Nakashima; Naoto
Patent Applications and Registrations
Patent applications and USPTO patent grants for Nakashima; Naoto.The latest application filed is for "exposure method and apparatus".
- Nakashima; Naoto - Kurita JP
- Nakashima; Naoto - Shiga JP
- Nakashima; Naoto - Yokohama JP
| Patent | Date |
|---|---|
| Exposure method and apparatus Grant 5,008,702 - Tanaka , et al. April 16, 1 | 1991-04-16 |
| Method and apparatus for pattern detection Grant 4,993,837 - Oshida , et al. February 19, 1 | 1991-02-19 |
| Method and apparatus for optical alignment of semiconductor by using a hologram Grant 4,862,008 - Oshida , et al. August 29, 1 | 1989-08-29 |
| Illumination apparatus for exposure Grant 4,819,033 - Yoshitake , et al. April 4, 1 | 1989-04-04 |
| Reduction projection system alignment method and apparatus Grant 4,779,986 - Nakashima , et al. October 25, 1 | 1988-10-25 |
| Semiconductor exposure apparatus and alignment method therefor Grant 4,701,050 - Oshida , et al. October 20, 1 | 1987-10-20 |
| Exposure apparatus and method of aligning exposure mask with workpiece Grant 4,668,089 - Oshida , et al. May 26, 1 | 1987-05-26 |
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