Nakagawa; Hisashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nakagawa; Hisashi.The latest application filed is for "radiation-sensitive composition and pattern-forming method".

Company Profile

7.29.48

Nakagawa; Hisashi - Tokyo JP
Nakagawa; Hisashi - Tokyo-to N/A JP
Nakagawa; Hisashi - Tsukuba JP
Nakagawa; Hisashi - Belmont MA
Nakagawa; Hisashi - Ibaraki JP
Nakagawa; Hisashi - Tsukuba-shi JP
Nakagawa; Hisashi - Ibaraki-ken JP
Nakagawa; Hisashi - Tsukiba-shi JP
Nakagawa; Hisashi - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent Grant 11,204,552 - Nagai , et al. December 21, 2	2021-12-21
Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof Grant 11,079,676 - Asano , et al. August 3, 2	2021-08-03
Radiation-sensitive Composition And Pattern-forming Method App 20200356000 - MINEGISHI; Shinya ; et al.	2020-11-12
Pattern-forming method Grant 10,725,376 - Nakagawa , et al.	2020-07-28
Radiation-sensitive Composition And Resist Pattern-forming Method App 20200166840 - NAKAGAWA; Hisashi ; et al.	2020-05-28
Radiation-sensitive Composition, Pattern-forming Method And Radiation-sensitive Acid Generating Agent App 20200041902 - NAGAI; Tomoki ; et al.	2020-02-06
Radiation-sensitive Composition And Resist Pattern-forming Method App 20200041898 - NAKAGAWA; Hisashi ; et al.	2020-02-06
Radiation-sensitive Composition And Pattern-forming Method App 20200004144 - NAKAGAWA; Hisashi ; et al.	2020-01-02
Pattern-forming method Grant 10,520,815 - Naruoka , et al. Dec	2019-12-31
Radiation-sensitive Composition And Pattern-forming Method App 20190354010 - MINEGISHI; Shinya ; et al.	2019-11-21
Radiation-sensitive Composition, Pattern-forming Method And Metal Oxide App 20190310551 - MINEGISHI; Shinya ; et al.	2019-10-10
Radiation-sensitive Composition, Pattern-forming Method, And Metal-containing Resin And Production Method Thereof App 20190310552 - ASANO; Yusuke ; et al.	2019-10-10
Composition and method of forming pattern using composition Grant 10,209,619 - Nakagawa , et al. Feb	2019-02-19
Chemically amplified resist material and resist pattern-forming method Grant 10,120,282 - Nakagawa , et al. November 6, 2	2018-11-06
Inorganic film-forming composition for multilayer resist processes, and pattern-forming method Grant 10,090,163 - Nakagawa , et al. October 2, 2	2018-10-02
Radiation-sensitive Composition, Pattern-forming Method And Radiation-sensitive Acid Generating Agent App 20180267406 - NAGAI; Tomoki ; et al.	2018-09-20
Resist-pattern-forming method and chemically amplified resist material Grant 10,073,348 - Nakagawa , et al. September 11, 2	2018-09-11
Chemically amplified resist material, pattern-forming method, compound, and production method of compound Grant 10,073,349 - Nakagawa , et al. September 11, 2	2018-09-11
Chemically amplified resist material and resist pattern-forming method Grant 10,018,911 - Nakagawa , et al. July 10, 2	2018-07-10
Chemically amplified resist material and resist pattern-forming method Grant 9,989,849 - Nakagawa , et al. June 5, 2	2018-06-05
Pattern-forming method Grant 9,971,247 - Nakagawa , et al. May 15, 2	2018-05-15
Resist pattern-forming method Grant 9,939,729 - Nakagawa , et al. April 10, 2	2018-04-10
Pattern-forming Method App 20180017864 - NARUOKA; Takehiko ; et al.	2018-01-18
Composition For Film Formation, And Pattern-forming Method App 20170362412 - Kurita; Shunsuke ; et al.	2017-12-21
Radiation-sensitive Composition And Pattern-forming Method App 20170299962 - SHIRATANI; Motohiro ; et al.	2017-10-19
Photoresist Composition, Production Method Of Photoresist Composition, And Resist Pattern-forming Method App 20170269476 - NAKAGAWA; Hisashi ; et al.	2017-09-21
Pattern-forming Method App 20170184960 - NARUOKA; Takehiko ; et al.	2017-06-29
Pattern-forming Method App 20170184961 - NAKAGAWA; Hisashi ; et al.	2017-06-29
Chemically Amplified Resist Material And Resist Pattern-forming Method App 20170131633 - NAKAGAWA; Hisashi ; et al.	2017-05-11
Chemically Amplified Resist Material And Resist Pattern-forming Method App 20170131634 - NAKAGAWA; Hisashi ; et al.	2017-05-11
Chemically Amplified Resist Material And Resist Pattern-forming Method App 20170075221 - NAKAGAWA; Hisashi ; et al.	2017-03-16
Resist Pattern-forming Method App 20170075224 - Nakagawa; Hisashi ; et al.	2017-03-16
Resist Pattern-forming Method And Chemically Amplified Radiation-sensitive Resin Composition App 20170059992 - NAKAGAWA; Hisashi ; et al.	2017-03-02
Chemically Amplified Resist Material, Pattern-forming Method, Compound, And Production Method Of Compound App 20170052449 - NAKAGAWA; HISASHI ; et al.	2017-02-23
Pattern-forming Method App 20170052450 - NAKAGAWA; Hisashi ; et al.	2017-02-23
Resist-pattern-forming Method And Chemically Amplified Resist Material App 20170052448 - NAKAGAWA; Hisashi ; et al.	2017-02-23
Semiconductor Device Production Composition And Pattern Formation Method App 20160349616 - NAKAGAWA; Hisashi ; et al.	2016-12-01
Composition And Pattern-forming Method App 20160187777 - NAKAGAWA; Hisashi ; et al.	2016-06-30
Inorganic Film-forming Composition For Multilayer Resist Processes, And Pattern-forming Method App 20150364332 - Nakagawa; Hisashi ; et al.	2015-12-17
Composition For Film Formation, And Pattern-forming Method App 20150284539 - KURITA; Shunsuke ; et al.	2015-10-08
Method for producing substrate with metal body Grant 9,150,962 - Sakai , et al. October 6, 2	2015-10-06
Composition for forming aluminum-containing film, and method for forming aluminum-containing film Grant 9,080,065 - Nakagawa , et al. July 14, 2	2015-07-14
Method For Producing Substrate With Metal Body App 20140134331 - SAKAI; Tatsuya ; et al.	2014-05-15
Management system Grant 8,570,143 - Nakagawa , et al. October 29, 2	2013-10-29
Composition For Forming Aluminum-containing Film, And Method For Forming Aluminum-containing Film App 20130230666 - NAKAGAWA; Hisashi ; et al.	2013-09-05
Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same Grant 8,404,786 - Akiyama , et al. March 26, 2	2013-03-26
Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation Grant 8,268,403 - Akiyama , et al. September 18, 2	2012-09-18
Method of producing organosilicon compound Grant 8,093,419 - Nobe , et al. January 10, 2	2012-01-10
Management system Grant 8,089,341 - Nakagawa , et al. January 3, 2	2012-01-03
Polycarbosilane, method for producing same, silica composition for coating application, and silica film Grant 8,017,700 - Nakagawa , et al. September 13, 2	2011-09-13
Management System App 20110093928 - NAKAGAWA; Hisashi ; et al.	2011-04-21
Material For Chemical Vapor Deposition, Silicon-containing Insulating Film And Method For Production Of The Silicon-containing Insulating Film App 20110042789 - Nakagawa; Hisashi ; et al.	2011-02-24
Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device Grant 7,893,538 - Nakagawa , et al. February 22, 2	2011-02-22
Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same Grant 7,875,317 - Nakagawa , et al. January 25, 2	2011-01-25
Method For Producing Silicon Compound App 20100261925 - Nakagawa; Hisashi ; et al.	2010-10-14
Material For Forming Silicon-containing Film, And Silicon-containing Insulating Film And Method For Forming The Same App 20100174103 - Nakagawa; Hisashi ; et al.	2010-07-08
Polymer And Process For Producing The Same, Composition For Forming Insulating Film, And Insulating Film And Method Of Forming The Same App 20100168327 - AKIYAMA; Masahiro ; et al.	2010-07-01
Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same Grant 7,736,748 - Akiyama , et al. June 15, 2	2010-06-15
Film-forming Material, Silicon-containing Insulating Film And Method For Forming The Same App 20100140754 - Akiyama; Masahiro ; et al.	2010-06-10
Organic Silica Film And Method For Forming Same, Composition For Forming Insulating Film Of Semiconductor Device And Method For Producing Same, Wiring Structure And Semiconductor Device App 20100007025 - Nakagawa; Hisashi ; et al.	2010-01-14
Method Of Producing Organosilicon Compound App 20090299086 - NOBE; Youhei ; et al.	2009-12-03
Polycarbosilane, Method For Producing Same, Silica Composition For Coating Application, And Silica Film App 20090281237 - Nakagawa; Hisashi ; et al.	2009-11-12
Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film Grant 7,528,207 - Nakagawa , et al. May 5, 2	2009-05-05
Management System App 20090058594 - Nakagawa; Hisashi ; et al.	2009-03-05
Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation App 20080268264 - Akiyama; Masahiro ; et al.	2008-10-30
Polycarbosilane and method of producing the same Grant 7,358,317 - Nakagawa , et al. April 15, 2	2008-04-15
Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation App 20080038527 - Akiyama; Masahiro ; et al.	2008-02-14
Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same App 20070031687 - Akiyama; Masahiro ; et al.	2007-02-08
Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same App 20070027287 - Akiyama; Masahiro ; et al.	2007-02-01
Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film App 20070021580 - Nakagawa; Hisashi ; et al.	2007-01-25
Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same App 20070020467 - Nakagawa; Hisashi ; et al.	2007-01-25
Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film App 20070015892 - Nakagawa; Hisashi ; et al.	2007-01-18
Novel polycarbosilane and method of producing the same, film-forming composition, and film and method of forming the same App 20060134336 - Nakagawa; Hisashi ; et al.	2006-06-22
Polycarbosilane and method of producing the same App 20060063905 - Nakagawa; Hisashi ; et al.	2006-03-23
Stretch wrap film Grant 5,139,855 - Fujitani , et al. August 18, 1	1992-08-18

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