Myers; David W.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Myers; David W..The latest application filed is for "very narrow band, two chamber, high rep-rate gas discharge laser system".
- Myers; David W. - Poway CA
- Myers; David W. - Livermore CA
- Myers; David W. - Minneapolis MN
| Patent | Date |
|---|---|
| Very narrow band, two chamber, high rep-rate gas discharge laser system Grant 7,567,607 - Knowles , et al. July 28, 2 | 2009-07-28 |
| EUV light source Grant 7,323,703 - Oliver , et al. January 29, 2 | 2008-01-29 |
| LPP EUV light source Grant 7,317,196 - Partlo , et al. January 8, 2 | 2008-01-08 |
| Line selected F.sub.2 two chamber laser system Grant 7,218,661 - Knowles , et al. May 15, 2 | 2007-05-15 |
| EUV light source Grant 7,164,144 - Partlo , et al. January 16, 2 | 2007-01-16 |
| EUV light source collector erosion mitigation Grant 7,141,806 - Partlo , et al. November 28, 2 | 2006-11-28 |
| Very narrow band, two chamber, high rep-rate gas discharge laser system App 20060126697 - Knowles; David S. ; et al. | 2006-06-15 |
| Very narrow band, two chamber, high rep-rate gas discharge laser system Grant 7,061,961 - Knowles , et al. June 13, 2 | 2006-06-13 |
| Line selected F2 two chamber laser system Grant 7,058,107 - Knowles , et al. June 6, 2 | 2006-06-06 |
| Very Narrow Band, Two Chamber, High Rep-rate Gas Discharge Laser System App 20050271109 - Knowles, David S. ; et al. | 2005-12-08 |
| EUV light source App 20050199829 - Partlo, William N. ; et al. | 2005-09-15 |
| Line selected F2 two chamber laser system App 20040258122 - Knowles, David S. ; et al. | 2004-12-23 |
| Line selected F2 two chamber laser system Grant 6,801,560 - Knowles , et al. October 5, 2 | 2004-10-05 |
| Line selected F2 two chamber laser system App 20040174919 - Knowles, David S. ; et al. | 2004-09-09 |
| Very narrow band, two chamber, high reprate gas discharge laser system App 20040047385 - Knowles, David S. ; et al. | 2004-03-11 |
| Very narrow band, two chamber, high rep rate gas discharge laser system Grant 6,625,191 - Knowles , et al. September 23, 2 | 2003-09-23 |
| Very narrow band, two chamber, high rep rate gas discharge laser system Grant 6,567,450 - Myers , et al. May 20, 2 | 2003-05-20 |
| Line selected F2 two chamber laser system App 20020154671 - Knowles, David S. ; et al. | 2002-10-24 |
| Very narrow band, two chamber, high rep rate gas discharge laser system App 20020154668 - Knowles, David S. ; et al. | 2002-10-24 |
| Very narrow band, two chamber, high rep rate gas discharge laser system App 20020044586 - Myers, David W. ; et al. | 2002-04-18 |
| Reliable modular production quality narrow-band high REP rate excimer laser Grant 6,128,323 - Myers , et al. October 3, 2 | 2000-10-03 |
| Portable gas chromatograph-mass spectrometer Grant 5,525,799 - Andresen , et al. June 11, 1 | 1996-06-11 |
| Portable mass spectrometer with one or more mechanically adjustable electrostatic sectors and a mechanically adjustable magnetic sector all mounted in a vacuum chamber Grant 5,153,433 - Andresen , et al. October 6, 1 | 1992-10-06 |
| Method for film thickness and refractive index determination Grant 4,909,631 - Tan , et al. March 20, 1 | 1990-03-20 |
| Absorption measurements of materials Grant 4,857,738 - Myers , et al. August 15, 1 | 1989-08-15 |
| Golf club head Grant D246,541 - Myers November 29, 1 | 1977-11-29 |
| SEC | 0001794845 | Myers David W. |
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