Murella; Krishna P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Murella; Krishna P..The latest application filed is for "low oxide trench dishing chemical mechanical polishing".

Company Profile

16.11.21

Murella; Krishna P. - Phoenix AZ
Murella; Krishna P. - Tempe AZ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives Grant 11,326,076 - Shi , et al. May 10, 2	2022-05-10
Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing Grant 11,254,839 - Shi , et al. February 22, 2	2022-02-22
Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process Grant 11,180,678 - Shi , et al. November 23, 2	2021-11-23
Low Oxide Trench Dishing Chemical Mechanical Polishing App 20210324270 - Shi; Xiaobo ; et al.	2021-10-21
Low Oxide Trench Dishing Chemical Mechanical Polishing App 20210309885 - Shi; Xiaobo ; et al.	2021-10-07
Chemical mechanical planarization of films comprising elemental silicon Grant 11,111,415 - Henry , et al. September 7, 2	2021-09-07
Low oxide trench dishing chemical mechanical polishing Grant 11,078,417 - Shi , et al. August 3, 2	2021-08-03
Low oxide trench dishing chemical mechanical polishing Grant 11,072,726 - Shi , et al. July 27, 2	2021-07-27
Low Oxide Trench Dishing Shallow Trench Isolation Chemical Mechanical Planarization Polishing App 20210179890 - Shi; Xiaobo ; et al.	2021-06-17
Composite particles, method of refining and use thereof Grant 10,894,906 - Zhou , et al. January 19, 2	2021-01-19
Shallow Trench Isolation Chemical And Mechanical Polishing Slurry App 20200270479 - Rose; Joseph D. ; et al.	2020-08-27
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Low Abrasive Concentration And A Combinati App 20200239735 - Shi; Xiaobo ; et al.	2020-07-30
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (CMP) Polishing With Tunable Silicon Oxide And Silicon Nitride App 20200239736 - Shi; Xiaobo ; et al.	2020-07-30
Composite abrasive particles for chemical mechanical planarization composition and method of use thereof Grant 10,669,449 - Zhou , et al.	2020-06-02
Suppressing SiN Removal Rates And Reducing Oxide Trench Dishing For Shallow Trench Isolation (STI) Process App 20200131404 - Shi; Xiaobo ; et al.	2020-04-30
Composite Abrasive Particles for Chemical Mechanical Planarization Composition and Method of Use Thereof App 20200115590 - Zhou; Hongjun ; et al.	2020-04-16
High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dishing In Shallow Trench Isolation(STI) Chemical Mechanical Pla App 20200095502 - Shi; Xiaobo ; et al.	2020-03-26
Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions App 20200048496 - Shi; Xiaobo ; et al.	2020-02-13
Chemical Mechanical Planarization Of Films Comprising Elemental Silicon App 20200032108 - Henry; James Matthew ; et al.	2020-01-30
Low Oxide Trench Dishing Chemical Mechanical Polishing App 20200002607 - Shi; Xiaobo ; et al.	2020-01-02
Low Oxide Trench Dishing Chemical Mechanical Polishing App 20200002608 - Shi; Xiaobo ; et al.	2020-01-02
Low Oxide Trench Dishing Chemical Mechanical Polishing App 20200002574 - Shi; Xiaobo ; et al.	2020-01-02
Composite Particles, Method of Refining And Use Thereof App 20190359868 - Zhou; Hongjun ; et al.	2019-11-28
Composite particles, method of refining and use thereof Grant 10,421,890 - Zhou , et al. Sept	2019-09-24
Composite abrasive particles for chemical mechanical planarization composition and method of use thereof Grant 10,418,247 - Murella , et al. Sept	2019-09-17
Composite Particles, Method of Refining and Use Thereof App 20190127607 - Rose; Joseph D. ; et al.	2019-05-02
Composite abrasive particles for chemical mechanical planarization composition and method of use thereof Grant 10,109,493 - Zhou , et al. October 23, 2	2018-10-23
Chemical Mechanical Planarization of Films Comprising Elemental Silicon App 20180244955 - Henry; James Matthew ; et al.	2018-08-30
Composite Particles, Method of Refining and Use Thereof App 20170283673 - Zhou; Hongjun ; et al.	2017-10-05
Composite Abrasive Particles For Chemical Mechanical Planarization Composition And Method Of Use Thereof App 20170133236 - Murella; Krishna P. ; et al.	2017-05-11
Composite Abrasive Particles For Chemical Mechanical Planarization Composition and Method of Use Thereof App 20160200944 - Zhou; Hongjun ; et al.	2016-07-14
Chemical Mechanical Polishing Slurry for Reducing Corrosion and Method of Use Therefor App 20160122590 - Lew; Blake J. ; et al.	2016-05-05

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