Nakamura; Satomi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakamura; Satomi.The latest application filed is for "rotary operation type electronic component".

Company Profile

0.8.6

Nakamura; Satomi - Kanagawa JP
Nakamura; Satomi - Yokohama N/A JP
Nakamura; Satomi - Yokohama-shi JP
Nakamura; Satomi - Kobe JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Rotary operation type electronic component Grant 9,741,511 - Fukushima , et al. August 22, 2	2017-08-22
Rotary Operation Type Electronic Component App 20160020044 - FUKUSHIMA; Hajime ; et al.	2016-01-21
Original plate evaluation method, computer readable storage medium, and original plate manufacturing method Grant 8,438,527 - Nakamura , et al. May 7, 2	2013-05-07
Original Plate Evaluation Method, Computer Readable Storage Medium, And Original Plate Manufacturing Method App 20130055172 - Nakamura; Satomi ; et al.	2013-02-28
Case for variable resistor Grant D665,752 - Fukushima , et al. August 21, 2	2012-08-21
Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device Grant 7,799,510 - Ogawa , et al. September 21, 2	2010-09-21
Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device Grant 7,767,364 - Ogawa , et al. August 3, 2	2010-08-03
Method For Correcting Mask Pattern, Photomask, Method For Fabricating Photomask, Electron Beam Writing Method For Fabricating Photomask, Exposure Method, Semiconductor Device, And Method For Fabricating Semiconductor Device App 20100038798 - Ogawa; Kazuhisa ; et al.	2010-02-18
Mask pattern generating method Grant 7,541,117 - Ogawa , et al. June 2, 2	2009-06-02
Mask Pattern Generating Method App 20070283313 - Ogawa; Kazuhisa ; et al.	2007-12-06
Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device App 20060134532 - Ogawa; Kazuhisa ; et al.	2006-06-22
Back washing device Grant D480,177 - Isono , et al. September 30, 2	2003-09-30

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