| Patent | Date |
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Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording medium
Grant 11,353,793 - Nagahara June 7, 2 | 2022-06-07 |
Method and process for stochastic driven detectivity healing
Grant 11,163,236 - Carcasi , et al. November 2, 2 | 2021-11-02 |
Thioxanthone Derivatives, Composition Comprising the Same and Pattern Forming Method Comprising Said Composition
App 20210277017 - Wall; Christopher ; et al. | 2021-09-09 |
Light Source Device And Optical Engine
App 20210247678 - NAGAHARA; Seiji | 2021-08-12 |
Methods for sensitizing photoresist using flood exposures
Grant 11,061,332 - Carcasi , et al. July 13, 2 | 2021-07-13 |
Light source device and optical engine
Grant 11,029,591 - Nagahara June 8, 2 | 2021-06-08 |
Light source device
Grant 10,951,004 - Nagahara March 16, 2 | 2021-03-16 |
Method and Process for Stochastic Driven Defectivity Healing
App 20210048749 - Carcasi; Michael ; et al. | 2021-02-18 |
Light Source Device And Optical Engine
App 20200301156 - NAGAHARA; Seiji | 2020-09-24 |
Optical processing apparatus and substrate processing apparatus
Grant 10,747,121 - Moriya , et al. A | 2020-08-18 |
Resist Composition and Resist Pattern Forming Method
App 20200201176 - NAGAHARA; Seiji ; et al. | 2020-06-25 |
Method Of Simulating Resist Pattern, Resist Material And Method Of Optimizing Formulation Thereof, Apparatus And Recording Mediu
App 20200057371 - NAGAHARA; Seiji | 2020-02-20 |
Exposure apparatus, exposure apparatus adjustment method and storage medium
Grant 10,558,125 - Moriya , et al. Feb | 2020-02-11 |
Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes
Grant 10,534,266 - Carcasi , et al. Ja | 2020-01-14 |
Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium
Grant 10,527,948 - Nagahara , et al. J | 2020-01-07 |
Light Source Device
App 20190386455 - Nagahara; Seiji | 2019-12-19 |
Photo-sensitized chemically amplified resist (PS-CAR) simulation
Grant 10,429,745 - Carcasi , et al. O | 2019-10-01 |
Light emitting device and substrate
Grant 10,396,262 - Nagahara , et al. A | 2019-08-27 |
Exposure apparatus, exposure method and storage medium
Grant 10,274,843 - Nagahara , et al. | 2019-04-30 |
Methods For Sensitizing Photoresist Using Flood Exposures
App 20190094698 - Carcasi; Michael A. ; et al. | 2019-03-28 |
Light source apparatus with lens array
Grant 10,215,362 - Nagahara , et al. Feb | 2019-02-26 |
Light source unit and optical engine
Grant 10,133,163 - Nagahara November 20, 2 | 2018-11-20 |
Exposure apparatus, resist pattern forming method, and storage medium
Grant 10,101,669 - Nagahara , et al. October 16, 2 | 2018-10-16 |
Resist-pattern-forming method and chemically amplified resist material
Grant 10,073,348 - Nakagawa , et al. September 11, 2 | 2018-09-11 |
Chemically amplified resist material, pattern-forming method, compound, and production method of compound
Grant 10,073,349 - Nakagawa , et al. September 11, 2 | 2018-09-11 |
Substrate treatment system
Grant 10,025,190 - Nagahara , et al. July 17, 2 | 2018-07-17 |
Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
Grant 10,025,187 - Nagahara , et al. July 17, 2 | 2018-07-17 |
Optical Processing Apparatus, Coating/development Apparatus, Optical Processing Method, And Non-transitory Computer-readable Storage Medium
App 20180173103 - NAGAHARA; Seiji ; et al. | 2018-06-21 |
Optical Processing Apparatus And Substrate Processing Apparatus
App 20180164696 - MORIYA; Teruhiko ; et al. | 2018-06-14 |
Light Emitting Device And Substrate
App 20180151788 - NAGAHARA; Seiji ; et al. | 2018-05-31 |
Exposure Apparatus, Exposure Method And Storage Medium
App 20180143540 - NAGAHARA; Seiji ; et al. | 2018-05-24 |
Exposure Apparatus, Exposure Apparatus Adjustment Method And Storage Medium
App 20180136567 - MORIYA; Teruhiko ; et al. | 2018-05-17 |
Pattern-forming method
Grant 9,971,247 - Nakagawa , et al. May 15, 2 | 2018-05-15 |
Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation
App 20170242342 - Carcasi; Michael ; et al. | 2017-08-24 |
Light source apparatus and projector having light source apparatus
Grant 9,709,882 - Nagahara , et al. July 18, 2 | 2017-07-18 |
Methods And Techniques To Use With Photosensitized Chemically Amplified Resist Chemicals And Processes
App 20170192357 - Carcasi; Michael A. ; et al. | 2017-07-06 |
Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes
Grant 9,618,848 - Carcasi , et al. April 11, 2 | 2017-04-11 |
Pattern-forming Method
App 20170052450 - NAKAGAWA; Hisashi ; et al. | 2017-02-23 |
Chemically Amplified Resist Material, Pattern-forming Method, Compound, And Production Method Of Compound
App 20170052449 - NAKAGAWA; HISASHI ; et al. | 2017-02-23 |
Resist-pattern-forming Method And Chemically Amplified Resist Material
App 20170052448 - NAKAGAWA; Hisashi ; et al. | 2017-02-23 |
Substrate Treatment System
App 20170031245 - NAGAHARA; Seiji ; et al. | 2017-02-02 |
Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)
Grant 9,519,227 - Carcasi , et al. December 13, 2 | 2016-12-13 |
Photosensitization Chemical-amplification Type Resist Material, Method For Forming Pattern Using Same, Semiconductor Device, Mask For Lithography, And Template For Nanoimprinting
App 20160357103 - NAGAHARA; Seiji ; et al. | 2016-12-08 |
Light source device, and optical engine in which light source device is used
Grant 9,500,936 - Nagahara November 22, 2 | 2016-11-22 |
Exposure Apparatus, Resist Pattern Forming Method, And Storage Medium
App 20160327869 - NAGAHARA; Seiji ; et al. | 2016-11-10 |
Light source unit and optical engine
Grant 9,459,520 - Nagahara , et al. October 4, 2 | 2016-10-04 |
Light Source Apparatus
App 20160186958 - Nagahara; Seiji ; et al. | 2016-06-30 |
Light Source Apparatus And Projector Having Light Source Apparatus
App 20160062224 - NAGAHARA; Seiji ; et al. | 2016-03-03 |
Methods and Techniques to use with Photosensitized Chemically Amplified Resist Chemicals and Processes
App 20150241783 - CARCASI; Michael A. ; et al. | 2015-08-27 |
Metrology For Measurement Of Photosensitizer Concentration Within Photo-sensitized Chemically-amplified Resist (ps-car)
App 20150241793 - CARCASI; Michael A. ; et al. | 2015-08-27 |
Light Source Unit And Optical Engine
App 20150036106 - NAGAHARA; Seiji | 2015-02-05 |
Light Source Unit And Optical Engine
App 20150036107 - NAGAHARA; Seiji ; et al. | 2015-02-05 |
Light Source Device, And Optical Engine In Which Light Source Device Is Used
App 20140375970 - NAGAHARA; Seiji | 2014-12-25 |
Pattern verifying method, pattern verifying device, program, and manufacturing method of semiconductor device
Grant 8,397,182 - Nagahara March 12, 2 | 2013-03-12 |
Pattern verifying method, pattern verifying device, program, and manufacturing method of semiconductor device
App 20090298205 - Nagahara; Seiji | 2009-12-03 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
Grant 7,534,554 - Nagahara , et al. May 19, 2 | 2009-05-19 |
Process For Forming A Pattern Including On A Semiconductor Device
App 20090075482 - NAGAHARA; Seiji ; et al. | 2009-03-19 |
Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process
Grant 7,479,361 - Nagahara , et al. January 20, 2 | 2009-01-20 |
Exposure apparatus
Grant 7,440,077 - Nagahara October 21, 2 | 2008-10-21 |
Chemically Amplified Resist Composition And Manufacturing Method Of Semiconductor Integrated Circuit Device With Such Chemically Amplified Resist Composition
App 20080233518 - Nagahara; Seiji ; et al. | 2008-09-25 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
Grant 7,396,633 - Nagahara , et al. July 8, 2 | 2008-07-08 |
Semiconductor device and method of manufacturing the same
Grant 7,217,654 - Nagahara , et al. May 15, 2 | 2007-05-15 |
Semiconductor device and method of manufacturing the same
App 20070096331 - Nagahara; Seiji ; et al. | 2007-05-03 |
Exposure apparatus
App 20060152695 - Nagahara; Seiji | 2006-07-13 |
Semiconductor device and method of manufacturing the same
App 20050124168 - Nagahara, Seiji ; et al. | 2005-06-09 |
Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
App 20040259029 - Nagahara, Seiji ; et al. | 2004-12-23 |
Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process
App 20040259373 - Nagahara, Seiji ; et al. | 2004-12-23 |
Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrate
Grant 6,800,551 - Nagahara , et al. October 5, 2 | 2004-10-05 |
Method of forming wiring structure by using photo resist having optimum development rate
Grant 6,774,028 - Nagahara August 10, 2 | 2004-08-10 |
Semiconductor device and method of manufacturing the same
App 20030170993 - Nagahara, Seiji ; et al. | 2003-09-11 |
Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition , and semiconductor substrate
App 20030157806 - Nagahara, Seiji ; et al. | 2003-08-21 |
Method Of Forming Wiring Structure By Using Photo Resist Having Optimum Development Rate
App 20020192945 - Nagahara, Seiji | 2002-12-19 |
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