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name:-0.022711038589478
name:-0.013062000274658
Muraguchi; Ryo Patent Filings

Muraguchi; Ryo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Muraguchi; Ryo.The latest application filed is for "silica particle dispersion liquid and production method thereof".

Company Profile
14.21.25
  • Muraguchi; Ryo - Fukuoka JP
  • MURAGUCHI; Ryo - Kitakyushu-shi Fukuoka
  • Muraguchi; Ryo - Kitakyushu JP
  • Muraguchi; Ryo - Kawasaki JP
  • MURAGUCHI; Ryo - Kawasaki-Shi JP
  • Muraguchi; Ryo - Fukuoka-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dispersion liquid of silica particles and production method therefor
Grant 11,427,730 - Egami , et al. August 30, 2
2022-08-30
Production method for dispersion liquid of silica particle
Grant 11,312,634 - Egami , et al. April 26, 2
2022-04-26
Silica particle liquid dispersion and production method therefor
Grant 11,254,580 - Egami , et al. February 22, 2
2022-02-22
Porous Silica Particles And Method For Producing Same
App 20210094835 - EGAMI; Miki ;   et al.
2021-04-01
Silica Particle Dispersion Liquid And Production Method Thereof
App 20210094833 - HAYASHI; Shogo ;   et al.
2021-04-01
Silica Particle Dispersion Liquid And Production Method Thereof
App 20210094832 - EGAMI; Miki ;   et al.
2021-04-01
Dispersion Liquid Of Silica Particles, Polishing Composition, And Method For Producing Dispersion Liquid Of Silica Particles
App 20210002513 - EGAMI; Miki ;   et al.
2021-01-07
Method For Producing Chain-like Particle Dispersion, And Dispersion Of Chain-like Particles
App 20200392385 - EGAMI; Miki ;   et al.
2020-12-17
Dispersion Liquid Of Silica Particles And Production Method Therefor
App 20200392374 - EGAMI; Miki ;   et al.
2020-12-17
Production Method For Dispersion Liquid Of Silica Particle
App 20200231451 - EGAMI; Miki ;   et al.
2020-07-23
Method for Producing Dispersion of Iron-Containing Rutile Titanium Oxide Fine Particles, Iron-Containing Rutile Titanium Oxide F
App 20200087162 - Yamaguchi; Jun ;   et al.
2020-03-19
Silica Particle Liquid Dispersion And Production Method Therefor
App 20190359491 - EGAMI; Miki ;   et al.
2019-11-28
Method for producing disintegrated silica particles
Grant 10,358,353 - Muraguchi , et al. July 23, 2
2019-07-23
Silica particle dispersion and production method of the same
Grant 10,301,183 - Egami , et al.
2019-05-28
Method of producing silica-based particles
Grant 10,239,759 - Muraguchi , et al.
2019-03-26
Silica-based polishing particle and abrasive
Grant 10,190,023 - Kumazawa , et al. Ja
2019-01-29
Silica-based polishing particle and abrasive
Grant 10,184,069 - Kumazawa , et al. Ja
2019-01-22
Method of producing silica-based particles
Grant 10,040,943 - Muraguchi , et al. August 7, 2
2018-08-07
Silica Particle Dispersion And Production Method Of The Same
App 20180179076 - EGAMI; Miki ;   et al.
2018-06-28
Silica-based Polishing Particle And Abrasive
App 20180155591 - KUMAZAWA; Mitsuaki ;   et al.
2018-06-07
Silica-based Polishing Particle And Abrasive
App 20180127627 - KUMAZAWA; Mitsuaki ;   et al.
2018-05-10
Water-repellant transparent coating-substrate assembly and process for producing the same
Grant 9,856,407 - Hakoshima , et al. January 2, 2
2018-01-02
Composition for forming a transparent coating film including hollow silica particles
Grant 9,834,663 - Sueyoshi , et al. December 5, 2
2017-12-05
Antireflective laminate
Grant 9,683,108 - Mizuno , et al. June 20, 2
2017-06-20
Method for Producing Disintegrated Silica Particles
App 20160159654 - Muraguchi; Ryo ;   et al.
2016-06-09
Antireflective Laminate
App 20160017152 - MIZUNO; Utako ;   et al.
2016-01-21
Water-Repellant Transparent Coating-Substrate Assembly and Process for Producing the Same
App 20150329755 - Hakoshima; Yuhko ;   et al.
2015-11-19
Method of Producing Hollow Silica Microparticles
App 20150259512 - Sueyoshi; Ryota ;   et al.
2015-09-17
Method Of Producing Silica-based Particles
App 20150147469 - MURAGUCHI; Ryo ;   et al.
2015-05-28
Substrate with hard coat film and coating solution for forming hard coat film comprising core-shell composite oxide surface-treated with an organic silicon compound
Grant 8,748,001 - Muraguchi , et al. June 10, 2
2014-06-10
Hollow Silica Microparticles, Compositions for Forming Transparent Coating Film Containing the Same, and Substrate Having Transparent Coating Film
App 20090286070 - Sueyoshi; Ryota ;   et al.
2009-11-19
Substrate with Hard Coat Film and Coating Solution for Forming Hard Coat Film
App 20090061183 - Muraguchi; Ryo ;   et al.
2009-03-05
Method Of Producing Silica-Based Particles, Paint For Forming Coating Film, And Substrate With Coating Film
App 20080090070 - Muraguchi; Ryo ;   et al.
2008-04-17
Silica-based particles coated with antimony oxide, method of producing the particles, and base material with a coating film including the particles
Grant 7,323,122 - Muraguchi , et al. January 29, 2
2008-01-29
Chain inorganic oxide fine particle groups
Grant 7,309,457 - Muraguchi , et al. December 18, 2
2007-12-18
Antireflection laminate
App 20060269733 - Mizuno; Utako ;   et al.
2006-11-30
Silica-based particles coated with antimony oxide, method of producing the particles, and base material with a coating film including the particles
App 20050121654 - Muraguchi, Ryo ;   et al.
2005-06-09
Chain inorganic oxide fine particle groups, process for preparing dispersion of the fine particle groups, and uses of the fine particle groups
App 20050116205 - Muraguchi, Ryo ;   et al.
2005-06-02
Process for producing semiconductor substrates
Grant 6,716,773 - Egami , et al. April 6, 2
2004-04-06
Method of forming a silica-containing coating film with a low dielectric constant and semiconductor substrate coated with such a film
Grant 6,599,846 - Komatsu , et al. July 29, 2
2003-07-29
Process for producing semiconductor substrates and semiconductor substrates
App 20030062599 - Egami, Miki ;   et al.
2003-04-03
Method of forming a silica-containing coating film with a low dielectric constant and semiconductor substrate coated with such a film
App 20020187652 - Komatsu, Michio ;   et al.
2002-12-12
Substrate flattening method and film-coated substrate made thereby
Grant 6,340,641 - Muraguchi , et al. January 22, 2
2002-01-22
Coating liquid for forming porous silica coating, coated substrate and short fiber silica
Grant 6,083,314 - Nakashima , et al. July 4, 2
2000-07-04

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