| Patent | Date |
|---|
Modification method of surface of base, composition, and polymer
Grant 11,426,761 - Komatsu , et al. August 30, 2 | 2022-08-30 |
Pattern-forming method, and composition
Grant 11,335,559 - Komatsu , et al. May 17, 2 | 2022-05-17 |
Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
Grant 11,204,552 - Nagai , et al. December 21, 2 | 2021-12-21 |
Data Processing Method, Data Processing Device, And Data Processing System
App 20210375403 - Onishi; Yuya ; et al. | 2021-12-02 |
Railcar Air Conditioning Duct
App 20210323585 - TSUNODA; Koichi ; et al. | 2021-10-21 |
Composition and pattern-forming method
Grant 10,995,173 - Namie , et al. May 4, 2 | 2021-05-04 |
Modification Method Of Surface Of Base, Composition, And Polymer
App 20200384499 - KOMATSU; Hiroyuki ; et al. | 2020-12-10 |
Pattern-forming Method, And Composition
App 20200357633 - KOMATSU; Hiroyuki ; et al. | 2020-11-12 |
Pattern-forming Method And Patterned Substrate
App 20200118819 - KOMATSU; Hiroyuki ; et al. | 2020-04-16 |
Modification Method Of Substrate Surface, And Composition And Polymer
App 20200087530 - KOMATSU; Hiroyuki ; et al. | 2020-03-19 |
Radiation-sensitive Composition, Pattern-forming Method And Radiation-sensitive Acid Generating Agent
App 20200041902 - NAGAI; Tomoki ; et al. | 2020-02-06 |
Substrate Treatment Method, Substrate Treatment System And Directed Self-assembling Material
App 20200013617 - KOMATSU; Hiroyuki ; et al. | 2020-01-09 |
Composition And Pattern-forming Method
App 20190241695 - NAMIE; Yuji ; et al. | 2019-08-08 |
Block copolymer
Grant 10,308,752 - Namie , et al. | 2019-06-04 |
Composition for base, and directed self-assembly lithography method
Grant 10,146,130 - Komatsu , et al. De | 2018-12-04 |
Pattern-forming Method, And Composition
App 20180342387 - Komatsu; Hiroyuki ; et al. | 2018-11-29 |
Chemically amplified resist material and resist pattern-forming method
Grant 10,120,282 - Nakagawa , et al. November 6, 2 | 2018-11-06 |
Radiation-sensitive Composition, Pattern-forming Method And Radiation-sensitive Acid Generating Agent
App 20180267406 - NAGAI; Tomoki ; et al. | 2018-09-20 |
Resist-pattern-forming method and chemically amplified resist material
Grant 10,073,348 - Nakagawa , et al. September 11, 2 | 2018-09-11 |
Chemically amplified resist material, pattern-forming method, compound, and production method of compound
Grant 10,073,349 - Nakagawa , et al. September 11, 2 | 2018-09-11 |
Chemically amplified resist material and resist pattern-forming method
Grant 10,018,911 - Nakagawa , et al. July 10, 2 | 2018-07-10 |
Chemically amplified resist material and resist pattern-forming method
Grant 9,989,849 - Nakagawa , et al. June 5, 2 | 2018-06-05 |
Pattern-forming method
Grant 9,971,247 - Nakagawa , et al. May 15, 2 | 2018-05-15 |
Resist pattern-forming method
Grant 9,939,729 - Nakagawa , et al. April 10, 2 | 2018-04-10 |
Photoresist Composition, Production Method Of Photoresist Composition, And Resist Pattern-forming Method
App 20170269476 - NAKAGAWA; Hisashi ; et al. | 2017-09-21 |
Composition For Base, And Directed Self-assembly Lithography Method
App 20170248847 - KOMATSU; Hiroyuki ; et al. | 2017-08-31 |
Composition for pattern formation, pattern-forming method, and block copolymer
Grant 9,738,746 - Komatsu , et al. August 22, 2 | 2017-08-22 |
Directed self-assembly composition for pattern formation and pattern-forming method
Grant 9,718,950 - Minegishi , et al. August 1, 2 | 2017-08-01 |
Block Copolymer
App 20170204216 - NAMIE; Yuji ; et al. | 2017-07-20 |
Composition for base, and directed self-assembly lithography method
Grant 9,690,192 - Komatsu , et al. June 27, 2 | 2017-06-27 |
Directed self-assembling composition for pattern formation, and pattern-forming method
Grant 9,684,235 - Namie , et al. June 20, 2 | 2017-06-20 |
Chemically Amplified Resist Material And Resist Pattern-forming Method
App 20170131634 - NAKAGAWA; Hisashi ; et al. | 2017-05-11 |
Chemically Amplified Resist Material And Resist Pattern-forming Method
App 20170131633 - NAKAGAWA; Hisashi ; et al. | 2017-05-11 |
Base Film-forming Composition, And Directed Self-assembly Lithography Method
App 20170088740 - KOMATSU; Hiroyuki ; et al. | 2017-03-30 |
Composition for pattern formation, and pattern-forming method
Grant 9,599,892 - Komatsu , et al. March 21, 2 | 2017-03-21 |
Resist Pattern-forming Method
App 20170075224 - Nakagawa; Hisashi ; et al. | 2017-03-16 |
Chemically Amplified Resist Material And Resist Pattern-forming Method
App 20170075221 - NAKAGAWA; Hisashi ; et al. | 2017-03-16 |
Composition for pattern formation, and pattern-forming method
Grant 9,587,065 - Komatsu , et al. March 7, 2 | 2017-03-07 |
Resist Pattern-forming Method And Chemically Amplified Radiation-sensitive Resin Composition
App 20170059992 - NAKAGAWA; Hisashi ; et al. | 2017-03-02 |
Chemically Amplified Resist Material, Pattern-forming Method, Compound, And Production Method Of Compound
App 20170052449 - NAKAGAWA; HISASHI ; et al. | 2017-02-23 |
Pattern-forming Method
App 20170052450 - NAKAGAWA; Hisashi ; et al. | 2017-02-23 |
Resist-pattern-forming Method And Chemically Amplified Resist Material
App 20170052448 - NAKAGAWA; Hisashi ; et al. | 2017-02-23 |
Base film-forming composition, and directed self-assembly lithography method
Grant 9,557,644 - Komatsu , et al. January 31, 2 | 2017-01-31 |
Composition for pattern formation, and pattern-forming method
Grant 9,534,135 - Komatsu , et al. January 3, 2 | 2017-01-03 |
Pattern-forming method
Grant 9,487,868 - Komatsu , et al. November 8, 2 | 2016-11-08 |
Composition For Pattern Formation, Pattern-forming Method, And Block Copolymer
App 20160293408 - KOMATSU; Hiroyuki ; et al. | 2016-10-06 |
Composition For Pattern Formation, And Pattern-forming Method
App 20150323870 - KOMATSU; Hiroyuki ; et al. | 2015-11-12 |
Composition For Base, And Directed Self-assembly Lithography Method
App 20150301445 - Komatsu; Hiroyuki ; et al. | 2015-10-22 |
Composition For Pattern Formation, And Pattern-forming Method
App 20150277223 - KOMATSU; Hiroyuki ; et al. | 2015-10-01 |
Pattern-forming Method And Directed Self-assembling Composition
App 20150252216 - MINEGISHI; Shinya ; et al. | 2015-09-10 |
Composition For Pattern Formation, And Pattern-forming Method
App 20150253671 - KOMATSU; Hiroyuki ; et al. | 2015-09-10 |
Composition For Pattern Formation, And Pattern-forming Method
App 20150253663 - KOMATSU; Hiroyuki ; et al. | 2015-09-10 |
Composition For Pattern Formation, And Pattern-forming Method
App 20150225601 - KOMATSU; Hiroyuki ; et al. | 2015-08-13 |
Pattern-forming Method
App 20150191829 - KOMATSU; Hiroyuki ; et al. | 2015-07-09 |
Base Film-forming Composition, And Directed Self-assembly Lithography Method
App 20150187581 - Komatsu; Hiroyuki ; et al. | 2015-07-02 |
Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound
Grant 9,040,221 - Osaki , et al. May 26, 2 | 2015-05-26 |
Composition For Pattern Formation And Pattern-forming Method
App 20150093508 - NAGAI; Tomoki ; et al. | 2015-04-02 |
Composition for resist underlayer film and process for producing same
Grant 8,968,458 - Konno , et al. March 3, 2 | 2015-03-03 |
Pattern-forming Method
App 20140363773 - Nakamura; Atsushi ; et al. | 2014-12-11 |
Directed Self-assembling Composition For Pattern Formation, And Pattern-forming Method
App 20140238956 - NAMIE; Yuji ; et al. | 2014-08-28 |
Composition for resist underlayer film and process for producing same
Grant 8,808,446 - Konno , et al. August 19, 2 | 2014-08-19 |
Radiation-sensitive resin composition
Grant 8,722,306 - Sakakibara , et al. May 13, 2 | 2014-05-13 |
Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device
Grant 8,647,810 - Nakahara , et al. February 11, 2 | 2014-02-11 |
Directed Self-assembly Composition For Pattern Formation And Pattern-forming Method
App 20130344249 - MINEGISHI; Shinya ; et al. | 2013-12-26 |
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, And Polymer And Compound
App 20130122426 - Osaki; Hitoshi ; et al. | 2013-05-16 |
Compound, salt, and radiation-sensitive resin composition
Grant 8,440,384 - Ebata , et al. May 14, 2 | 2013-05-14 |
Radiation-sensitive Resin Composition
App 20130095428 - KASAHARA; Kazuki ; et al. | 2013-04-18 |
Resist Pattern Formation Method
App 20120244478 - Nakamura; Atsushi ; et al. | 2012-09-27 |
Compound, polymer, and resin composition
Grant 8,273,837 - Nagai , et al. September 25, 2 | 2012-09-25 |
Method for pattern formation and resin composition for use in the method
Grant 8,211,624 - Nakamura , et al. July 3, 2 | 2012-07-03 |
Radiation-sensitive resin composition
Grant 8,206,888 - Yada , et al. June 26, 2 | 2012-06-26 |
Radiation-sensitive Resin Composition
App 20120156621 - NAKAMURA; Atsushi ; et al. | 2012-06-21 |
Resist Lower Layer Film-forming Composition, Polymer, Resist Lower Layer Film, Pattern-forming Method, And Method Of Producing Semiconductor Device
App 20120077124 - Nakahara; Kazuo ; et al. | 2012-03-29 |
Radiation-sensitive resin composition
Grant 8,026,039 - Nagai , et al. September 27, 2 | 2011-09-27 |
Polymerizable sulfonic acid onium salt and resin
Grant 7,956,142 - Nagai , et al. June 7, 2 | 2011-06-07 |
Sulfonium compound
Grant 7,897,821 - Nagai , et al. March 1, 2 | 2011-03-01 |
Compound
App 20100324329 - Nagai; Tomoki ; et al. | 2010-12-23 |
Resist Pattern Formation Method, And Resin Composition Capable Of Insolubilizing Resist Pattern
App 20100323292 - Nakamura; Atsushi ; et al. | 2010-12-23 |
Compound, polymer, and radiation-sensitive composition
Grant 7,812,105 - Nagai , et al. October 12, 2 | 2010-10-12 |
Compound, Salt, And Radiation-sensitive Resin Composition
App 20100221659 - Ebata; Takuma ; et al. | 2010-09-02 |
Method For Pattern Formation And Resin Composition For Use In The Method
App 20100190104 - Nakamura; Atsushi ; et al. | 2010-07-29 |
Radiation-sensitive Resin Composition
App 20100178608 - Sakakibara; Hirokazu ; et al. | 2010-07-15 |
Composition For Resist Underlayer Film And Process For Producing Same
App 20100151384 - Konno; Keiji ; et al. | 2010-06-17 |
Polymerizable Sulfonic Acid Onium Salt And Resin
App 20100063232 - Nagai; Tomoki ; et al. | 2010-03-11 |
Radiation-sensitive Resin Composition
App 20100040977 - Nagai; Tomoki ; et al. | 2010-02-18 |
Radiation-sensitive Resin Composition
App 20100028800 - Yada; Yuuji ; et al. | 2010-02-04 |
Resin Composition For Micropattern Formation And Method Of Micropattern Formation
App 20100009292 - Nagai; Tomoki ; et al. | 2010-01-14 |
Novel Compound, Polymer, And Resin Composition
App 20090318652 - Nagai; Tomoki ; et al. | 2009-12-24 |
Novel Compound, Polymer, and Radiation-Sensitive Composition
App 20090069521 - Nagai; Tomoki ; et al. | 2009-03-12 |
Composition For Resist Underlayer Film And Process For Producing Same
App 20090050020 - Konno; Keiji ; et al. | 2009-02-26 |
Positive type radiation-sensitive resin composition
Grant 7,488,566 - Tsuji , et al. February 10, 2 | 2009-02-10 |
Positive-tone radiation-sensitive resin composition
Grant 7,335,457 - Shimizu , et al. February 26, 2 | 2008-02-26 |
Radiation-sensitive resin composition
Grant 7,314,701 - Yokoyama , et al. January 1, 2 | 2008-01-01 |
Positive-tone radiation-sensitive resin composition
Grant 7,258,962 - Nagai , et al. August 21, 2 | 2007-08-21 |
Radiation-sensitive resin composition
Grant 7,202,016 - Miyaji , et al. April 10, 2 | 2007-04-10 |
Positive type radiation-sensitive resin composition
App 20060223010 - Tsuji; Takayuki ; et al. | 2006-10-05 |
Copolymer, polymer mixture, and radiation-sensitive resin composition
Grant 7,105,269 - Nagai , et al. September 12, 2 | 2006-09-12 |
Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition
App 20060188812 - Nagai; Tomoki ; et al. | 2006-08-24 |
Radiation-sensitive resin composition
App 20060166138 - Shimizu; Daisuke ; et al. | 2006-07-27 |
Positive-tone radiation-sensitive resin composition
App 20060078821 - Shimizu; Daisuke ; et al. | 2006-04-13 |
Positive-tone radiation-sensitive resin composition
App 20050244747 - Nagai, Tomoki ; et al. | 2005-11-03 |
Radiation-sensitive resin composition
App 20050214680 - Miyaji, Masaaki ; et al. | 2005-09-29 |
Radiation-sensitive resin composition
Grant 6,933,094 - Miyaji , et al. August 23, 2 | 2005-08-23 |
Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
Grant 6,908,722 - Ebata , et al. June 21, 2 | 2005-06-21 |
Radiation-sensitive resin composition
App 20050095527 - Yokoyama, Kenichi ; et al. | 2005-05-05 |
Carbazole derivative and chemically amplified radiation-sensitive resin composition
Grant 6,846,607 - Nagai , et al. January 25, 2 | 2005-01-25 |
Anthracene derivative and radiation-sensitive resin composition
Grant 6,830,868 - Nagai , et al. December 14, 2 | 2004-12-14 |
Radiation-sensitive resin composition
Grant 6,821,705 - Nagai , et al. November 23, 2 | 2004-11-23 |
Novel anthracene derivative and radiation-sensitive resin composition
App 20030194634 - Nagai, Tomoki ; et al. | 2003-10-16 |
Copolymer, polymer mixture, and radiation-sensitive resin composition
App 20030157423 - Nagai, Tomoki ; et al. | 2003-08-21 |
Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
App 20030113658 - Ebata, Satoshi ; et al. | 2003-06-19 |
Radiation-sensitive resin composition
App 20020192593 - Nagai, Tomoki ; et al. | 2002-12-19 |
Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
App 20020172885 - Nagai, Tomoki ; et al. | 2002-11-21 |
Radiation-sensitive resin composition
App 20020058201 - Miyaji, Masaaki ; et al. | 2002-05-16 |
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