loadpatents
name:-0.034148931503296
name:-0.024663925170898
name:-0.0089790821075439
Nakano; Ryu Patent Filings

Nakano; Ryu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakano; Ryu.The latest application filed is for "method of treating a substrate".

Company Profile
8.23.31
  • Nakano; Ryu - Sagamihara JP
  • Nakano; Ryu - Tokyo JP
  • Nakano; Ryu - Sagamihara-shi JP
  • Nakano; Ryu - Boise ID
  • Nakano; Ryu - Sagamahira N/A JP
  • Nakano; Ryu - Sagamahira-shi JP
  • Nakano; Ryu - Tama JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method Of Treating A Substrate
App 20220216059 - Liu; Zecheng ;   et al.
2022-07-07
Methods for forming doped silicon oxide thin films
Grant 11,302,527 - Takamure , et al. April 12, 2
2022-04-12
Method And System For Forming Patterned Structures Using Multiple Patterning Process
App 20220068639 - Inoue; Naoki ;   et al.
2022-03-03
Reactor System Comprising A Tuning Circuit
App 20210348273 - Nakano; Ryu ;   et al.
2021-11-11
Method For Forming Barrier Layer And Method For Manufacturing Semiconductor Device
App 20210313178 - Nakano; Ryu
2021-10-07
Method For Depositing Silicon Oxide Film Having Improved Quality By Peald Using Bis(diethylamino)silane
App 20210057214 - Kengoyama; Yuko ;   et al.
2021-02-25
Methods For Forming Doped Silicon Oxide Thin Films
App 20200388487 - Takamure; Noboru ;   et al.
2020-12-10
Methods for forming doped silicon oxide thin films
Grant 10,784,105 - Takamure , et al. Sept
2020-09-22
Methods For Forming Doped Silicon Oxide Thin Films
App 20200185218 - Takamure; Noboru ;   et al.
2020-06-11
Methods for forming doped silicon oxide thin films
Grant 10,510,530 - Takamure , et al. Dec
2019-12-17
Substrate Processing Method And Apparatus
App 20190259611 - Nakano; Akinori ;   et al.
2019-08-22
Methods For Forming Doped Silicon Oxide Thin Films
App 20190172708 - Takamure; Noboru ;   et al.
2019-06-06
Methods for forming doped silicon oxide thin films
Grant 10,147,600 - Takamure , et al. De
2018-12-04
Method for protecting layer by forming hydrocarbon-based extremely thin film
Grant 10,043,661 - Kato , et al. August 7, 2
2018-08-07
Methods For Forming Doped Silicon Oxide Thin Films
App 20180211834 - Takamure; Noboru ;   et al.
2018-07-26
Methods for forming doped silicon oxide thin films
Grant 9,875,893 - Takamure , et al. January 23, 2
2018-01-23
Methods For Forming Doped Silicon Oxide Thin Films
App 20170338111 - Takamure; Noboru ;   et al.
2017-11-23
Film forming apparatus, and method of manufacturing semiconductor device
Grant 9,673,092 - Nakano , et al. June 6, 2
2017-06-06
Method for stabilizing reaction chamber pressure
Grant 9,663,857 - Nakano , et al. May 30, 2
2017-05-30
Methods for forming doped silicon oxide thin films
Grant 9,564,314 - Takamure , et al. February 7, 2
2017-02-07
Method For Protecting Layer By Forming Hydrocarbon-based Extemely Thin Film
App 20170018420 - Kato; Richika ;   et al.
2017-01-19
Low-oxidation plasma-assisted process
Grant 9,464,352 - Nakano , et al. October 11, 2
2016-10-11
Methods For Forming Doped Silicon Oxide Thin Films
App 20160196970 - Takamure; Noboru ;   et al.
2016-07-07
Methods for forming doped silicon oxide thin films
Grant 9,368,352 - Takamure , et al. June 14, 2
2016-06-14
Method for trimming carbon-containing film at reduced trimming rate
Grant 9,343,308 - Isii , et al. May 17, 2
2016-05-17
Method for forming oxide film by plasma-assisted processing
Grant 9,284,642 - Nakano , et al. March 15, 2
2016-03-15
Low-Oxidation Plasma-Assisted Process
App 20150315704 - Nakano; Ryu ;   et al.
2015-11-05
Method for Stabilizing Reaction Chamber Pressure
App 20150284848 - Nakano; Ryu ;   et al.
2015-10-08
Methods for forming doped silicon oxide thin films
Grant 9,153,441 - Takamure , et al. October 6, 2
2015-10-06
Film Forming Apparatus, And Method Of Manufacturing Semiconductor Device
App 20150252479 - NAKANO; Ryu ;   et al.
2015-09-10
Method for controlling in-plane uniformity of substrate processed by plasma-assisted process
Grant 9,123,510 - Nakano , et al. September 1, 2
2015-09-01
Methods For Forming Doped Silicon Oxide Thin Films
App 20150147875 - Takamure; Noboru ;   et al.
2015-05-28
Method For Trimming Carbon-Containing Film At Reduced Trimming Rate
App 20150118846 - Isii; Yoshihiro ;   et al.
2015-04-30
Method for Forming Oxide Film by Plasma-Assisted Processing
App 20150079311 - Nakano; Ryu ;   et al.
2015-03-19
Methods For Forming Doped Silicon Oxide Thin Films
App 20150017794 - Takamure; Noboru ;   et al.
2015-01-15
Method For Controlling In-Plane Uniformity Of Substrate Processed By Plasma-Assisted Process
App 20140367359 - Nakano; Ryu ;   et al.
2014-12-18
Method for stabilizing plasma ignition
Grant 8,742,668 - Nakano , et al. June 3, 2
2014-06-03
Methods for forming doped silicon oxide thin films
Grant 8,679,958 - Takamure , et al. March 25, 2
2014-03-25
Method for Stabilizing Plasma Ignition
App 20140062304 - Nakano; Ryu ;   et al.
2014-03-06
Methods For Forming Doped Silicon Oxide Thin Films
App 20130115763 - Takamure; Noboru ;   et al.
2013-05-09
Footing reduction using etch-selective layer
Grant 8,298,951 - Nakano October 30, 2
2012-10-30
Footing Reduction Using Etch-Selective Layer
App 20120264305 - Nakano; Ryu
2012-10-18
Purge step-controlled sequence of processing semiconductor wafers
Grant 7,972,961 - Sugiyama , et al. July 5, 2
2011-07-05
Method of forming organosilicon oxide film and multilayer resist structure
Grant 7,829,159 - Nakano November 9, 2
2010-11-09
Plasma processing apparatus with insulated gas inlet pore
Grant 7,712,435 - Yoshizaki , et al. May 11, 2
2010-05-11
Purge Step-controlled Sequence Of Processing Semiconductor Wafers
App 20100093181 - Sugiyama; Toru ;   et al.
2010-04-15
Shower Plate Electrode For Plasma Cvd Reactor
App 20090155488 - Nakano; Ryu ;   et al.
2009-06-18
Plasma Cvd Apparatus Equipped With Plasma Blocking Insulation Plate
App 20070266945 - Shuto; Mitsutoshi ;   et al.
2007-11-22
Method of forming organosilicon oxide film and multilayer resist structure
App 20070141273 - Nakano; Ryu
2007-06-21
Plasma processing apparatus with insulated gas inlet pore
App 20060137610 - Yoshizaki; Yu ;   et al.
2006-06-29
Method of forming fluorine-doped low-dielectric-constant insulating film
Grant 7,037,855 - Tsuji , et al. May 2, 2
2006-05-02
Method Of Forming Fluorine-doped Low-dielectric-constant Insulating Film
App 20060046519 - Tsuji; Naoto ;   et al.
2006-03-02

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