Murakami; Seishi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Murakami; Seishi.The latest application filed is for "film forming method and film forming apparatus".
- Murakami; Seishi - Yamanashi JP
- Murakami; Seishi - Nirasaki JP
- MURAKAMI; Seishi - Nirasaki City JP
- Murakami; Seishi - Yamanashi-Ken JP
- MURAKAMI; Seishi - Nirasaki-Shi JP
- Murakami, Seishi - Ishikawa JP
- Murakami; Seishi - Yokkaichi JP
- Murakami; Seishi - Kofu JP
- Murakami; Seishi - Koufu JP
| Patent | Date |
|---|---|
| Semiconductor film forming method using hydrazine-based compound gas Grant 11,348,794 - Nakamura , et al. May 31, 2 | 2022-05-31 |
| Substrate processing apparatus and substrate loading mechanism Grant 10,950,417 - Tsuda , et al. March 16, 2 | 2021-03-16 |
| Method of removing silicon oxide film Grant 10,546,753 - Yamasaki , et al. Ja | 2020-01-28 |
| Film Forming Method And Film Forming Apparatus App 20190378723 - Nakamura; Hideo ; et al. | 2019-12-12 |
| Film formation device Grant 10,221,478 - Narushima , et al. | 2019-03-05 |
| Method of Removing Silicon Oxide Film App 20190027371 - YAMASAKI; Hideaki ; et al. | 2019-01-24 |
| Substrate Processing Apparatus And Substrate Loading Mechanism App 20180366303 - TSUDA; Einosuke ; et al. | 2018-12-20 |
| Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming system Grant 9,984,892 - Kobayashi , et al. May 29, 2 | 2018-05-29 |
| Oxide Film Removing Method, Oxide Film Removing Apparatus, Contact Forming Method, And Contact Forming System App 20170338120 - Kobayashi; Takashi ; et al. | 2017-11-23 |
| Method of forming Ti film Grant 9,620,370 - Murakami , et al. April 11, 2 | 2017-04-11 |
| Method of forming contact layer Grant 9,349,642 - Murakami , et al. May 24, 2 | 2016-05-24 |
| Film Formation Device App 20160083837 - NARUSHIMA; Kensaku ; et al. | 2016-03-24 |
| Method Of Forming Ti Film App 20150179462 - MURAKAMI; Seishi ; et al. | 2015-06-25 |
| Method Of Forming Contact Layer App 20150179518 - MURAKAMI; Seishi ; et al. | 2015-06-25 |
| Processing apparatus and heater unit Grant 8,106,335 - Murakami , et al. January 31, 2 | 2012-01-31 |
| Film formation method, cleaning method and film formation apparatus Grant 8,021,717 - Murakami , et al. September 20, 2 | 2011-09-20 |
| Substrate Processing Apparatus and Substrate Mount Table Used in the Apparatus App 20100162956 - Murakami; Seishi ; et al. | 2010-07-01 |
| Processing Apparatus Using Source Gas And Reactive Gas App 20090211526 - TANAKA; Masayuki ; et al. | 2009-08-27 |
| Film Formation Method, Cleaning Method And Film Formation Apparatus App 20090142513 - MURAKAMI; Seishi ; et al. | 2009-06-04 |
| Processing Apparatus and Heater Unit App 20080302781 - Murakami; Seishi ; et al. | 2008-12-11 |
| Semiconductor processing system Grant 7,351,291 - Murakami April 1, 2 | 2008-04-01 |
| Formation of Titanium Nitride Film App 20080057344 - Murakami; Seishi ; et al. | 2008-03-06 |
| Film-forming method and apparatus using plasma CVD App 20060231032 - Murakami; Seishi ; et al. | 2006-10-19 |
| Film formation method App 20060127601 - Murakami; Seishi ; et al. | 2006-06-15 |
| Worktable device, film formation apparatus, and film formation method for semiconductor process App 20050257747 - Wakabayashi, Satoshi ; et al. | 2005-11-24 |
| Gas supply device and treating device App 20050255241 - Murakami, Seishi ; et al. | 2005-11-17 |
| Semiconductor processing system App 20030155076 - Murakami, Seishi | 2003-08-21 |
| Method for producing telomerase reverse transcriptase App 20020028496 - Murakami, Seishi ; et al. | 2002-03-07 |
| Vacuum treatment apparatus and a method for manufacturing semiconductor device therein Grant RE36,925 - Ohba , et al. October 31, 2 | 2000-10-31 |
| Method for forming a CVD film Grant 5,963,834 - Hatano , et al. October 5, 1 | 1999-10-05 |
| Barrier metal layer Grant 5,880,526 - Hatano , et al. March 9, 1 | 1999-03-09 |
| Process for producing a purified aqueous hydrogen peroxide solution Grant 5,733,521 - Minamikawa , et al. March 31, 1 | 1998-03-31 |
| Film forming and dry cleaning apparatus and method Grant 5,709,757 - Hatano , et al. January 20, 1 | 1998-01-20 |
| Liquid material supply apparatus and method Grant 5,690,743 - Murakami , et al. November 25, 1 | 1997-11-25 |
| Shower head and film forming apparatus using the same Grant 5,595,606 - Fujikawa , et al. January 21, 1 | 1997-01-21 |
| Vacuum treatment apparatus and a cleaning method therefor Grant 5,522,412 - Ohba , et al. June 4, 1 | 1996-06-04 |
| Semiconductor processing apparatus Grant 5,462,603 - Murakami October 31, 1 | 1995-10-31 |
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