Nakaue; Takuya

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakaue; Takuya.The latest application filed is for "photomask defect correction device and photomask defect correction method".

Company Profile

0.2.7

Nakaue; Takuya - Chiba JP
Nakaue; Takuya - Chiba-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing method Grant 8,062,494 - Iwata , et al. November 22, 2	2011-11-22
Photomask Defect Correction Device And Photomask Defect Correction Method App 20090092905 - Nakaue; Takuya ; et al.	2009-04-09
Photomask Defect Correction Device And Photomask Defect Correction Method App 20090038383 - Nakaue; Takuya ; et al.	2009-02-12
Photomask Defect-shape Recognition Apparatus, Photomask Defect-shape Recognition Method, And Photomask Defect Correction Method App 20090028420 - Nakaue; Takuya ; et al.	2009-01-29
Working method using scanning probe Grant 7,442,925 - Yasutake , et al. October 28, 2	2008-10-28
Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing method App 20080132151 - Iwata; Futoshi ; et al.	2008-06-05
Processing method using atomic force microscope microfabrication device App 20070278177 - Kondo; Kazushige ; et al.	2007-12-06
Probe washing method of scanning probe microscope App 20070131249 - Nakaue; Takuya	2007-06-14
Working method using scanning probe App 20060219901 - Yasutake; Masatoshi ; et al.	2006-10-05

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