Musselman; Marcus

Patent Applications and Registrations

Patent applications and USPTO patent grants for Musselman; Marcus.The latest application filed is for "method of etch model calibration using optical scatterometry".

Company Profile

10.8.9

Musselman; Marcus - Oakland CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Etch Model Calibration Using Optical Scatterometry App 20210216695 - Feng; Ye ; et al.	2021-07-15
Methods and systems for controlling wafer fabrication process Grant 11,056,405 - Musselman July 6, 2	2021-07-06
Systems and methods for calibrating scalar field contribution values for a limited number of sensors including a temperature value of an electrostatic chuck and estimating temperature distribution profiles based on calibrated values Grant 11,029,668 - Musselman , et al. June 8, 2	2021-06-08
Systems and methods for performing edge ring characterization Grant 11,011,353 - Musselman , et al. May 18, 2	2021-05-18
Method of etch model calibration using optical scatterometry Grant 10,997,345 - Feng , et al. May 4, 2	2021-05-04
System and method for determining field non-uniformities of a wafer processing chamber using a wafer processing parameter Grant 10,763,142 - Musselman , et al. Sep	2020-09-01
Method Of Etch Model Calibration Using Optical Scatterometry App 20200218844 - Feng; Ye ; et al.	2020-07-09
Methods and Systems for Controlling Wafer Fabrication Process App 20200091017 - Musselman; Marcus	2020-03-19
Method of etch model calibration using optical scatterometry Grant 10,572,697 - Feng , et al. Feb	2020-02-25
Systems And Methods For Calibrating Scalar Field Contribution Values For A Limited Number Of Sensors Including A Temperature Val App 20190332094 - MUSSELMAN; Marcus ; et al.	2019-10-31
Method Of Etch Model Calibration Using Optical Scatterometry App 20190311083 - Feng; Ye ; et al.	2019-10-10
Systems and methods for calibrating scalar field contribution values for a limited number of sensors including a temperature value of an electrostatic chuck and estimating temperature distribution profiles based on calibrated values Grant 10,386,821 - Musselman , et al. A	2019-08-20
Systems and methods for aligning measurement device in substrate processing systems Grant 10,312,121 - Musselman , et al.	2019-06-04
Systems And Methods For Performing Edge Ring Characterization App 20170287682 - Musselman; Marcus ; et al.	2017-10-05
Systems And Methods For Aligning Measurement Device In Substrate Processing Systems App 20170287753 - Musselman; Marcus ; et al.	2017-10-05
System And Method For Determining Field Non-uniformities Of A Wafer Processing Chamber Using A Wafer Processing Parameter App 20160370796 - Musselman; Marcus ; et al.	2016-12-22
Systems And Methods For Calibrating Scalar Field Contribution Values For A Limited Number Of Sensors Including A Temperature Value Of An Electrostatic Chuck And Estimating Temperature Distribution Profiles Based On Calibrated Values App 20160370795 - Musselman; Marcus ; et al.	2016-12-22

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