loadpatents
Patent applications and USPTO patent grants for Muraki; Yusuke.The latest application filed is for "substrate processing method and substrate processing apparatus".
Patent | Date |
---|---|
Substrate processing method and substrate processing apparatus Grant 11,328,932 - Muraki May 10, 2 | 2022-05-10 |
Substrate Processing Method And Substrate Processing Apparatus App 20210287906 - MURAKI; Yusuke | 2021-09-16 |
Gas phase etch with controllable etch selectivity of silicon-germanium alloys Grant 10,923,356 - Kal , et al. February 16, 2 | 2021-02-16 |
Gas Phase Etch With Controllable Etch Selectivity Of Metals App 20210020454 - Kal; Subhadeep ;   et al. | 2021-01-21 |
Gas Phase Etch With Controllable Etch Selectivity Of Silicon-germanium Alloys App 20200027741 - Kal; Subhadeep ;   et al. | 2020-01-23 |
Modification processing method and method of manufacturing semiconductor device Grant 9,911,596 - Morimoto , et al. March 6, 2 | 2018-03-06 |
Modification Processing Method And Method Of Manufacturing Semiconductor Device App 20160351390 - MORIMOTO; Tamotsu ;   et al. | 2016-12-01 |
Modification processing method and method of manufacturing semiconductor device Grant 9,443,724 - Morimoto , et al. September 13, 2 | 2016-09-13 |
Etching method, etching apparatus, and storage medium Grant 9,362,149 - Muraki , et al. June 7, 2 | 2016-06-07 |
Modification Processing Method And Method Of Manufacturing Semiconductor Device App 20150357187 - MORIMOTO; Tamotsu ;   et al. | 2015-12-10 |
Substrate stage, substrate processing apparatus and substrate processing system Grant 9,153,465 - Odagiri , et al. October 6, 2 | 2015-10-06 |
Etching of silicon oxide film Grant 9,105,586 - Tozawa , et al. August 11, 2 | 2015-08-11 |
Etching Method, Etching Apparatus, and Storage Medium App 20150072533 - MURAKI; Yusuke ;   et al. | 2015-03-12 |
Substrate processing apparatus Grant 8,741,065 - Odagiri , et al. June 3, 2 | 2014-06-03 |
Substrate processing apparatus Grant 8,353,986 - Sasaski , et al. January 15, 2 | 2013-01-15 |
Substrate Processing Apparatus App 20120178263 - TOZAWA; Shigeki ;   et al. | 2012-07-12 |
Substrate Processing Apparatus App 20120000629 - ODAGIRI; Masaya ;   et al. | 2012-01-05 |
Substrate Stage, Substrate Processing Apparatus And Substrate Processing System App 20120000612 - ODAGIRI; Masaya ;   et al. | 2012-01-05 |
Method for manufacturing semiconductor device Grant 7,897,498 - Gale , et al. March 1, 2 | 2011-03-01 |
Gas Processing Apparatus, Gas Processing Method, And Storage Medium App 20110035957 - Muraki; Yusuke ;   et al. | 2011-02-17 |
Processing Method and Recording Medium App 20100216296 - Muraki; Yusuke ;   et al. | 2010-08-26 |
Substrate Processing Apparatus App 20100163179 - Tozawa; Shigeki ;   et al. | 2010-07-01 |
Thermal Processing Apparatus And Processing System App 20090242129 - Onishi; Tadashi ;   et al. | 2009-10-01 |
Method for Manufacturing Semiconductor Device App 20080268655 - Gale; Glenn ;   et al. | 2008-10-30 |
Etching of silicon oxide film App 20080254636 - Tozawa; Shigeki ;   et al. | 2008-10-16 |
Heat Transfer Thruster App 20080134663 - Totani; Tsuyoshi ;   et al. | 2008-06-12 |
Peeling-off method and reworking method of resist film App 20070184379 - Ashigaki; Shigeo ;   et al. | 2007-08-09 |
Substrate processing apparatus App 20060219171 - Sasaki; Yoshiaki ;   et al. | 2006-10-05 |
Method of manufacturing a capacitor having tantalum oxide film as an insulating film Grant 6,797,560 - Hosoda , et al. September 28, 2 | 2004-09-28 |
Capacitor for analog circuit, and manufacturing method thereof App 20020160577 - Hosoda, Keizo ;   et al. | 2002-10-31 |
Method of manufacturing a capacitor having tantalum oxide film as an insulating film App 20010055821 - Hosoda, Keizo ;   et al. | 2001-12-27 |
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