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name:-0.011687994003296
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Muraki; Yusuke Patent Filings

Muraki; Yusuke

Patent Applications and Registrations

Patent applications and USPTO patent grants for Muraki; Yusuke.The latest application filed is for "substrate processing method and substrate processing apparatus".

Company Profile
3.15.20
  • Muraki; Yusuke - Nirasaki JP
  • MURAKI; Yusuke - Nirasaki City JP
  • Muraki; Yusuke - Hilsboro OR
  • Muraki; Yusuke - Yamanashi JP
  • Muraki; Yusuke - Nirasaki-shi JP
  • Muraki; Yusuke - Yamanashi-Ken JP
  • Muraki; Yusuke - Hokkaido JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate processing method and substrate processing apparatus
Grant 11,328,932 - Muraki May 10, 2
2022-05-10
Substrate Processing Method And Substrate Processing Apparatus
App 20210287906 - MURAKI; Yusuke
2021-09-16
Gas phase etch with controllable etch selectivity of silicon-germanium alloys
Grant 10,923,356 - Kal , et al. February 16, 2
2021-02-16
Gas Phase Etch With Controllable Etch Selectivity Of Metals
App 20210020454 - Kal; Subhadeep ;   et al.
2021-01-21
Gas Phase Etch With Controllable Etch Selectivity Of Silicon-germanium Alloys
App 20200027741 - Kal; Subhadeep ;   et al.
2020-01-23
Modification processing method and method of manufacturing semiconductor device
Grant 9,911,596 - Morimoto , et al. March 6, 2
2018-03-06
Modification Processing Method And Method Of Manufacturing Semiconductor Device
App 20160351390 - MORIMOTO; Tamotsu ;   et al.
2016-12-01
Modification processing method and method of manufacturing semiconductor device
Grant 9,443,724 - Morimoto , et al. September 13, 2
2016-09-13
Etching method, etching apparatus, and storage medium
Grant 9,362,149 - Muraki , et al. June 7, 2
2016-06-07
Modification Processing Method And Method Of Manufacturing Semiconductor Device
App 20150357187 - MORIMOTO; Tamotsu ;   et al.
2015-12-10
Substrate stage, substrate processing apparatus and substrate processing system
Grant 9,153,465 - Odagiri , et al. October 6, 2
2015-10-06
Etching of silicon oxide film
Grant 9,105,586 - Tozawa , et al. August 11, 2
2015-08-11
Etching Method, Etching Apparatus, and Storage Medium
App 20150072533 - MURAKI; Yusuke ;   et al.
2015-03-12
Substrate processing apparatus
Grant 8,741,065 - Odagiri , et al. June 3, 2
2014-06-03
Substrate processing apparatus
Grant 8,353,986 - Sasaski , et al. January 15, 2
2013-01-15
Substrate Processing Apparatus
App 20120178263 - TOZAWA; Shigeki ;   et al.
2012-07-12
Substrate Processing Apparatus
App 20120000629 - ODAGIRI; Masaya ;   et al.
2012-01-05
Substrate Stage, Substrate Processing Apparatus And Substrate Processing System
App 20120000612 - ODAGIRI; Masaya ;   et al.
2012-01-05
Method for manufacturing semiconductor device
Grant 7,897,498 - Gale , et al. March 1, 2
2011-03-01
Gas Processing Apparatus, Gas Processing Method, And Storage Medium
App 20110035957 - Muraki; Yusuke ;   et al.
2011-02-17
Processing Method and Recording Medium
App 20100216296 - Muraki; Yusuke ;   et al.
2010-08-26
Substrate Processing Apparatus
App 20100163179 - Tozawa; Shigeki ;   et al.
2010-07-01
Thermal Processing Apparatus And Processing System
App 20090242129 - Onishi; Tadashi ;   et al.
2009-10-01
Method for Manufacturing Semiconductor Device
App 20080268655 - Gale; Glenn ;   et al.
2008-10-30
Etching of silicon oxide film
App 20080254636 - Tozawa; Shigeki ;   et al.
2008-10-16
Heat Transfer Thruster
App 20080134663 - Totani; Tsuyoshi ;   et al.
2008-06-12
Peeling-off method and reworking method of resist film
App 20070184379 - Ashigaki; Shigeo ;   et al.
2007-08-09
Substrate processing apparatus
App 20060219171 - Sasaki; Yoshiaki ;   et al.
2006-10-05
Method of manufacturing a capacitor having tantalum oxide film as an insulating film
Grant 6,797,560 - Hosoda , et al. September 28, 2
2004-09-28
Capacitor for analog circuit, and manufacturing method thereof
App 20020160577 - Hosoda, Keizo ;   et al.
2002-10-31
Method of manufacturing a capacitor having tantalum oxide film as an insulating film
App 20010055821 - Hosoda, Keizo ;   et al.
2001-12-27

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