loadpatents
name:-0.016008138656616
name:-0.010202884674072
name:-0.00037503242492676
Nakashima; Norman Patent Filings

Nakashima; Norman

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakashima; Norman.The latest application filed is for "modular-component system for gas delivery".

Company Profile
0.10.13
  • Nakashima; Norman - Lake Oswego OR
  • Nakashima; Norman - Sunnyvale CA US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Modular-component System For Gas Delivery
App 20220199431 - Stumpf; John Folden ;   et al.
2022-06-23
Gas delivery apparatus and method for atomic layer deposition
Grant 8,668,776 - Chen , et al. March 11, 2
2014-03-11
Chemical delivery apparatus for CVD or ALD
Grant 7,832,432 - Nakashima , et al. November 16, 2
2010-11-16
Gas Delivery Apparatus And Method For Atomic Layer Deposition
App 20100247767 - CHEN; LING ;   et al.
2010-09-30
Gas delivery apparatus for atomic layer deposition
Grant 7,780,788 - Chen , et al. August 24, 2
2010-08-24
Gas delivery apparatus for atomic layer deposition
Grant 7,780,785 - Chen , et al. August 24, 2
2010-08-24
Chemical delivery apparatus for CVD or ALD
Grant 7,748,400 - Nakashima , et al. July 6, 2
2010-07-06
Gas delivery apparatus for atomic layer deposition
Grant 7,699,023 - Chen , et al. April 20, 2
2010-04-20
Chemical Delivery Apparatus For Cvd Or Ald
App 20100006167 - Nakashima; Norman ;   et al.
2010-01-14
Chemical Delivery Apparatus For Cvd Or Ald
App 20090314370 - Nakashima; Norman ;   et al.
2009-12-24
Chemical delivery apparatus for CVD or ALD
Grant 7,568,495 - Nakashima , et al. August 4, 2
2009-08-04
Chemical delivery apparatus for CVD or ALD
Grant 7,562,672 - Nakashima , et al. July 21, 2
2009-07-21
Gas Delivery Apparatus For Atomic Layer Deposition
App 20080041313 - CHEN; LING ;   et al.
2008-02-21
Chemical Delivery Apparatus For Cvd Or Ald
App 20080041311 - Nakashima; Norman ;   et al.
2008-02-21
Atomic Layer Deposition Process
App 20080038463 - Chen; Ling ;   et al.
2008-02-14
Chemical delivery apparatus for CVD or ALD
App 20070235085 - Nakashima; Norman ;   et al.
2007-10-11
Integration Process Of Tungsten Atomic Layer Deposition For Metallization Application
App 20070099415 - Chen; Ling ;   et al.
2007-05-03
Gas delivery apparatus and method for atomic layer deposition
App 20050173068 - Chen, Ling ;   et al.
2005-08-11
Gas delivery apparatus and method for atomic layer deposition
Grant 6,916,398 - Chen , et al. July 12, 2
2005-07-12
Gas delivery apparatus for atomic layer deposition
App 20030121608 - Chen, Ling ;   et al.
2003-07-03
Integration of ALD tantalum nitride and alpha-phase tantalum for copper metallization application
App 20030124262 - Chen, Ling ;   et al.
2003-07-03
Gas delivery apparatus and method for atomic layer deposition
App 20030079686 - Chen, Ling ;   et al.
2003-05-01

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