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Patent applications and USPTO patent grants for Muhl; Reinhold.The latest application filed is for "process for making masks with structures in the submicron range".
Patent | Date |
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Process for making masks with structures in the submicron range Grant 5,055,383 - Koblinger , et al. October 8, 1 | 1991-10-08 |
Method of producing integrated semiconductor structures comprising field-effect transistors with channel lengths in the submicron range using a three-layer resist system Grant 4,980,317 - Koblinger , et al. December 25, 1 | 1990-12-25 |
Process of making via holes in a double-layer insulation Grant 4,816,115 - Horner , et al. March 28, 1 | 1989-03-28 |
Mask and system for mutually aligning objects in ray exposure systems Grant 4,513,203 - Bohlen , et al. April 23, 1 | 1985-04-23 |
Reverse process for making chromium masks using silicon dioxide dry etch mask Grant 4,489,146 - Bock , et al. December 18, 1 | 1984-12-18 |
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