| Patent | Date |
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Imprint Apparatus And Imprint Method
App 20220252975 - FUKUHARA; Kazuya ; et al. | 2022-08-11 |
Imprint Apparatus, Imprint Method, And Method Of Manufacturing Semiconductor Device
App 20210225638 - FUKUHARA; Kazuya ; et al. | 2021-07-22 |
Imprint apparatus, imprint method, and method of manufacturing semiconductor device
Grant 11,004,683 - Fukuhara , et al. May 11, 2 | 2021-05-11 |
Pattern Forming Method And Imprint Apparatus
App 20200402843 - MITRA; Anupam ; et al. | 2020-12-24 |
Pattern forming method and imprint apparatus
Grant 10,796,948 - Mitra , et al. October 6, 2 | 2020-10-06 |
Imprint Apparatus, Imprint Method, And Manufacturing Method Of Semiconductor Device
App 20200073233 - HATANO; Masayuki ; et al. | 2020-03-05 |
Pattern Forming Method And Imprint Apparatus
App 20200006124 - MITRA; Anupam ; et al. | 2020-01-02 |
Imprint Apparatus, Imprint Method, And Method Of Manufacturing Semiconductor Device
App 20190221421 - FUKUHARA; Kazuya ; et al. | 2019-07-18 |
Imprint Apparatus And Imprint Method
App 20190079391 - FUKUHARA; Kazuya ; et al. | 2019-03-14 |
Pattern Forming Method And Imprint Apparatus
App 20180151418 - MITRA; Anupam ; et al. | 2018-05-31 |
Template And Method Of Manufacturing Semiconductor Device
App 20180119288 - Tsuji; Masatoshi ; et al. | 2018-05-03 |
Template forming method, template, and template base material
Grant 9,885,118 - Tsuji , et al. February 6, 2 | 2018-02-06 |
Template Forming Method, Template, And Template Base Material
App 20160247673 - TSUJI; Masatoshi ; et al. | 2016-08-25 |
Pattern forming method
Grant 9,381,540 - Koshiba , et al. July 5, 2 | 2016-07-05 |
Pattern formation method
Grant 9,360,752 - Tsuji , et al. June 7, 2 | 2016-06-07 |
Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method
Grant 9,188,879 - Kasa , et al. November 17, 2 | 2015-11-17 |
Pattern Forming Method
App 20150224536 - KOSHIBA; Takeshi ; et al. | 2015-08-13 |
Pattern forming method
Grant 9,046,763 - Koshiba , et al. June 2, 2 | 2015-06-02 |
Method for manufacturing mold
Grant 8,992,789 - Suzuki , et al. March 31, 2 | 2015-03-31 |
Imprint method and imprint apparatus
Grant 8,973,494 - Hatano , et al. March 10, 2 | 2015-03-10 |
Method for fabricating pellicle, photo mask, and semiconductor device
Grant 8,895,210 - Suzuki , et al. November 25, 2 | 2014-11-25 |
Method for manufacturing photo mask, method for manufacturing semiconductor device, and program
Grant 8,883,373 - Mimotogi , et al. November 11, 2 | 2014-11-11 |
Pattern Formation Method And Pattern Formation Device
App 20140246808 - TSUJI; Masatoshi ; et al. | 2014-09-04 |
Mold And Mold Blank Substrate
App 20140072668 - YONEDA; Ikuo ; et al. | 2014-03-13 |
Imprint apparatus and method
Grant 8,550,801 - Furutono , et al. October 8, 2 | 2013-10-08 |
Method For Manufacturing Mold
App 20130240480 - SUZUKI; Masato ; et al. | 2013-09-19 |
Substrate Holding Apparatus, Pattern Transfer Apparatus, And Pattern Transfer Method
App 20130222782 - KASA; Kentaro ; et al. | 2013-08-29 |
Method For Fabricating Pellicle, Photo Mask, And Semiconductor Device
App 20130130158 - Suzuki; Masato ; et al. | 2013-05-23 |
Method For Manufacturing Photo Mask, Method For Manufacturing Semiconductor Device, And Program
App 20130130157 - Mimotogi; Akiko ; et al. | 2013-05-23 |
Imprint method
Grant 8,419,995 - Yoneda , et al. April 16, 2 | 2013-04-16 |
Pattern Forming Apparatus
App 20130077066 - INANAMI; Ryoichi ; et al. | 2013-03-28 |
Template inspection method and manufacturing method for semiconductor device
Grant 8,227,267 - Yoneda , et al. July 24, 2 | 2012-07-24 |
Method And Device For Forming Pattern
App 20120164346 - Yoneda; Ikuo ; et al. | 2012-06-28 |
Imprint method
Grant 8,202,463 - Yoneda , et al. June 19, 2 | 2012-06-19 |
Control method for semiconductor manufacturing apparatus, control system for semiconductor manufacturing apparatus, and manufacturing method for semiconductor device
Grant 8,180,472 - Hatano , et al. May 15, 2 | 2012-05-15 |
Imprint Apparatus And Method
App 20120061882 - Furutono; Yohko ; et al. | 2012-03-15 |
Pattern formation method and a method for manufacturing a semiconductor device
Grant 8,118,585 - Hatano , et al. February 21, 2 | 2012-02-21 |
Imprint Method And Imprint Apparatus
App 20110192300 - Hatano; Masayuki ; et al. | 2011-08-11 |
Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program
Grant 7,985,958 - Nakasugi , et al. July 26, 2 | 2011-07-26 |
Pattern Formation Method And A Method For Manufacturing A Semiconductor Device
App 20110097827 - HATANO; Masayuki ; et al. | 2011-04-28 |
Character pattern extracting method, charged particle beam drawing method, and character pattern extracting program
Grant 7,889,910 - Nakasugi , et al. February 15, 2 | 2011-02-15 |
Template, Method Of Manufacturing The Same, And Method Of Forming Pattern
App 20100264113 - YONEDA; Ikuo ; et al. | 2010-10-21 |
Pattern Forming Method
App 20100237045 - KOSHIBA; Takeshi ; et al. | 2010-09-23 |
Imprint Method
App 20100078860 - Yoneda; Ikuo ; et al. | 2010-04-01 |
Template Inspection Method And Manufacturing Method For Semiconductor Device
App 20100075443 - YONEDA; Ikuo ; et al. | 2010-03-25 |
Control Method For Semiconductor Manufacturing Apparatus, Control System For Semiconductor Manufacturing Apparatus, And Manufacturing Method For Semiconductor Device
App 20100023146 - HATANO; Masayuki ; et al. | 2010-01-28 |
Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product
Grant 7,648,809 - Nakasugi January 19, 2 | 2010-01-19 |
Template And Pattern Forming Method
App 20090315223 - Yoneda; Ikuo ; et al. | 2009-12-24 |
Imprint Method
App 20090267267 - Yoneda; Ikuo ; et al. | 2009-10-29 |
Manufacturing Method Of Semiconductor Device
App 20090246709 - NAKASUGI; Tetsuro ; et al. | 2009-10-01 |
Charged-beam Exposure Apparatus Having An Improved Alignment Precision And Exposure Method
App 20090206280 - KOSHIBA; Takeshi ; et al. | 2009-08-20 |
Exposure Method, Photo Mask, And Reticle Stage
App 20090148782 - Kono; Takuya ; et al. | 2009-06-11 |
Microfabrication Apparatus And Device Manufacturing Method
App 20090095711 - Koshiba; Takeshi ; et al. | 2009-04-16 |
Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device
Grant 7,482,604 - Nakasugi , et al. January 27, 2 | 2009-01-27 |
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
Grant 7,459,705 - Nakasugi , et al. December 2, 2 | 2008-12-02 |
System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device
Grant 7,435,978 - Nakasugi , et al. October 14, 2 | 2008-10-14 |
Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method
Grant 7,368,737 - Inanami , et al. May 6, 2 | 2008-05-06 |
Charged particle beam drawing apparatus, charged particle beam drawing method and semiconductor device manufacturing method
App 20080001077 - Nakasugi; Tetsuro ; et al. | 2008-01-03 |
Electron beam drawing apparatus, electron beam drawing method, and a semiconductor device manufacturing method
App 20080001097 - Nakasugi; Tetsuro ; et al. | 2008-01-03 |
Character pattern extracting method, charged particle beam drawing method, and character pattern extracting program
App 20070263921 - Nakasugi; Tetsuro ; et al. | 2007-11-15 |
Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing
Grant 7,283,885 - Nakasugi October 16, 2 | 2007-10-16 |
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
Grant 7,264,909 - Nakasugi September 4, 2 | 2007-09-04 |
Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device
Grant 7,242,014 - Ota , et al. July 10, 2 | 2007-07-10 |
Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
App 20070114463 - Nakasugi; Tetsuro ; et al. | 2007-05-24 |
Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device
Grant 7,202,488 - Ota , et al. April 10, 2 | 2007-04-10 |
Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product
App 20070042513 - Nakasugi; Tetsuro | 2007-02-22 |
Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device
App 20060289805 - Nakasugi; Tetsuro ; et al. | 2006-12-28 |
Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method
App 20060289797 - Inanami; Ryoichi ; et al. | 2006-12-28 |
Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program
App 20060151721 - Nakasugi; Tetsuro ; et al. | 2006-07-13 |
Charged beam exposure apparatus having blanking aperture and basic figure aperture
Grant 7,045,801 - Nakasugi May 16, 2 | 2006-05-16 |
System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device
App 20060076508 - Nakasugi; Tetsuro ; et al. | 2006-04-13 |
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
App 20060063078 - Nakasugi; Tetsuro | 2006-03-23 |
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
Grant 7,011,915 - Nakasugi March 14, 2 | 2006-03-14 |
Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device
App 20060017013 - Ota; Takumi ; et al. | 2006-01-26 |
Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing
App 20050256600 - Nakasugi, Tetsuro | 2005-11-17 |
Pattern forming method
Grant 6,941,008 - Ando , et al. September 6, 2 | 2005-09-06 |
Charged beam exposure apparatus having blanking aperture and basic figure aperture
App 20050161620 - Nakasugi, Tetsuro | 2005-07-28 |
Charged beam exposure apparatus having blanking aperture and basic figure aperture
Grant 6,914,252 - Nakasugi July 5, 2 | 2005-07-05 |
Energy beam exposure method and exposure apparatus
Grant 6,897,454 - Sasaki , et al. May 24, 2 | 2005-05-24 |
Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device
App 20050088099 - Ota, Takumi ; et al. | 2005-04-28 |
Pattern forming method, semiconductor device and method for manufacturing the same
App 20050048413 - Nakasugi, Tetsuro | 2005-03-03 |
Charged particle beam exposure apparatus and exposure method
Grant 6,818,364 - Nakasugi November 16, 2 | 2004-11-16 |
Charged particle beam exposure apparatus and exposure method
App 20040206918 - Nakasugi, Tetsuro | 2004-10-21 |
Apparatus and method applied to exposure by charged beam
Grant 6,803,589 - Nakasugi October 12, 2 | 2004-10-12 |
Charged beam exposure apparatus having blanking aperture and basic figure aperture
App 20040149935 - Nakasugi, Tetsuro | 2004-08-05 |
Charged particle beam exposure apparatus and exposure method
Grant 6,762,421 - Nakasugi July 13, 2 | 2004-07-13 |
Pattern observation apparatus and pattern observation method
Grant 6,737,658 - Nakasugi , et al. May 18, 2 | 2004-05-18 |
Charged beam exposure apparatus having blanking aperture and basic figure aperture
Grant 6,703,629 - Nakasugi March 9, 2 | 2004-03-09 |
Energy beam exposure method and exposure apparatus
App 20040011966 - Sasaki, Noriaki ; et al. | 2004-01-22 |
Pattern forming method
App 20030190070 - Ando, Atsushi ; et al. | 2003-10-09 |
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
App 20020151140 - Nakasugi, Tetsuro | 2002-10-17 |
Charged beam exposure method and charged beam exposure apparatus
App 20020072012 - Nakasugi, Tetsuro ; et al. | 2002-06-13 |
Apparatus and method applied to exposure by charged beam
App 20020036761 - Nakasugi, Tetsuro | 2002-03-28 |
Charged beam exposure apparatus having blanking aperture and basic figure aperture
App 20020011574 - Nakasugi, Tetsuro | 2002-01-31 |
Pattern forming method
Grant 6,147,355 - Ando , et al. November 14, 2 | 2000-11-14 |
Pattern-forming method and lithographic system
Grant 5,994,030 - Sugihara , et al. November 30, 1 | 1999-11-30 |
Charged beam lithography apparatus and method thereof
Grant 5,933,211 - Nakasugi , et al. August 3, 1 | 1999-08-03 |
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