loadpatents
Patent applications and USPTO patent grants for Nakamura; Morio.The latest application filed is for "semiconductor device".
Patent | Date |
---|---|
Semiconductor device Grant 7,948,088 - Saito , et al. May 24, 2 | 2011-05-24 |
Semiconductor Device App 20090174080 - Saito; Toshio ;   et al. | 2009-07-09 |
Process for preparing water-absorbent resin Grant 6,573,330 - Fujikake , et al. June 3, 2 | 2003-06-03 |
High frequency semiconductor device Grant 6,166,436 - Maeda , et al. December 26, 2 | 2000-12-26 |
Package and semiconductor device Grant 5,901,042 - Ota , et al. May 4, 1 | 1999-05-04 |
Process for producing cross-linked polymer containing carboxyl group Grant 5,629,395 - Fujikake , et al. May 13, 1 | 1997-05-13 |
Method for production of alkylene oxide polymers Grant 5,326,852 - Fujikake , et al. July 5, 1 | 1994-07-05 |
Process for production of water-absorbent resin Grant 5,180,798 - Nakamura , et al. January 19, 1 | 1993-01-19 |
Water retention material with water-absorbency Grant 5,075,373 - Takemori , et al. December 24, 1 | 1991-12-24 |
Process for producing a water-absorbent resin Grant 4,880,888 - Obayashi , et al. November 14, 1 | 1989-11-14 |
Process for producing a water-absorbent resin Grant 4,683,274 - Nakamura , et al. July 28, 1 | 1987-07-28 |
Water-swellable elastomer composition Grant 4,590,227 - Nakamura , et al. May 20, 1 | 1986-05-20 |
Water-absorbent resin having improved water-absorbency and improved water-dispersibility and process for producing same Grant 4,541,871 - Obayashi , et al. * September 17, 1 | 1985-09-17 |
Water-absorbent resin having improved water-absorbency and improved water-dispersibility and process for producing same Grant 4,507,438 - Obayashi , et al. March 26, 1 | 1985-03-26 |
Alkali metal acrylate or ammonium acrylate polymer excellent in salt solution-absorbency and process for producing same Grant 4,340,706 - Obayashi , et al. July 20, 1 | 1982-07-20 |
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