Muraoka; Hisashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Muraoka; Hisashi.The latest application filed is for "method for purifying alkaline treatment fluid for semiconductor substrate and a purification apparatus".

Company Profile

0.15.5

Muraoka; Hisashi - Yokohama-shi JP
Muraoka; Hisashi - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method For Purifying Alkaline Treatment Fluid For Semiconductor Substrate And A Purification Apparatus App 20130174868 - Muraoka; Hisashi ; et al.	2013-07-11
Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewith Grant 6,896,927 - Muraoka May 24, 2	2005-05-24
Method and apparatus for removing organic films Grant 6,851,873 - Muraoka , et al. February 8, 2	2005-02-08
Method and apparatus for removing organic films App 20040076912 - Muraoka, Hisashi ; et al.	2004-04-22
Method of removing contamination adhered to surfaces and apparatus used therefor Grant 6,699,330 - Muraoka March 2, 2	2004-03-02
Method and apparatus for removing organic films Grant 6,696,228 - Muraoka , et al. February 24, 2	2004-02-24
Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewith App 20030138552 - Muraoka, Hisashi	2003-07-24
Method and apparatus for removing organic films App 20030108823 - Muraoka, Hisashi ; et al.	2003-06-12
Process for cleaning the interior of semiconductor substrate Grant 6,059,887 - Muraoka , et al. May 9, 2	2000-05-09
Method of and apparatus for removing metallic impurities diffused in a semiconductor substrate Grant 6,054,373 - Tomita , et al. April 25, 2	2000-04-25
Multifunctional air filter and air-circulating clean unit with the same incorporated therein Grant 5,772,738 - Muraoka June 30, 1	1998-06-30
Treatment method of cleaning surface of plastic molded item Grant 5,350,489 - Muraoka September 27, 1	1994-09-27
Surface treating cleaning method Grant 5,290,361 - Hayashida , et al. March 1, 1	1994-03-01
Apparatus for producing a semiconductor device Grant 4,587,928 - Yonezawa , et al. May 13, 1	1986-05-13
Surface-treating agent adapted for intermediate products of a semiconductor device Grant 4,339,340 - Muraoka , et al. July 13, 1	1982-07-13
Surface-treating agent adapted for intermediate products of a semiconductor device Grant 4,239,661 - Muraoka , et al. December 16, 1	1980-12-16
Method of etching a semiconductor substrate Grant 4,172,005 - Muraoka , et al. October 23, 1	1979-10-23
Apparatus for manufacturing semiconductor devices Grant 4,095,095 - Muraoka , et al. June 13, 1	1978-06-13
Method For Manufacturing A Semiconductor Photosensitive Device Grant 3,767,494 - Muraoka , et al. October 23, 1	1973-10-23

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