Nakasugi; Shigemasa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakasugi; Shigemasa.The latest application filed is for "method for manufacturing cured film and use of the same".

Company Profile

4.12.17

Nakasugi; Shigemasa - Abiko JP
NAKASUGI; Shigemasa - Yamato-shi JP
Nakasugi; Shigemasa - Yamato JP
NAKASUGI; Shigemasa - Abiko-shi JP
Nakasugi; Shigemasa - Kakegawa JP
NAKASUGI; Shigemasa - Kakegawa-Shi JP
Nakasugi; Shigemasa - Shizuoka N/A JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same Grant 11,450,805 - Nakasugi , et al. September 20, 2	2022-09-20
Method For Manufacturing Cured Film And Use Of The Same App 20220221794 - SEKITO; Takashi ; et al.	2022-07-14
Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same Grant 11,366,389 - Nakasugi , et al. June 21, 2	2022-06-21
Allyloxy Derivative, Resist Underlayer Forming Composition Using The Same, And Method Of Manufacturing Resist Underlayer And Semiconductor Device Using The Same App 20210181636 - NAKASUGI; Shigemasa ; et al.	2021-06-17
An Ethynyl Derived Composite, A Composition Comprising Thereof, A Method For Manufacturing A Coating By It, And A Method For Manufacturing A Device Comprising The Coating App 20200401046 - NAKASUGI; Shigemasa ; et al.	2020-12-24
Novel Compound, Semiconductor Material, And Methods For Manufacturing Coating And Semiconductor Using The Same App 20200044158 - NAKASUGI; Shigemasa ; et al.	2020-02-06
Composition for forming underlayer and method for forming underlayer therewith Grant 10,451,971 - Suzuki , et al. Oc	2019-10-22
Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using composition Grant 10,435,555 - Nakasugi , et al. O	2019-10-08
A Polymer, Composition, Forming Sacrificial Layer And Method For Semiconductor Device Therewith App 20190048129 - NAKASUGI; Shigemasa ; et al.	2019-02-14
Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticles Grant 10,106,428 - Yanagita , et al. October 23, 2	2018-10-23
Composition For Forming Underlayer And Method For Forming Underlayer Therewith App 20180039178 - SUZUKI; Masato ; et al.	2018-02-08
Sacrificial Film Composition, Method For Preparing Same, Semiconductor Device Having Voids Formed Using Said Composition, And Method For Manufacturing Semiconductor Device Using Said Composition App 20170218227 - NAKASUGI; Shigemasa ; et al.	2017-08-03
Void Forming Composition, Semiconductor Device Provided With Voids Formed Using Composition, And Method For Manufacturing Semiconductor Device Using Composition App 20170210896 - NAKASUGI; Shigemasa ; et al.	2017-07-27
Method For Producing Surface-modified Silica Nanoparticles, And Surface-modified Silica Nanoparticles App 20170190586 - YANAGITA; HIROSHI ; et al.	2017-07-06
Composition for forming fine resist pattern and pattern formation method using same Grant 9,360,756 - Yamamoto , et al. June 7, 2	2016-06-07
Composition for forming resist underlayer Grant 9,328,198 - Nakasugi , et al. May 3, 2	2016-05-03
Composition For Forming Fine Resist Pattern And Pattern Formation Method Using Same App 20150253669 - Yamamoto; Kazuma ; et al.	2015-09-10
Composition For Forming Resist Underlayer App 20150118624 - NAKASUGI; Shigemasa ; et al.	2015-04-30
Developable bottom anti-reflective coating Grant 8,900,797 - Nakasugi , et al. December 2, 2	2014-12-02
Composition For Forming A Developable Bottom Antireflective Coating App 20140193753 - NAKASUGI; Shigemasa ; et al.	2014-07-10
Composition for forming a developable bottom antireflective coating Grant 8,697,336 - Nakasugi , et al. April 15, 2	2014-04-15
Developable Bottom Anti-reflective Coating App 20140087311 - NAKASUGI; Shigemasa ; et al.	2014-03-27
Composition For Forming A Developable Bottom Antireflective Coating App 20130157196 - Nakasugi; Shigemasa ; et al.	2013-06-20

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.