NAKASHIMA; Hiromitsu

Patent Applications and Registrations

Patent applications and USPTO patent grants for NAKASHIMA; Hiromitsu.The latest application filed is for "radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound".

Company Profile

5.38.40

NAKASHIMA; Hiromitsu - Tokyo JP
Nakashima; Hiromitsu - Minato-ku N/A JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radiation-sensitive Resin Composition, Method Of Forming Resist Pattern, Polymer, And Compound App 20220299873 - NEMOTO; Ryuichi ; et al.	2022-09-22
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20220260908 - KANEKO; Tetsurou ; et al.	2022-08-18
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20220137508 - NAKAGAWA; Hiroki ; et al.	2022-05-05
Radiation-sensitive Resin Composition And Resist Pattern-forming Method App 20210389671 - KANEKO; Tetsurou ; et al.	2021-12-16
Resin Composition And Method Of Forming Resist Pattern App 20210388197 - SAKURAI; Tomohiko ; et al.	2021-12-16
Radiation-sensitive Resin Composition And Method For Forming Resist Pattern App 20210364918 - Nishikori; Katsuaki ; et al.	2021-11-25
Resin composition and method of forming resist pattern Grant 11,130,856 - Sakurai , et al. September 28, 2	2021-09-28
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20210278764 - NAKAGAWA; Hiroki ; et al.	2021-09-09
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 11,036,133 - Nakagawa , et al. June 15, 2	2021-06-15
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20200124961 - NAKAGAWA; Hiroki ; et al.	2020-04-23
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 10,620,534 - Nakagawa , et al.	2020-04-14
Resist pattern-forming method Grant 10,564,546 - Sakurai , et al. Feb	2020-02-18
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20190278175 - NAKAGAWA; Hiroki ; et al.	2019-09-12
Resin Composition And Method Of Forming Resist Pattern App 20190249000 - SAKURAI; Tomohiko ; et al.	2019-08-15
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20190025695 - NAKAGAWA; Hiroki ; et al.	2019-01-24
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 10,082,733 - Nakagawa , et al. September 25, 2	2018-09-25
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound Grant 10,048,586 - Asano , et al. August 14, 2	2018-08-14
Resist Pattern-forming Method App 20170329228 - SAKURAI; Tomohiko ; et al.	2017-11-16
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20170199453 - NAKAGAWA; Hiroki ; et al.	2017-07-13
Cap opening tool set and cap opener Grant 9,688,523 - Kamakura , et al. June 27, 2	2017-06-27
Radiation-sensitive resin composition, polymer and method for forming a resist pattern Grant 9,598,520 - Kiridoshi , et al. March 21, 2	2017-03-21
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound Grant 9,513,548 - Asano , et al. December 6, 2	2016-12-06
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 9,500,950 - Nakagawa , et al. November 22, 2	2016-11-22
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Polymerizable Compound App 20160179003 - ASANO; Yuusuke ; et al.	2016-06-23
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20160062237 - NAKAGAWA; Hiroki ; et al.	2016-03-03
Photoresist composition and resist pattern-forming method Grant 9,268,219 - Miyata , et al. February 23, 2	2016-02-23
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 9,213,236 - Nakagawa , et al. December 15, 2	2015-12-15
Composition for forming resist underlayer film and pattern-forming method Grant 9,116,427 - Kurita , et al. August 25, 2	2015-08-25
Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film Grant 9,046,765 - Nakashima , et al. June 2, 2	2015-06-02
Composition for formation of upper layer film, and method for formation of photoresist pattern Grant 8,895,229 - Nishimura , et al. November 25, 2	2014-11-25
Radiation-sensitive resin composition Grant 8,895,223 - Sato , et al. November 25, 2	2014-11-25
Cap Opening Tool Set and Cap Opener App 20140224071 - Kamakura; Takayuki ; et al.	2014-08-14
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Polymerizable Compound App 20140212813 - ASANO; Yuusuke ; et al.	2014-07-31
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20140162190 - NAKAGAWA; Hiroki ; et al.	2014-06-12
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound Grant 8,728,706 - Asano , et al. May 20, 2	2014-05-20
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 8,697,343 - Nakagawa , et al. April 15, 2	2014-04-15
Resist Pattern-forming Method, Resist Pattern-forming Radiation-sensitive Resin Composition, And Resist Film App 20140023968 - NAKASHIMA; Hiromitsu ; et al.	2014-01-23
Radiation-sensitive resin composition, method for forming resist pattern and polymer Grant 8,609,318 - Nakahara , et al. December 17, 2	2013-12-17
Radiation-sensitive resin composition, polymer and compound Grant 8,609,321 - Nakashima , et al. December 17, 2	2013-12-17
Radiation-sensitive resin composition and resist film formed using the same Grant 8,609,319 - Kimura , et al. December 17, 2	2013-12-17
Lactone copolymer and radiation-sensitive resin composition Grant 8,597,867 - Nakashima , et al. December 3, 2	2013-12-03
Composition For Forming Resist Underlayer Film And Pattern-forming Method App 20130233825 - KURITA; Shunsuke ; et al.	2013-09-12
Radiation-sensitive Resin Composition And Pattern-forming Method App 20130216948 - KASAHARA; Kazuki ; et al.	2013-08-22
Upper layer film forming composition and method of forming photoresist pattern Grant 8,507,189 - Kouno , et al. August 13, 2	2013-08-13
Radiation-sensitive Resin Composition, Polymer And Compound App 20130189621 - NAKASHIMA; Hiromitsu ; et al.	2013-07-25
Upper layer-forming composition and photoresist patterning method Grant 8,435,718 - Nakamura , et al. May 7, 2	2013-05-07
Photoresist Composition And Resist Pattern-forming Method App 20130089817 - MIYATA; Hiromu ; et al.	2013-04-11
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Compound App 20130022912 - SATO; Mitsuo ; et al.	2013-01-24
Radiation-sensitive Resin Composition, Polymer And Method For Forming A Resist Pattern App 20120295197 - KIRIDOSHI; Yuko ; et al.	2012-11-22
Radiation-sensitive resin composition and compound Grant 8,273,521 - Sato , et al. September 25, 2	2012-09-25
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, Polymer And Polymerizable Compound App 20120237875 - ASANO; Yuusuke ; et al.	2012-09-20
Radiation-sensitive Resin Composition App 20120219903 - SATO; Mitsuo ; et al.	2012-08-30
Polymer and positive-tone radiation-sensitive resin composition Grant 8,182,977 - Ikeda , et al. May 22, 2	2012-05-22
Radiation-sensitive Resin Composition And Resist Film Formed Using The Same App 20120082935 - Kimura; Toru ; et al.	2012-04-05
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern And Polymer App 20120034560 - NAKAHARA; Kazuo ; et al.	2012-02-09
Upper Layer-forming Composition And Photoresist Patterning Method App 20120028198 - NAKAMURA; Atsushi ; et al.	2012-02-02
Upper layer-forming composition and photoresist patterning method Grant 8,076,053 - Nakamura , et al. December 13, 2	2011-12-13
Radiation-sensitive Resin Composition And Polymer App 20110223537 - Ebata; Takuma ; et al.	2011-09-15
Radiation-sensitive Resin Composition And Compound App 20110027718 - SATO; Mitsuo ; et al.	2011-02-03
Polymer And Positive-tone Radiation-sensitive Resin Composition App 20100239981 - IKEDA; Norihiko ; et al.	2010-09-23
Upper Layer Film Forming Composition And Method Of Forming Photoresist Pattern App 20100040974 - Kouno; Daita ; et al.	2010-02-18
Composition For Formation Of Upper Layer Film, And Method For Formation Of Photoresist Pattern App 20100021852 - Nishimura; Yukio ; et al.	2010-01-28
Upper Layer-forming Composition And Photoresist Patterning Method App 20100003615 - Nakamura; Atsushi ; et al.	2010-01-07
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20090202945 - Nakagawa; Hiroki ; et al.	2009-08-13
Lactone copolymer and radiation-sensitive resin composition App 20090053649 - Nakashima; Hiromitsu ; et al.	2009-02-26
Radiation sensitive resin composition App 20070042292 - Yoneda; Eiji ; et al.	2007-02-22

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