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EGR device Grant 11,415,087 - Kosaka , et al. August 16, 2 | 2022-08-16 |
Plasma film-forming apparatus and substrate pedestal Grant 10,968,513 - Imanaka , et al. April 6, 2 | 2021-04-06 |
Exhaust Component Cleaning Method And Substrate Processing Apparatus Including Exhaust Component App 20210071296 - Watarai; Toshiharu ;   et al. | 2021-03-11 |
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Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition App 20200365391 - Blanquart; Timothee Julien Vincent ;   et al. | 2020-11-19 |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition Grant 10,755,922 - Blanquart , et al. A | 2020-08-25 |
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition App 20200013612 - Blanquart; Timothee Julien Vincent ;   et al. | 2020-01-09 |
Modular measurement apparatus Grant 10,318,441 - Inoue , et al. | 2019-06-11 |
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Microwave Plasma Source And Microwave Plasma Processing Apparatus App 20180127880 - Kotani; Koji ;   et al. | 2018-05-10 |
Plasma Film-forming Apparatus And Substrate Pedestal App 20170369996 - Imanaka; Masashi ;   et al. | 2017-12-28 |
Plasma Film-forming Method And Plasma Film-forming Apparatus App 20170370000 - Honda; Minoru ;   et al. | 2017-12-28 |
Processing Method Of Silicon Nitride Film And Forming Method Of Silicon Nitride Film App 20170356084 - Nakanishi; Toshio ;   et al. | 2017-12-14 |
Microwave Plasma Processing Apparatus And Microwave Plasma Processing Method App 20170358835 - Nakanishi; Toshio ;   et al. | 2017-12-14 |
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Measurement Apparatus App 20160139098 - INOUE; Yoshinori ;   et al. | 2016-05-19 |
Plasma Processing Method And Plasma Processing Apparatus App 20150162193 - Katayama; Daisuke ;   et al. | 2015-06-11 |
Plasma Processing Method And Plasma Processing Apparatus App 20150093886 - Honda; Minoru ;   et al. | 2015-04-02 |
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Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device Grant 8,569,186 - Kohno , et al. October 29, 2 | 2013-10-29 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device App 20130072033 - Kohno; Masayuki ;   et al. | 2013-03-21 |
Plasma cleaning method and plasma CVD method Grant 8,366,953 - Kohno , et al. February 5, 2 | 2013-02-05 |
Crystalline Silicon Film Forming Method And Plasma Cvd Apparatus App 20120315745 - Katayama; Daisuke ;   et al. | 2012-12-13 |
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device Grant 8,329,596 - Kohno , et al. December 11, 2 | 2012-12-11 |
Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus Grant 8,318,614 - Kohno , et al. November 27, 2 | 2012-11-27 |
MOS semiconductor memory device having charge storage region formed from stack of insulating films Grant 8,258,571 - Endoh , et al. September 4, 2 | 2012-09-04 |
Method for forming insulating film and method for manufacturing semiconductor device Grant 8,247,331 - Honda , et al. August 21, 2 | 2012-08-21 |
Method Of Forming Silicon Nitride Film And Method Of Manufacturing Semiconductor Memory Device App 20120208376 - Honda; Minoru ;   et al. | 2012-08-16 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device App 20120178268 - KOHNO; Masayuki ;   et al. | 2012-07-12 |
Silicon Dioxide Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device App 20120126376 - Honda; Minoru ;   et al. | 2012-05-24 |
Plasma processing method Grant 8,183,165 - Matsuyama , et al. May 22, 2 | 2012-05-22 |
Method for forming insulating film and method for manufacturing semiconductor device Grant 8,158,535 - Honda , et al. April 17, 2 | 2012-04-17 |
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device Grant 8,138,103 - Kohno , et al. March 20, 2 | 2012-03-20 |
Forming a MOS memory device having a dielectric film laminate as a charge accumulation region Grant 8,124,484 - Endoh , et al. February 28, 2 | 2012-02-28 |
Forming a silicon nitride film by plasma CVD Grant 8,119,545 - Honda , et al. February 21, 2 | 2012-02-21 |
Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatus Grant 8,114,790 - Kohno , et al. February 14, 2 | 2012-02-14 |
Method of modifying insulating film Grant 8,021,987 - Sugawara , et al. September 20, 2 | 2011-09-20 |
Silicon Oxide Film, Method For Forming Silicon Oxide Film, And Plasma Cvd Apparatus App 20110206590 - Honda; Minoru ;   et al. | 2011-08-25 |
Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus Grant 7,968,470 - Ohmi , et al. June 28, 2 | 2011-06-28 |
Method for forming insulating film and method for manufacturing semiconductor device Grant 7,960,293 - Honda , et al. June 14, 2 | 2011-06-14 |
Plasma Processing Method And Computer Storage Medium App 20110124202 - MATSUYAMA; Seiji ;   et al. | 2011-05-26 |
Process For Producing Silicon Nitride Film, Process For Producing Silicon Nitride Film Laminate, Computer-readable Storage Medium, And Plasma Cvd Device App 20110086517 - Honda; Minoru ;   et al. | 2011-04-14 |
Method For Manufacturing A Mos Semiconductor Memory Device, And Plasma Cvd Device App 20110086485 - Endoh; Tetsuo ;   et al. | 2011-04-14 |
Method of forming gate insulation film, semiconductor device, and computer recording medium Grant 7,915,177 - Nishita , et al. March 29, 2 | 2011-03-29 |
Plasma processing method and computer storage medium Grant 7,897,518 - Matsuyama , et al. March 1, 2 | 2011-03-01 |
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device App 20100323529 - Honda; Minoru ;   et al. | 2010-12-23 |
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device App 20100323531 - Honda; Minoru ;   et al. | 2010-12-23 |
Plasma Processing Apparatus App 20100307684 - Ota; Ryosaku ;   et al. | 2010-12-09 |
Mos Semiconductor Memory Device App 20100283097 - Endoh; Tetsuo ;   et al. | 2010-11-11 |
Method for nitriding substrate and method for forming insulating film Grant 7,820,557 - Honda , et al. October 26, 2 | 2010-10-26 |
Plasma Processing Method And Computer Storage Medium App 20100196627 - MATSUYAMA; Seiji ;   et al. | 2010-08-05 |
RLSA CVD deposition control using halogen gas for hydrogen scavenging Grant 7,763,551 - Brcka , et al. July 27, 2 | 2010-07-27 |
Silicon Nitride Film And Nonvolatile Semiconductor Memory Device App 20100140683 - Miyazaki; Seiichi ;   et al. | 2010-06-10 |
Method Of Forming Gate Insulation Film, Semiconductor Device, And Computer Recording Medium App 20100130023 - Nishita; Tatsuo ;   et al. | 2010-05-27 |
Plasma processing method and computer storage medium Grant 7,723,241 - Matsuyama , et al. May 25, 2 | 2010-05-25 |
Method Of Modifying Insulating Film App 20100105215 - SUGAWARA; Takuya ;   et al. | 2010-04-29 |
Method for Forming Insulation Film App 20100096707 - Sugawara; Takuya ;   et al. | 2010-04-22 |
Method of forming gate insulating film, semiconductor device and computer recording medium Grant 7,674,722 - Nishita , et al. March 9, 2 | 2010-03-09 |
Method For Forming Silicon Nitride Film, Method For Manufacturing Nonvolatile Semiconductor Memory Device, Nonvolatile Semiconductor Memory Device And Plasma Apparatus App 20100052040 - Kohno; Masayuki ;   et al. | 2010-03-04 |
Method for forming insulation film Grant 7,662,236 - Sugawara , et al. February 16, 2 | 2010-02-16 |
Method of modifying insulating film Grant 7,655,574 - Sugawara , et al. February 2, 2 | 2010-02-02 |
Plasma Cleaning Method And Plasma Cvd Method App 20090308840 - Kohno; Masayuki ;   et al. | 2009-12-17 |
Method for forming underlying insulation film Grant 7,622,402 - Sugawara , et al. November 24, 2 | 2009-11-24 |
Method For Nitriding Substrate And Method For Forming Insulating Film App 20090269940 - Honda; Minoru ;   et al. | 2009-10-29 |
Rlsa Cvd Deposition Control Using Halogen Gas For Hydrogen Scavenging App 20090241310 - Brcka; Jozef ;   et al. | 2009-10-01 |
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device App 20090239364 - Nishita; Tatsuo ;   et al. | 2009-09-24 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film, Method For Manufacturing Semiconductor Device And Plasma Cvd Method App 20090203228 - Kohno; Masayuki ;   et al. | 2009-08-13 |
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device App 20090197376 - Kohno; Masayuki ;   et al. | 2009-08-06 |
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device App 20090197403 - Honda; Minoru ;   et al. | 2009-08-06 |
Plasma Nitriding Method, Method For Manufacturing Semiconductor Device And Plasma Processing Apparatus App 20090104787 - Ohmi; Tadahiro ;   et al. | 2009-04-23 |
Nitriding Method Of Gate Oxide Film App 20090035950 - Matsuyama; Seijii ;   et al. | 2009-02-05 |
Plasma Treatment Apparatus And Plasma Treatment Method App 20090029564 - Yamashita; Jun ;   et al. | 2009-01-29 |
Method for Forming Insulation Film App 20080274370 - Sugawara; Takuya ;   et al. | 2008-11-06 |
Method for forming insulation film Grant 7,446,052 - Sugawara , et al. November 4, 2 | 2008-11-04 |
Nitriding method of gate oxide film Grant 7,429,539 - Matsuyama , et al. September 30, 2 | 2008-09-30 |
Forming Method and Forming System for Insulation Film App 20080214017 - Murakawa; Shigemi ;   et al. | 2008-09-04 |
Forming method and forming system for insulation film Grant 7,374,635 - Murakawa , et al. May 20, 2 | 2008-05-20 |
Method of Forming Gate Insulating Film, Semiconductor Device and Computer Recording Medium App 20070290247 - Nishita; Tatsuo ;   et al. | 2007-12-20 |
Method for producing material of electronic device App 20070224837 - Sugawara; Takuya ;   et al. | 2007-09-27 |
Process for producing materials for electronic device App 20070218687 - Sugawara; Takuya ;   et al. | 2007-09-20 |
Substrate Processing Method And Material For Electronic Device App 20070204959 - NAKANISHI; Toshio ;   et al. | 2007-09-06 |
Substrate processing method and material for electronic device Grant 7,250,375 - Nakanishi , et al. July 31, 2 | 2007-07-31 |
Substrate processing method Grant 7,232,772 - Matsuyama , et al. June 19, 2 | 2007-06-19 |
Nitriding Method Of Gate Oxide Film App 20070134895 - Matsuyama; Seijii ;   et al. | 2007-06-14 |
Substrate processing method Grant 7,226,874 - Matsuyama , et al. June 5, 2 | 2007-06-05 |
Process for producing materials for electronic device Grant 7,217,659 - Sugawara , et al. May 15, 2 | 2007-05-15 |
Forming method and forming system for insulation film App 20070085154 - Murakawa; Shigemi ;   et al. | 2007-04-19 |
Plasma processing method and computer storage medium App 20070059944 - Matsuyama; Seiji ;   et al. | 2007-03-15 |
Forming system for insulation film Grant 7,166,185 - Murakawa , et al. January 23, 2 | 2007-01-23 |
Plasma processing method App 20060269694 - Honda; Minoru ;   et al. | 2006-11-30 |
Method of modifying insulating film App 20060199398 - Sugawara; Takuya ;   et al. | 2006-09-07 |
Plasma processing apparatus and plasma processing method App 20060156984 - Nozawa; Toshihisa ;   et al. | 2006-07-20 |
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Substrate processing method App 20060024864 - Nakanishi; Toshio ;   et al. | 2006-02-02 |
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Method for forming insulation film App 20050161434 - Sugawara, Takuya ;   et al. | 2005-07-28 |
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Electronic game housing Grant D406,613 - Nakanishi March 9, 1 | 1999-03-09 |
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