| Patent | Date |
|---|
(meth)acrylate Derivative, Polymer And Photoresist Composition Having Lactone Structure, And Method For Forming Pattern By Using It
App 20150183912 - MAEDA; Katsumi ; et al. | 2015-07-02 |
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
Grant 8,969,483 - Maeda , et al. March 3, 2 | 2015-03-03 |
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
Grant 8,802,798 - Maeda , et al. August 12, 2 | 2014-08-12 |
Electricity storage device
Grant 8,617,744 - Nakahara , et al. December 31, 2 | 2013-12-31 |
(meth)acrylate Derivative, Polymer And Photoresist Composition Having Lactone Structure, And Method For Forming Pattern By Using It
App 20130122419 - MAEDA; Katsumi ; et al. | 2013-05-16 |
Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide
Grant 8,414,733 - Maeda , et al. April 9, 2 | 2013-04-09 |
Ferrule, and method of producing an optical waveguide connector, and optical waveguide connector which use the ferrule
Grant 8,388,238 - Ohmura , et al. March 5, 2 | 2013-03-05 |
Optical connector
Grant 8,297,855 - Koreeda , et al. October 30, 2 | 2012-10-30 |
(meth)acrylate Derivative, Polymer And Photoresist Composition Having Lactone Structure, And Method For Forming Pattern By Using It
App 20120178023 - Maeda; Katsumi ; et al. | 2012-07-12 |
Secondary Battery
App 20120171542 - Matsumoto; Kazuaki ; et al. | 2012-07-05 |
Electricity Storage Device
App 20120100437 - Nakahara; Kentaro ; et al. | 2012-04-26 |
(meth)acrylate Derivative, Polymer And Photoresist Composition Having Lactone Structure, And Method For Forming Pattern By Using It
App 20110196122 - Maeda; Katsumi ; et al. | 2011-08-11 |
Secondary Battery
App 20110159379 - Matsumoto; Kazuaki ; et al. | 2011-06-30 |
Photosensitive Resin Composition For Optical Waveguide Formation, Optical Waveguide And Method For Producing Optical Waveguide
App 20110044597 - MAEDA; KATSUMI ; et al. | 2011-02-24 |
Photosensitive Resin Composition, Method For Control Of Refractive Index, And Optical Waveguide And Optical Component Using The Same
App 20100329616 - Chen; Ning-Juan ; et al. | 2010-12-30 |
Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide
Grant 7,847,017 - Maeda , et al. December 7, 2 | 2010-12-07 |
Polymer Optical Waveguide Forming Material, Polymer Optical Waveguide And Manufacturing Method Of Polymer Optical Waveguide
App 20100150506 - Maeda; Katsumi ; et al. | 2010-06-17 |
Optical Connector
App 20100054673 - Koreeda; Yuichi ; et al. | 2010-03-04 |
Ferrule, And Method Of Producing An Optical Waveguide Connector, And Optical Waveguide Connector Which Use The Ferrule
App 20100014815 - Ohmura; Masaki ; et al. | 2010-01-21 |
Photosensitive Resin Composition For Optical Waveguide Formation, Optical Waveguide And Method For Producing Optical Waveguide
App 20090046986 - Maeda; Katsumi ; et al. | 2009-02-19 |
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
App 20090023878 - Maeda; Katsumi ; et al. | 2009-01-22 |
Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
Grant 7,470,499 - Maeda , et al. December 30, 2 | 2008-12-30 |
Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern
Grant 7,439,005 - Maeda , et al. October 21, 2 | 2008-10-21 |
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
Grant 7,432,035 - Maeda , et al. October 7, 2 | 2008-10-07 |
Structure and method for mounting LSI package onto photoelectric wiring board, information processing apparatus, optical interface, and photoelectric wiring board
Grant 7,333,683 - Sasaki , et al. February 19, 2 | 2008-02-19 |
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
App 20070218403 - Maeda; Katsumi ; et al. | 2007-09-20 |
Optical-element integrated semiconductor integrated circuit and fabrication method thereof
App 20070164297 - Oda; Mikio ; et al. | 2007-07-19 |
Optical input substrate, optical output substrate, optical input/output substrate, a fabrication method for these substrates, and an optical element integrated semiconductor integrated circuit
App 20070165979 - Oda; Mikio ; et al. | 2007-07-19 |
Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same
Grant 7,232,639 - Maeda , et al. June 19, 2 | 2007-06-19 |
Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern
App 20070134586 - Maeda; Katsumi ; et al. | 2007-06-14 |
Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formation
Grant 7,192,682 - Maeda , et al. March 20, 2 | 2007-03-20 |
(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
Grant 7,186,495 - Maeda , et al. March 6, 2 | 2007-03-06 |
Photosensitive resin composition for forming optical waveguide, optical waveguide, and method for forming optical waveguide pattern
App 20070041698 - Maeda; Katsumi ; et al. | 2007-02-22 |
Structure and method for mounting LSI package onto photoelectric wiring board, information processing apparatus, optical interface, and photoelectric wiring board
App 20060078248 - Sasaki; Junichi ; et al. | 2006-04-13 |
Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
App 20060073408 - Maeda; Katsumi ; et al. | 2006-04-06 |
Resist resin, chemical amplification type resist, and method of forming of pattern with the same
Grant 6,924,079 - Maeda , et al. August 2, 2 | 2005-08-02 |
Monomer having fluorine-containing acetalor ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same
App 20050164119 - Maeda, Katsumi ; et al. | 2005-07-28 |
Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions
Grant 6,849,384 - Iwasa , et al. February 1, 2 | 2005-02-01 |
Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation
App 20040265732 - Maeda, Katsumi ; et al. | 2004-12-30 |
Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition
Grant 6,746,722 - Maeda , et al. June 8, 2 | 2004-06-08 |
Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
Grant 6,710,188 - Maeda , et al. March 23, 2 | 2004-03-23 |
Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
App 20030224297 - Maeda, Katsumi ; et al. | 2003-12-04 |
Resist resin, chemical amplification type resist, and method of forming of pattern with the same
App 20030211734 - Maeda, Katsumi ; et al. | 2003-11-13 |
Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
Grant 6,639,084 - Maeda , et al. October 28, 2 | 2003-10-28 |
Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method
Grant 6,638,685 - Maeda , et al. October 28, 2 | 2003-10-28 |
Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions
App 20030198889 - Iwasa, Shigeyuki ; et al. | 2003-10-23 |
Sulfonium salt compound and resist composition and pattern forming method using the same
Grant 6,602,647 - Iwasa , et al. August 5, 2 | 2003-08-05 |
Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer
App 20030097008 - Maeda, Katsumi ; et al. | 2003-05-22 |
(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition
Grant 6,559,337 - Maeda , et al. May 6, 2 | 2003-05-06 |
Sulfonium salt compound, photoresist composition and method for patterning by employing same
Grant 6,528,232 - Maeda , et al. March 4, 2 | 2003-03-04 |
Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition
App 20030036618 - Maeda, Katsumi ; et al. | 2003-02-20 |
Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method
App 20020182535 - Maeda, Katsumi ; et al. | 2002-12-05 |
(Meth) acrylate, polymer, photoresist composition, and pattern forming process making use of the composition
App 20020111509 - Maeda, Katsumi ; et al. | 2002-08-15 |
Sulfonium salt compound and resist composition and pattern forming method using the same
App 20020045122 - Iwasa, Shigeyuki ; et al. | 2002-04-18 |
Positive chemically amplified resist and method for forming its pattern
App 20020042018 - Maeda, Katsumi ; et al. | 2002-04-11 |
(Meth) acrylate, polymer, photoresist composition, and pattern forming process making use of the composition
App 20010031429 - Maeda, Katsumi ; et al. | 2001-10-18 |
(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
App 20010026901 - Maeda, Katsumi ; et al. | 2001-10-04 |
Photosensitive Resin Composition And Patterning Method Using The Same
App 20010021482 - NAKANO, KAICHIRO ; et al. | 2001-09-13 |
Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same
Grant 6,146,806 - Maeda , et al. November 14, 2 | 2000-11-14 |
Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same
Grant 6,140,010 - Iwasa , et al. October 31, 2 | 2000-10-31 |
Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist
Grant 5,994,025 - Iwasa , et al. November 30, 1 | 1999-11-30 |
Photoresist and compounds for composing the photoresist
Grant 5,985,522 - Iwasa , et al. November 16, 1 | 1999-11-16 |
Photosensitive resin and method for patterning by use of the same
Grant 5,866,304 - Nakano , et al. February 2, 1 | 1999-02-02 |
Photosensitive resin and method for patterning by use of the same
Grant 5,738,975 - Nakano , et al. April 14, 1 | 1998-04-14 |
Photoresist and monomer and polymer for composing the photoresist
Grant 5,665,518 - Maeda , et al. September 9, 1 | 1997-09-09 |
Alkylsulfonium salts and photoresist compositions containing the same
Grant 5,635,332 - Nakano , et al. June 3, 1 | 1997-06-03 |
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