Nagaiwa; Toshifumi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nagaiwa; Toshifumi.The latest application filed is for "cleaning method and plasma processing apparatus".

Company Profile

0.10.14

Nagaiwa; Toshifumi - Hsin-chu TW
NAGAIWA; Toshifumi - Hsin-chu City TW
Nagaiwa; Toshifumi - Miyagi JP
Nagaiwa; Toshifumi - Nirasaki JP
NAGAIWA; Toshifumi - Kurokawa-gun JP
Nagaiwa; Toshifumi - Dresden DE
Nagaiwa; Toshifumi - Nirasaki City JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing method Grant 11,342,165 - Nagaiwa May 24, 2	2022-05-24
Plasma processing apparatus and method for controlling radio-frequency power supply of plasma processing apparatus Grant 11,264,208 - Nagaiwa March 1, 2	2022-03-01
Plasma processing apparatus and plasma etching method Grant 11,171,007 - Nagaiwa November 9, 2	2021-11-09
Cleaning method and plasma processing apparatus Grant 10,991,551 - Bin Budiman , et al. April 27, 2	2021-04-27
Cleaning Method And Plasma Processing Apparatus App 20200328064 - BIN BUDIMAN; Mohd Fairuz ; et al.	2020-10-15
Plasma Processing Method App 20200303170 - NAGAIWA; Toshifumi	2020-09-24
Plasma Processing Apparatus And Plasma Etching Method App 20200286737 - NAGAIWA; Toshifumi	2020-09-10
Plasma Processing Apparatus And Method For Controlling Radio-frequency Power Supply Of Plasma Processing Apparatus App 20200266035 - NAGAIWA; Toshifumi	2020-08-20
Plasma processing method Grant 10,714,318 - Nagaiwa	2020-07-14
Target Object Processing Method And Plasma Processing Apparatus App 20200144034 - Yokoyama; Seiji ; et al.	2020-05-07
Plasma Processing Method App 20190267217 - NAGAIWA; Toshifumi	2019-08-29
Processing method and storage medium Grant 9,059,103 - Shimizu , et al. June 16, 2	2015-06-16
Plasma processing method and apparatus Grant 8,277,673 - Tsujimoto , et al. October 2, 2	2012-10-02
Processing Method And Storage Medium App 20120244720 - SHIMIZU; Wataru ; et al.	2012-09-27
Method for adjusting a critical dimension in a high aspect ratio feature Grant 7,732,340 - Nagaiwa , et al. June 8, 2	2010-06-08
Focus Ring, Plasma Processing Apparatus And Plasma Processing Method App 20100041240 - TSUJIMOTO; Hiroshi ; et al.	2010-02-18
Plasma Processing Method And Apparatus App 20100025372 - Tsujimoto; Hiroshi ; et al.	2010-02-04
Plasma Processing Apparatus And Method App 20090242128 - TAGO; Kenji ; et al.	2009-10-01
Plasma Processing Apparatus And Electrode Plate, Electrode Supporting Body, And Shield Ring Thereof App 20080156441 - Ogasawara; Masahiro ; et al.	2008-07-03
Method For Adjusting A Critical Dimension In A High Aspect Ratio Feature App 20080038673 - Nagaiwa; Toshifumi ; et al.	2008-02-14
Worktable device and plasma processing apparatus for semiconductor process Grant 6,723,202 - Nagaiwa , et al. April 20, 2	2004-04-20
Plasma processing apparatus, and electrode plate, electrode supporting body, and shield ringthereof App 20030155078 - Ogasawara, Masahiro ; et al.	2003-08-21
Worktable device and plasma processing apparatus for semiconductor process App 20020029745 - Nagaiwa, Toshifumi ; et al.	2002-03-14

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