loadpatents
name:-0.0098931789398193
name:-0.010711908340454
name:-0.0014200210571289
Murray; Mark P. Patent Filings

Murray; Mark P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Murray; Mark P..The latest application filed is for "full removal of dual damascene metal level".

Company Profile
0.6.5
  • Murray; Mark P. - Stowe VT
  • Murray; Mark P. - Burlington VT
  • Murray; Mark P. - Essex Junction VT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Full Removal Of Dual Damascene Metal Level
App 20070275565 - Cooney; Edward C. III ;   et al.
2007-11-29
Slurry and use thereof for polishing
Grant 7,052,625 - Chamberlin , et al. May 30, 2
2006-05-30
Single and multilevel rework
Grant 6,982,227 - Cooney, III , et al. January 3, 2
2006-01-03
Full Removal Of Dual Damascene Metal Level
App 20040245636 - Cooney, Edward C III ;   et al.
2004-12-09
Single and multilevel rework
App 20040142565 - Cooney, Edward C. III ;   et al.
2004-07-22
Single and multilevel rework
Grant 6,674,168 - Cooney, III , et al. January 6, 2
2004-01-06
Interconnection structure and method for fabricating same
Grant 6,653,737 - Horak , et al. November 25, 2
2003-11-25
Interconnection structure and method for fabricating same
App 20020142581 - Horak, David V. ;   et al.
2002-10-03
Interconnection structure and method for fabricating same
Grant 6,436,814 - Horak , et al. August 20, 2
2002-08-20
Slurry and use thereof for polishing
App 20010013506 - Chamberlin, Timothy Scott ;   et al.
2001-08-16
Combined chemical mechanical polishing and reactive ion etching process
Grant 6,221,775 - Ference , et al. April 24, 2
2001-04-24
Company Registrations
SEC0001394202Murray Mark P

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