoresist composition and process for forming resist pattern Grant 6,406,827 - Suzuki , et al. June 18, 2	2002-06-18
Positive Photoresist Composition And Process For Forming Resist Pattern Using Same App 20020012865 - SUZUKI, TAKAKO ; et al.	2002-01-31
Positive photoresist composition App 20020001769 - Doi, Kousuke ; et al.	2002-01-03
Positive Photoresist Composition And Process For Forming Resist Pattern App 20010053493 - SUZUKI, TAKAKO ; et al.	2001-12-20
Rinsing solution for lithography and method for processing substrate with the use of the same App 20010038976 - Tanabe, Masahito ; et al.	2001-11-08
Phenol novolak resin, production process thereof, and positive photoresist composition using the same App 20010024762 - Miyagi, Ken ; et al.	2001-09-27
Composition for forming antireflective coating film and method for forming resist pattern using same Grant 6,268,108 - Iguchi , et al. July 31, 2	2001-07-31
Post-ashing treating liquid compositions and a process for treatment therewith Grant 6,261,745 - Tanabe , et al. July 17, 2	2001-07-17
Coating solution for forming silica coating and method of forming silica coating Grant 6,214,104 - Iida , et al. April 10, 2	2001-04-10
Polyphenol compound, quinonediazide ester and positive photoresist composition Grant 6,120,969 - Hagihara , et al. September 19, 2	2000-09-19
Substrate treatment method Grant 6,068,000 - Tanabe , et al. May 30, 2	2000-05-30
Process for treating a lithographic substrate and a rinse solution for the treatment Grant 5,968,848 - Tanabe , et al. October 19, 1	1999-10-19
Compounds for use in a positive-working resist composition Grant 5,929,271 - Hada , et al. July 27, 1	1999-07-27
Remover solution composition for resist and method for removing resist using the same Grant 5,905,063 - Tanabe , et al. May 18, 1	1999-05-18
Cyano group-containing oxime sulfonate compounds Grant 5,892,095 - Hada , et al. April 6, 1	1999-04-06
Developer solution for photolithographic patterning Grant 5,863,710 - Wakiya , et al. January 26, 1	1999-01-26
Chemical-sensitization positive-working photoresist composition Grant 5,856,058 - Sato , et al. January 5, 1	1999-01-05
Positive-working photoresist composition and multilayered resist material using the same Grant 5,817,444 - Sato , et al. October 6, 1	1998-10-06
Photoresist stripping liquid compositions and a method of stripping photoresists using the same Grant 5,795,702 - Tanabe , et al. August 18, 1	1998-08-18
Remover solution composition for resist and method for removing resist using the same Grant 5,792,274 - Tanabe , et al. August 11, 1	1998-08-11
Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition Grant 5,783,362 - Wakiya , et al. July 21, 1	1998-07-21
Positive-working photoresist composition Grant 5,770,343 - Sato , et al. June 23, 1	1998-06-23
Undercoating composition for photolithography Grant 5,756,255 - Sato , et al. May 26, 1	1998-05-26
Positive photoresist compositions and multilayer resist materials using the same Grant 5,728,504 - Hosoda , et al. March 17, 1	1998-03-17
Cyanooxime sulfonate compound Grant 5,714,625 - Hada , et al. February 3, 1	1998-02-03
Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition Grant 5,631,314 - Wakiya , et al. May 20, 1	1997-05-20
Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent Grant 5,604,077 - Kono , et al. February 18, 1	1997-02-18
Method for forming a protective coating film on electronic parts and devices Grant 5,520,952 - Tanitsu , et al. May 28, 1	1996-05-28
Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound Grant 5,501,936 - Hosoda , et al. March 26, 1	1996-03-26
Lithographic double-coated patterning plate with undercoat levelling layer Grant 5,498,514 - Nakao , et al. March 12, 1	1996-03-12
Method and liquid coating composition for the formation of silica-based coating film on substrate surface Grant 5,496,402 - Sakamoto , et al. March 5, 1	1996-03-05
Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone Grant 5,478,692 - Doi , et al. December 26, 1	1995-12-26
Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent Grant 5,100,758 - Tanaka , et al. March 31, 1	1992-03-31
Electron beam-curable resist composition and method for fine patterning using the same Grant 5,057,397 - Miyabe , et al. October 15, 1	1991-10-15
Developer solution for positive-working resist composition Grant 4,997,748 - Takeda , et al. March 5, 1	1991-03-05
Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye Grant 4,882,260 - Kohara , et al. November 21, 1	1989-11-21
Method for forming a resist pattern on a substrate surface and a scum-remover therefor Grant 4,873,177 - Tanaka , et al. October 10, 1	1989-10-10
Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant Grant 4,833,067 - Tanaka , et al. May 23, 1	1989-05-23
Developer solution for positive-working photoresist compositions comprising a base and a non-ionic surfactant Grant 4,820,621 - Tanka , et al. April 11, 1	1989-04-11
Highly heat-resistant positive-working o-quinone diazide containing photoresist composition with novolac resin made from phenol with ethylenic unsaturation Grant 4,804,612 - Asaumi , et al. February 14, 1	1989-02-14
Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant Grant 4,784,937 - Tanaka , et al. November 15, 1	1988-11-15
Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins Grant 4,731,319 - Kohara , et al. March 15, 1	1988-03-15

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