loadpatents
name:-0.084995031356812
name:-0.060998916625977
name:-0.0052938461303711
Nakanishi; Toshio Patent Filings

Nakanishi; Toshio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakanishi; Toshio.The latest application filed is for "exhaust component cleaning method and substrate processing apparatus including exhaust component".

Company Profile
5.52.69
  • Nakanishi; Toshio - Sakai JP
  • Nakanishi; Toshio - Yamanashi JP
  • Nakanishi; Toshio - Tokyo JP
  • NAKANISHI; Toshio - Osaka JP
  • Nakanishi; Toshio - Tama JP
  • Nakanishi; Toshio - Niwa-gun JP
  • Nakanishi; Toshio - Aichi JP
  • Nakanishi; Toshio - Nirasaki JP
  • Nakanishi; Toshio - Nirasaki City JP
  • Nakanishi; Toshio - Amagasaki JP
  • Nakanishi; Toshio - Amagasaki-shi JP
  • Nakanishi; Toshio - Hyogo JP
  • Nakanishi; Toshio - Nirasaki-shi JP
  • Nakanishi; Toshio - Hyogo-ken JP
  • Nakanishi; Toshio - Amagasaki City JP
  • Nakanishi; Toshio - Takarazuka JP
  • Nakanishi; Toshio - Okazaki JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
EGR device
Grant 11,415,087 - Kosaka , et al. August 16, 2
2022-08-16
Plasma film-forming apparatus and substrate pedestal
Grant 10,968,513 - Imanaka , et al. April 6, 2
2021-04-06
Exhaust Component Cleaning Method And Substrate Processing Apparatus Including Exhaust Component
App 20210071296 - Watarai; Toshiharu ;   et al.
2021-03-11
Egr Device
App 20200408172 - KOSAKA; Tetsuya ;   et al.
2020-12-31
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition
App 20200365391 - Blanquart; Timothee Julien Vincent ;   et al.
2020-11-19
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
Grant 10,755,922 - Blanquart , et al. A
2020-08-25
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition
App 20200013612 - Blanquart; Timothee Julien Vincent ;   et al.
2020-01-09
Modular measurement apparatus
Grant 10,318,441 - Inoue , et al.
2019-06-11
Plasma film-forming method and plasma film-forming apparatus
Grant 10,190,217 - Honda , et al. Ja
2019-01-29
Particulate measurement apparatus and particulate measurement system
Grant 10,094,757 - Hisada , et al. October 9, 2
2018-10-09
Processing method of silicon nitride film and forming method of silicon nitride film
Grant 10,017,853 - Nakanishi , et al. July 10, 2
2018-07-10
Microwave Plasma Source And Microwave Plasma Processing Apparatus
App 20180127880 - Kotani; Koji ;   et al.
2018-05-10
Plasma Film-forming Apparatus And Substrate Pedestal
App 20170369996 - Imanaka; Masashi ;   et al.
2017-12-28
Plasma Film-forming Method And Plasma Film-forming Apparatus
App 20170370000 - Honda; Minoru ;   et al.
2017-12-28
Processing Method Of Silicon Nitride Film And Forming Method Of Silicon Nitride Film
App 20170356084 - Nakanishi; Toshio ;   et al.
2017-12-14
Microwave Plasma Processing Apparatus And Microwave Plasma Processing Method
App 20170358835 - Nakanishi; Toshio ;   et al.
2017-12-14
Plasma processing method and plasma processing apparatus
Grant 9,779,936 - Katayama , et al. October 3, 2
2017-10-03
Engine
Grant 9,670,883 - Matsuishi , et al. June 6, 2
2017-06-06
Particulate Measurement Apparatus And Particulate Measurement System
App 20170115199 - HISADA; Kaoru ;   et al.
2017-04-27
Measurement Apparatus
App 20160139098 - INOUE; Yoshinori ;   et al.
2016-05-19
Plasma Processing Method And Plasma Processing Apparatus
App 20150162193 - Katayama; Daisuke ;   et al.
2015-06-11
Plasma Processing Method And Plasma Processing Apparatus
App 20150093886 - Honda; Minoru ;   et al.
2015-04-02
Engine
App 20150082772 - MATSUISHI; Kazumichi ;   et al.
2015-03-26
Internal combustion engine
Grant D721,097 - Kosaka , et al. January 13, 2
2015-01-13
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,569,186 - Kohno , et al. October 29, 2
2013-10-29
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20130072033 - Kohno; Masayuki ;   et al.
2013-03-21
Plasma cleaning method and plasma CVD method
Grant 8,366,953 - Kohno , et al. February 5, 2
2013-02-05
Crystalline Silicon Film Forming Method And Plasma Cvd Apparatus
App 20120315745 - Katayama; Daisuke ;   et al.
2012-12-13
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,329,596 - Kohno , et al. December 11, 2
2012-12-11
Method for forming silicon nitride film, method for manufacturing nonvolatile semiconductor memory device, nonvolatile semiconductor memory device and plasma apparatus
Grant 8,318,614 - Kohno , et al. November 27, 2
2012-11-27
MOS semiconductor memory device having charge storage region formed from stack of insulating films
Grant 8,258,571 - Endoh , et al. September 4, 2
2012-09-04
Method for forming insulating film and method for manufacturing semiconductor device
Grant 8,247,331 - Honda , et al. August 21, 2
2012-08-21
Method Of Forming Silicon Nitride Film And Method Of Manufacturing Semiconductor Memory Device
App 20120208376 - Honda; Minoru ;   et al.
2012-08-16
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20120178268 - KOHNO; Masayuki ;   et al.
2012-07-12
Silicon Dioxide Film And Process For Production Thereof, Computer-readable Storage Medium, And Plasma Cvd Device
App 20120126376 - Honda; Minoru ;   et al.
2012-05-24
Plasma processing method
Grant 8,183,165 - Matsuyama , et al. May 22, 2
2012-05-22
Method for forming insulating film and method for manufacturing semiconductor device
Grant 8,158,535 - Honda , et al. April 17, 2
2012-04-17
Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device
Grant 8,138,103 - Kohno , et al. March 20, 2
2012-03-20
Forming a MOS memory device having a dielectric film laminate as a charge accumulation region
Grant 8,124,484 - Endoh , et al. February 28, 2
2012-02-28
Forming a silicon nitride film by plasma CVD
Grant 8,119,545 - Honda , et al. February 21, 2
2012-02-21
Plasma CVD method, silicon nitride film formation method, semiconductor device manufacturing method, and plasma CVD apparatus
Grant 8,114,790 - Kohno , et al. February 14, 2
2012-02-14
Method of modifying insulating film
Grant 8,021,987 - Sugawara , et al. September 20, 2
2011-09-20
Silicon Oxide Film, Method For Forming Silicon Oxide Film, And Plasma Cvd Apparatus
App 20110206590 - Honda; Minoru ;   et al.
2011-08-25
Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus
Grant 7,968,470 - Ohmi , et al. June 28, 2
2011-06-28
Method for forming insulating film and method for manufacturing semiconductor device
Grant 7,960,293 - Honda , et al. June 14, 2
2011-06-14
Plasma Processing Method And Computer Storage Medium
App 20110124202 - MATSUYAMA; Seiji ;   et al.
2011-05-26
Process For Producing Silicon Nitride Film, Process For Producing Silicon Nitride Film Laminate, Computer-readable Storage Medium, And Plasma Cvd Device
App 20110086517 - Honda; Minoru ;   et al.
2011-04-14
Method For Manufacturing A Mos Semiconductor Memory Device, And Plasma Cvd Device
App 20110086485 - Endoh; Tetsuo ;   et al.
2011-04-14
Method of forming gate insulation film, semiconductor device, and computer recording medium
Grant 7,915,177 - Nishita , et al. March 29, 2
2011-03-29
Plasma processing method and computer storage medium
Grant 7,897,518 - Matsuyama , et al. March 1, 2
2011-03-01
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device
App 20100323529 - Honda; Minoru ;   et al.
2010-12-23
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device
App 20100323531 - Honda; Minoru ;   et al.
2010-12-23
Plasma Processing Apparatus
App 20100307684 - Ota; Ryosaku ;   et al.
2010-12-09
Mos Semiconductor Memory Device
App 20100283097 - Endoh; Tetsuo ;   et al.
2010-11-11
Method for nitriding substrate and method for forming insulating film
Grant 7,820,557 - Honda , et al. October 26, 2
2010-10-26
Plasma Processing Method And Computer Storage Medium
App 20100196627 - MATSUYAMA; Seiji ;   et al.
2010-08-05
RLSA CVD deposition control using halogen gas for hydrogen scavenging
Grant 7,763,551 - Brcka , et al. July 27, 2
2010-07-27
Silicon Nitride Film And Nonvolatile Semiconductor Memory Device
App 20100140683 - Miyazaki; Seiichi ;   et al.
2010-06-10
Method Of Forming Gate Insulation Film, Semiconductor Device, And Computer Recording Medium
App 20100130023 - Nishita; Tatsuo ;   et al.
2010-05-27
Plasma processing method and computer storage medium
Grant 7,723,241 - Matsuyama , et al. May 25, 2
2010-05-25
Method Of Modifying Insulating Film
App 20100105215 - SUGAWARA; Takuya ;   et al.
2010-04-29
Method for Forming Insulation Film
App 20100096707 - Sugawara; Takuya ;   et al.
2010-04-22
Method of forming gate insulating film, semiconductor device and computer recording medium
Grant 7,674,722 - Nishita , et al. March 9, 2
2010-03-09
Method For Forming Silicon Nitride Film, Method For Manufacturing Nonvolatile Semiconductor Memory Device, Nonvolatile Semiconductor Memory Device And Plasma Apparatus
App 20100052040 - Kohno; Masayuki ;   et al.
2010-03-04
Method for forming insulation film
Grant 7,662,236 - Sugawara , et al. February 16, 2
2010-02-16
Method of modifying insulating film
Grant 7,655,574 - Sugawara , et al. February 2, 2
2010-02-02
Plasma Cleaning Method And Plasma Cvd Method
App 20090308840 - Kohno; Masayuki ;   et al.
2009-12-17
Method for forming underlying insulation film
Grant 7,622,402 - Sugawara , et al. November 24, 2
2009-11-24
Method For Nitriding Substrate And Method For Forming Insulating Film
App 20090269940 - Honda; Minoru ;   et al.
2009-10-29
Rlsa Cvd Deposition Control Using Halogen Gas For Hydrogen Scavenging
App 20090241310 - Brcka; Jozef ;   et al.
2009-10-01
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device
App 20090239364 - Nishita; Tatsuo ;   et al.
2009-09-24
Plasma Cvd Method, Method For Forming Silicon Nitride Film, Method For Manufacturing Semiconductor Device And Plasma Cvd Method
App 20090203228 - Kohno; Masayuki ;   et al.
2009-08-13
Plasma Cvd Method, Method For Forming Silicon Nitride Film And Method For Manufacturing Semiconductor Device
App 20090197376 - Kohno; Masayuki ;   et al.
2009-08-06
Method For Forming Insulating Film And Method For Manufacturing Semiconductor Device
App 20090197403 - Honda; Minoru ;   et al.
2009-08-06
Plasma Nitriding Method, Method For Manufacturing Semiconductor Device And Plasma Processing Apparatus
App 20090104787 - Ohmi; Tadahiro ;   et al.
2009-04-23
Nitriding Method Of Gate Oxide Film
App 20090035950 - Matsuyama; Seijii ;   et al.
2009-02-05
Plasma Treatment Apparatus And Plasma Treatment Method
App 20090029564 - Yamashita; Jun ;   et al.
2009-01-29
Method for Forming Insulation Film
App 20080274370 - Sugawara; Takuya ;   et al.
2008-11-06
Method for forming insulation film
Grant 7,446,052 - Sugawara , et al. November 4, 2
2008-11-04
Nitriding method of gate oxide film
Grant 7,429,539 - Matsuyama , et al. September 30, 2
2008-09-30
Forming Method and Forming System for Insulation Film
App 20080214017 - Murakawa; Shigemi ;   et al.
2008-09-04
Forming method and forming system for insulation film
Grant 7,374,635 - Murakawa , et al. May 20, 2
2008-05-20
Method of Forming Gate Insulating Film, Semiconductor Device and Computer Recording Medium
App 20070290247 - Nishita; Tatsuo ;   et al.
2007-12-20
Method for producing material of electronic device
App 20070224837 - Sugawara; Takuya ;   et al.
2007-09-27
Process for producing materials for electronic device
App 20070218687 - Sugawara; Takuya ;   et al.
2007-09-20
Substrate Processing Method And Material For Electronic Device
App 20070204959 - NAKANISHI; Toshio ;   et al.
2007-09-06
Substrate processing method and material for electronic device
Grant 7,250,375 - Nakanishi , et al. July 31, 2
2007-07-31
Substrate processing method
Grant 7,232,772 - Matsuyama , et al. June 19, 2
2007-06-19
Nitriding Method Of Gate Oxide Film
App 20070134895 - Matsuyama; Seijii ;   et al.
2007-06-14
Substrate processing method
Grant 7,226,874 - Matsuyama , et al. June 5, 2
2007-06-05
Process for producing materials for electronic device
Grant 7,217,659 - Sugawara , et al. May 15, 2
2007-05-15
Forming method and forming system for insulation film
App 20070085154 - Murakawa; Shigemi ;   et al.
2007-04-19
Plasma processing method and computer storage medium
App 20070059944 - Matsuyama; Seiji ;   et al.
2007-03-15
Forming system for insulation film
Grant 7,166,185 - Murakawa , et al. January 23, 2
2007-01-23
Plasma processing method
App 20060269694 - Honda; Minoru ;   et al.
2006-11-30
Method of modifying insulating film
App 20060199398 - Sugawara; Takuya ;   et al.
2006-09-07
Plasma processing apparatus and plasma processing method
App 20060156984 - Nozawa; Toshihisa ;   et al.
2006-07-20
Rotor for dynamo-electric machine
Grant 7,053,515 - Nakanishi , et al. May 30, 2
2006-05-30
Substrate processing method
App 20060024864 - Nakanishi; Toshio ;   et al.
2006-02-02
Method for forming underlying insulation film
App 20050255711 - Sugawara, Takuya ;   et al.
2005-11-17
Method for producing material of electronic device
App 20050233599 - Sugawara, Takuya ;   et al.
2005-10-20
Rotor for dynamo-electric machine
App 20050218744 - Nakanishi, Toshio ;   et al.
2005-10-06
Plasma processing apparatus and plasma processing method
App 20050205013 - Nakanishi, Toshio ;   et al.
2005-09-22
Substrate processing method
App 20050176223 - Matsuyama, Seijii ;   et al.
2005-08-11
Process for producing materials for electronic device
App 20050176263 - Sugawara, Takuya ;   et al.
2005-08-11
Method for forming insulation film
App 20050161434 - Sugawara, Takuya ;   et al.
2005-07-28
Substrate processing method
App 20050153570 - Matsuyama, Seijii ;   et al.
2005-07-14
Method of producing electronic device material
Grant 6,897,149 - Sugawara , et al. May 24, 2
2005-05-24
Forming method and forming system for insulation film
App 20040245584 - Murakawa, Shigemi ;   et al.
2004-12-09
Production method and production device for semiconductor device
App 20040241968 - Murakawa, Shigemi ;   et al.
2004-12-02
Base method treating method and electron device-use material
App 20040235311 - Nakanishi, Toshio ;   et al.
2004-11-25
Method for producing material of electronic device
App 20040142577 - Sugawara, Takuya ;   et al.
2004-07-22
Method of producing electronic device material
App 20040048452 - Sugawara, Takuya ;   et al.
2004-03-11
Apparatus and method for microwave plasma process
Grant 6,290,807 - Matsumoto , et al. September 18, 2
2001-09-18
Apparatus and method for microwave plasma process
Grant 6,076,484 - Matsumoto , et al. June 20, 2
2000-06-20
Electronic game housing
Grant D406,613 - Nakanishi March 9, 1
1999-03-09
Electrostatic chuck and the method of operating the same
Grant 5,815,366 - Morita , et al. September 29, 1
1998-09-29
Electronic device package
Grant 5,255,160 - Iwatare , et al. October 19, 1
1993-10-19
Method of manufacturing artificial wood veneer
Grant 4,388,133 - Hirao , et al. June 14, 1
1983-06-14

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed