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Patent applications and USPTO patent grants for Nakagawa; Hiro-o.The latest application filed is for "halftone phase shift photomask and blank for halftone phase shift photomask".
Patent | Date |
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Photomask with dust-proofing device and exposure method using the same Grant 6,933,082 - Motonaga , et al. August 23, 2 | 2005-08-23 |
Halftone phase shift photomask and blank for halftone phase shift photomask Grant 6,869,736 - Nakagawa , et al. March 22, 2 | 2005-03-22 |
Photomask Grant 6,740,455 - Noguchi , et al. May 25, 2 | 2004-05-25 |
Halftone phase shift photomask and blank for halftone phase shift photomask App 20030186135 - Nakagawa, Hiro-o ;   et al. | 2003-10-02 |
Halftone phase shift photomask and blank for halftone phase shift photomask Grant 6,599,667 - Yusa , et al. July 29, 2 | 2003-07-29 |
Photomask with dust-proofing device and exposure method using the same App 20030087165 - Motonaga, Toshiaki ;   et al. | 2003-05-08 |
Photomask App 20020119379 - Noguchi, Kenji ;   et al. | 2002-08-29 |
Halftone phase shift photomask and blank for halftone phase shift photomask App 20020039689 - Yusa, Satoshi ;   et al. | 2002-04-04 |
Blank for halftone phase shift photomask and halftone phase shift photomask App 20010005564 - Motonaga, Toshiaki ;   et al. | 2001-06-28 |
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