Nakashima; Mutsuo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakashima; Mutsuo.The latest application filed is for "patterning process".

Company Profile

0.31.39

Nakashima; Mutsuo - Jyoetsu JP
Nakashima; Mutsuo - Joetsu JP
Nakashima; Mutsuo - Niigata-ken JP
NAKASHIMA; Mutsuo - Joetsu-shi JP
Nakashima, Mutsuo - Naka Kubiki-gun JP
Nakashima; Mutsuo - Nakakubiki-gun JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Patterning process Grant 8,198,016 - Hatakeyama , et al. June 12, 2	2012-06-12
Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing Grant 8,153,836 - Nakashima , et al. April 10, 2	2012-04-10
Double patterning process Grant 8,129,100 - Takemura , et al. March 6, 2	2012-03-06
Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method Grant 8,026,038 - Ogihara , et al. September 27, 2	2011-09-27
Resist composition and patterning process using the same Grant 7,745,094 - Nakashima , et al. June 29, 2	2010-06-29
Positive resist material and pattern formation method using the same Grant 7,651,829 - Hamada , et al. January 26, 2	2010-01-26
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process Grant 7,638,256 - Kinsho , et al. December 29, 2	2009-12-29
Patterning process App 20090286188 - Hatakeyama; Jun ; et al.	2009-11-19
Double Patterning Process App 20090253084 - TAKEMURA; Katsuya ; et al.	2009-10-08
Resist composition and patterning process Grant 7,550,247 - Nakashima , et al. June 23, 2	2009-06-23
Metal Oxide-containing Film-forming Composition, Metal Oxide-containing Film, Metal Oxide-containing Film-bearing Substrate, And Patterning Method App 20090136869 - OGIHARA; Tsutomu ; et al.	2009-05-28
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process Grant 7,485,408 - Kinsho , et al. February 3, 2	2009-02-03
Silsesquioxane Compound Mixture, Hydrolyzable Silane Compound, Making Methods, Resist Composition, Patterning Process, And Substrate Processing App 20080311514 - NAKASHIMA; Mutsuo ; et al.	2008-12-18
Silsesquioxane compound mixture, method of making, resist composition, and patterning process App 20080038664 - Hamada; Yoshitaka ; et al.	2008-02-14
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process App 20070218402 - Kinsho; Takeshi ; et al.	2007-09-20
Silsesquioxane compound mixture, method of making, resist composition, and patterning process Grant 7,265,234 - Hamada , et al. September 4, 2	2007-09-04
Resist composition and patterning process using the same App 20070190458 - Nakashima; Mutsuo ; et al.	2007-08-16
Resist composition and patterning process using the same App 20070190457 - Nakashima; Mutsuo ; et al.	2007-08-16
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process App 20070009832 - Kinsho; Takeshi ; et al.	2007-01-11
Silsesquioxane compound mixture, method of making, resist composition, and patterning process App 20060224009 - Hamada; Yoshitaka ; et al.	2006-10-05
Resist composition and patterning process App 20060040206 - Nakashima; Mutsuo ; et al.	2006-02-23
Acetal compound, polymer, resist composition and patterning process Grant 6,962,767 - Watanabe , et al. November 8, 2	2005-11-08
Radiation-sensitive polymer composition and pattern forming method using the same App 20050079443 - Noda, Kazumi ; et al.	2005-04-14
Polymer, resist composition and patterning process Grant 6,835,525 - Nishi , et al. December 28, 2	2004-12-28
Positive resist material and pattern formation method using the same App 20040241579 - Hamada, Yoshitaka ; et al.	2004-12-02
Ether, polymer, resist composition and patterning process Grant 6,784,268 - Tachibana , et al. August 31, 2	2004-08-31
Polymer, resist composition and patterning process Grant 6,780,563 - Hasegawa , et al. August 24, 2	2004-08-24
Cyclic acetal compound, polymer, resist composition and patterning process Grant 6,743,566 - Nakashima , et al. June 1, 2	2004-06-01
High molecular weight silicone compounds, resist compositions, and patterning method Grant 6,730,453 - Nakashima , et al. May 4, 2	2004-05-04
Ether, polymer, resist composition and patterning process App 20040013973 - Tachibana, Seiichiro ; et al.	2004-01-22
Polymers, resist materials, and pattern formation method Grant 6,677,101 - Nishi , et al. January 13, 2	2004-01-13
Polymer, resist composition and patterning process Grant 6,673,515 - Nishi , et al. January 6, 2	2004-01-06
Polymer, resist composition and patterning process Grant 6,670,094 - Nishi , et al. December 30, 2	2003-12-30
Ester compounds, polymers, resist compositions and patterning process Grant 6,670,498 - Nishi , et al. December 30, 2	2003-12-30
Polymer, resist composition and patterning process Grant 6,660,448 - Tachibana , et al. December 9, 2	2003-12-09
Ether, polymer, resist composition and patterning process Grant 6,624,335 - Tachibana , et al. September 23, 2	2003-09-23
Acetal compound, polymer, resist composition and patterning response App 20030153706 - Watanabe, Takeru ; et al.	2003-08-14
Polymer, resist composition and patterning process Grant 6,605,678 - Nishi , et al. August 12, 2	2003-08-12
Polymer, resist composition and patterning process App 20030120009 - Nishi, Tsunehiro ; et al.	2003-06-26
Polymers, resist compositions and patterning process Grant 6,566,038 - Nishi , et al. May 20, 2	2003-05-20
Novel ester compounds, polymers, resist compositions and patterning process App 20030088115 - Nishi, Tsunehiro ; et al.	2003-05-08
Cyclic acetal compound, polymer, resist composition and patterning process App 20030045731 - Nakashima, Mutsuo ; et al.	2003-03-06
Polymer, resist composition and patterning process Grant 6,492,089 - Hatakeyama , et al. December 10, 2	2002-12-10
Ether, polymer, resist composition and patterning process App 20020161150 - Tachibana, Seiichiro ; et al.	2002-10-31
Polymer, resist composition and patterning process App 20020150835 - Nishi, Tsunehiro ; et al.	2002-10-17
Cyclic acetal compound, polymer, resist composition and patterning process App 20020147290 - Nakashima, Mutsuo ; et al.	2002-10-10
Acetal compound, polymer, resist composition and patterning response App 20020132970 - Watanabe, Takeru ; et al.	2002-09-19
Polymers, resist materials, and pattern formation method App 20020132182 - Nishi, Tsunehiro ; et al.	2002-09-19
Acid-decomposable ester compound suitable for use in resist material Grant 6,448,420 - Kinsho , et al. September 10, 2	2002-09-10
Ester compounds, polymers, resist composition and patterning process Grant 6,444,396 - Watanabe , et al. September 3, 2	2002-09-03
Acid-decomposable Ester Compound Suitable For Use In Resist Material App 20020115874 - Kinsho, Takeshi ; et al.	2002-08-22
Polymer, resist composition and patterning process App 20020115807 - Nishi, Tsunehiro ; et al.	2002-08-22
Polymer, resist composition and patterning process App 20020102493 - Nishi, Tsunehiro ; et al.	2002-08-01
Polymer, resist composition and patterning process App 20020091215 - Tachibana, Seiichiro ; et al.	2002-07-11
Polymer, resist composition and patterning process App 20020061465 - Hasegawa, Koji ; et al.	2002-05-23
Polymer, resist composition and patterning process App 20020061463 - Nishi, Tsunehiro ; et al.	2002-05-23
High molecular weight silicone compounds, resist compositions, and patterning method App 20020058205 - Nakashima, Mutsuo ; et al.	2002-05-16
Styrene derivatives Grant 6,369,279 - Nakashima , et al. April 9, 2	2002-04-09
Novel ester compounds having alicyclic and oxirane structures and method for preparing the same App 20020035279 - Watanabe, Takeru ; et al.	2002-03-21
Novel lactone compounds having alicyclic structure and their manufacturing method App 20020019545 - Kinsho, Takeshi ; et al.	2002-02-14
Novel ester compounds, polymers, resist compositions and patterning process App 20020007031 - Nishi, Tsunehiro ; et al.	2002-01-17
Novel ester compounds having alicyclic structure and method for preparing same App 20010051741 - Watanabe, Takeru ; et al.	2001-12-13
Polymers, resist compositions and patterning process App 20010051316 - Nishi, Tsunehiro ; et al.	2001-12-13
Polymers, resist compositions and patterning process App 20010051315 - Nishi, Tsunehiro ; et al.	2001-12-13
Novel ester compounds having alicyclic structure and method for preparing same App 20010051742 - Hasegawa, Koji ; et al.	2001-12-13
Novel ester compounds, polymers, resist compositions and patterning process App 20010044071 - Hasegawa, Koji ; et al.	2001-11-22
Ester compounds, polymers, resist compositions and patterning process Grant 6,312,867 - Kinsho , et al. November 6, 2	2001-11-06
Polymer, resist composition and patterning process App 20010003772 - Hatakeyama, Jun ; et al.	2001-06-14
Ester compounds, polymers, resist composition and patterning process Grant 6,147,249 - Watanabe , et al. November 14, 2	2000-11-14
High molecular weight silicone compound, chemically amplified positive resist composition and patterning method Grant 5,972,560 - Kaneko , et al. October 26, 1	1999-10-26

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