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Patent applications and USPTO patent grants for Nakabeppu; Kenichi.The latest application filed is for "photoresist residue remover composition".
Patent | Date |
---|---|
Semiconductor device fabricating method and treating liquid Grant 6,890,864 - Aoki , et al. May 10, 2 | 2005-05-10 |
Photoresist residue remover composition Grant 6,787,293 - Oowada , et al. September 7, 2 | 2004-09-07 |
Photoresist residue remover composition App 20040002020 - Oowada, Takuo ;   et al. | 2004-01-01 |
Semiconductor device fabricating method and treating liquid App 20030134507 - Aoki, Hidemitsu ;   et al. | 2003-07-17 |
Semiconductor device fabricating method and treating liquid App 20030027418 - Aoki, Hidemitsu ;   et al. | 2003-02-06 |
Composition of photoresist remover effective against etching residue without damage to corrodible metal layer and process using the same App 20020146647 - Aoki, Hidemitsu ;   et al. | 2002-10-10 |
Drying apparatus and method App 20010027613 - Nakabeppu, Kenichi | 2001-10-11 |
Stripper composition and stripping method App 20010014534 - Aoki, Hidemitsu ;   et al. | 2001-08-16 |
Anticorrosive agent App 20010011515 - Aoki, Hidemitsu ;   et al. | 2001-08-09 |
Method for forming a stacked structure capacitor in a semiconductor device Grant 6,103,587 - Nakabeppu August 15, 2 | 2000-08-15 |
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