| Patent | Date |
|---|
Photomask and pattern forming method employing the same
App 20080057408 - Hasegawa; Norio ; et al. | 2008-03-06 |
Photomask and pattern forming method employing the same
Grant 7,115,344 - Hasegawa , et al. October 3, 2 | 2006-10-03 |
Semiconductor device and manufacturing method thereof
Grant 6,964,832 - Moniwa , et al. November 15, 2 | 2005-11-15 |
Photomask and pattern forming method employing the same
App 20050158638 - Hasegawa, Norio ; et al. | 2005-07-21 |
Method for fabrication of patterns and semiconductor devices
Grant 6,845,497 - Murai , et al. January 18, 2 | 2005-01-18 |
Photomask and pattern forming method employing the same
App 20040161707 - Hasegawa, Norio ; et al. | 2004-08-19 |
Photomask and pattern forming method employing the same
Grant 6,733,953 - Hasegawa , et al. May 11, 2 | 2004-05-11 |
Semiconductor device and a manufacturing method of the same
Grant 6,709,880 - Yamamoto , et al. March 23, 2 | 2004-03-23 |
Semiconductor device and manufacturing method thereof
App 20030228758 - Moniwa, Akemi ; et al. | 2003-12-11 |
Method for fabrication of patterns and semiconductor devices
App 20030093767 - Murai, Fumio ; et al. | 2003-05-15 |
Semiconductor device and a manufacturing method of the same
App 20030054580 - Yamamoto, Jiro ; et al. | 2003-03-20 |
Substrate temperature control system and method for controlling temperature of substrate
Grant 6,518,548 - Sugaya , et al. February 11, 2 | 2003-02-11 |
Process for manufacturing semiconductor integrated circuit device
Grant 6,497,992 - Yunogami , et al. December 24, 2 | 2002-12-24 |
Method of manufacturing semiconductor device
App 20020175298 - Moniwa, Akemi ; et al. | 2002-11-28 |
Substrate temperature control system and method for controlling temperature of substrate
App 20020113056 - Sugaya, Masakazu ; et al. | 2002-08-22 |
Photomask and pattern forming method employing the same
App 20020102478 - Hasegawa, Norio ; et al. | 2002-08-01 |
Substrate temperature control system and method for controlling temperature of substrate
Grant 6,394,797 - Sugaya , et al. May 28, 2 | 2002-05-28 |
Photomask and pattern forming method employing the same
App 20010036583 - Hasegawa, Norio ; et al. | 2001-11-01 |
Process for manufacturing semiconductor integrated circuit device
Grant 6,057,081 - Yunogami , et al. May 2, 2 | 2000-05-02 |
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
Grant 5,557,314 - Okamoto , et al. September 17, 1 | 1996-09-17 |
Method for suppression of electrification
Grant 5,437,893 - Murai , et al. * August 1, 1 | 1995-08-01 |
Photomask and pattern forming method employing the same
Grant 5,429,896 - Hasegawa , et al. July 4, 1 | 1995-07-04 |
High-resolution lithography and semiconductor device manufacturing method
Grant 5,350,485 - Shiraishi , et al. September 27, 1 | 1994-09-27 |
Pattern forming method
Grant 5,324,550 - Yamaguchi , et al. June 28, 1 | 1994-06-28 |
Photomask and method for manufacturing semiconductor device using photomask
Grant 5,318,868 - Hasegawa , et al. June 7, 1 | 1994-06-07 |
Method for suppression of electrification
Grant 5,256,454 - Murai , et al. October 26, 1 | 1993-10-26 |
Electron beam lithography using an aperture having an array of repeated unit patterns
Grant 5,250,812 - Murai , et al. October 5, 1 | 1993-10-05 |
Radiation sensitive materials
Grant 5,061,599 - Kudo , et al. October 29, 1 | 1991-10-29 |
Electronic beam drawing apparatus
Grant 4,983,864 - Murai , et al. January 8, 1 | 1991-01-08 |
Method of forming patterns
Grant 4,403,151 - Mochiji , et al. September 6, 1 | 1983-09-06 |
Method of producing a semiconductor device
Grant 4,315,984 - Okazaki , et al. February 16, 1 | 1982-02-16 |
| 