loadpatents
Patent applications and USPTO patent grants for Nagoya; Takatoshi.The latest application filed is for "silicon single crystal wafer and method for manufacturing silicon single crystal wafer, and method for evaluating silicon single crystal wafer".
Patent | Date |
---|---|
Method for evaluating oxide dielectric breakdown voltage of a silicon single crystal wafer Grant 8,551,246 - Tahara , et al. October 8, 2 | 2013-10-08 |
Silicon Single Crystal Wafer And Method For Manufacturing Silicon Single Crystal Wafer, And Method For Evaluating Silicon Single Crystal Wafer App 20110045246 - Tahara; Fumio ;   et al. | 2011-02-24 |
Method for producing annealed wafer and annealed wafer Grant 7,659,216 - Nagoya February 9, 2 | 2010-02-09 |
Method for evaluating dopant contamination of semiconductor wafer Grant 7,622,312 - Nagoya November 24, 2 | 2009-11-24 |
Method for producing annealed wafer and annealed wafer App 20090011613 - Nagoya; Takatoshi | 2009-01-08 |
Method For Evaluating Dopant Contamination Of Semiconductor Wafer App 20080108155 - Nagoya; Takatoshi | 2008-05-08 |
Method of producing annealed wafer and annealed wafer Grant 7,189,293 - Kobayashi , et al. March 13, 2 | 2007-03-13 |
Method of producing annealed wafer and annealed wafer Grant 7,153,785 - Kobayashi , et al. December 26, 2 | 2006-12-26 |
Annealed wafer manufacturing method and annealed wafer Grant 6,841,450 - Kobayashi , et al. January 11, 2 | 2005-01-11 |
Production method for anneal wafer and anneal wafer App 20040231759 - Kobayashi, Norihiro ;   et al. | 2004-11-25 |
Method for manufacturing single-crystal-silicon wafers Grant 6,805,743 - Kobayashi , et al. October 19, 2 | 2004-10-19 |
Production method for anneal wafer and anneal wafer App 20040192071 - Kobayashi, Norihiro ;   et al. | 2004-09-30 |
Production method for annealed wafer Grant 6,670,261 - Akiyama , et al. December 30, 2 | 2003-12-30 |
Method for manufacturing single-crystal-silicon wafers App 20030164139 - Kobayashi, Norihiro ;   et al. | 2003-09-04 |
Method of producing anneal wafer and anneal wafer App 20020173173 - Kobayashi, Norihiro ;   et al. | 2002-11-21 |
Production method for annealed wafer App 20020160591 - Akiyama, Shoji ;   et al. | 2002-10-31 |
Apparatus for growing silicon epitaxial layer Grant 5,487,358 - Ohta , et al. January 30, 1 | 1996-01-30 |
Process for growing silicon epitaxial layer Grant 5,421,288 - Ohta , et al. June 6, 1 | 1995-06-06 |
Pattern shift measuring method Grant 5,156,982 - Nagoya October 20, 1 | 1992-10-20 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.