Mullee; William H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mullee; William H..The latest application filed is for "sustainable silicates and methods for their extraction".

Company Profile

0.7.6

Mullee; William H. - Ellensburg WA
Mullee; William H. - Portland OR
MULLEE, WILLIAM H - PORTLAND OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sustainable Silicates And Methods For Their Extraction App 20200399134 - Bacher; Gerhard ; et al.	2020-12-24
Purification of organic solvent fluids Grant 7,329,354 - Mullee February 12, 2	2008-02-12
Purification Of Organic Solvent Fluids App 20070084792 - Mullee; William H.	2007-04-19
Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process Grant 7,064,070 - Mullee , et al. June 20, 2	2006-06-20
Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process Grant 6,871,656 - Mullee March 29, 2	2005-03-29
Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process App 20040142564 - Mullee, William H. ; et al.	2004-07-22
Ion exchange purification of dielectric condensate precursor fluids and silicate esters such as tetraethylorthosilicate (TEOS) Grant 6,660,875 - Mullee December 9, 2	2003-12-09
Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process App 20030027085 - Mullee, William H.	2003-02-06
Purification of organic solvent fluids App 20030024883 - Mullee, William H.	2003-02-06
Removal of photoresist and residue from substrate using supercritical carbon dioxide process Grant 6,500,605 - Mullee , et al. December 31, 2	2002-12-31
Removal Of Photoresist And Photoresist Residue From Semiconductors Using Supercritical Carbon Dioxide Process App 20020048731 - MULLEE, WILLIAM H	2002-04-25
Removal of resist or residue from semiconductors using supercritical carbon dioxide Grant 6,306,564 - Mullee October 23, 2	2001-10-23
Removal of CMP residue from semiconductors using supercritical carbon dioxide process Grant 6,277,753 - Mullee , et al. August 21, 2	2001-08-21

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