Muellender; Stephan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Muellender; Stephan.The latest application filed is for "projection objective of a microlithographic projection exposure apparatus".

Company Profile

0.22.18

Muellender; Stephan - Aalen DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflective optical element and optical system for EUV lithography Grant 9,996,005 - Ehm , et al. June 12, 2	2018-06-12
Microlithography illumination system and microlithography illumination optical unit Grant 9,778,576 - Fiolka , et al. October 3, 2	2017-10-03
Projection objective of a microlithographic projection exposure apparatus Grant 9,720,329 - Enkisch , et al. August 1, 2	2017-08-01
Reflective optical element for EUV lithography and method of manufacturing a reflective optical element Grant 9,606,446 - Wabra , et al. March 28, 2	2017-03-28
Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective Grant 9,494,718 - Muellender , et al. November 15, 2	2016-11-15
Microlithography Illumination System And Microlithography Illumination Optical Unit App 20160195820 - Fiolka; Damian ; et al.	2016-07-07
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20160195817 - Enkisch; Hartmut ; et al.	2016-07-07
Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror Grant 9,341,958 - Enkisch , et al. May 17, 2	2016-05-17
Microlithography illumination system and microlithography illumination optical unit Grant 9,304,405 - Fiolka , et al. April 5, 2	2016-04-05
Imaging optical system and projection exposure system including the same Grant 9,285,515 - Mann , et al. March 15, 2	2016-03-15
Reflective Optical Element for EUV Lithography and Method of Manufacturing a Reflective Optical Element App 20150316851 - WABRA; Norbert ; et al.	2015-11-05
Projection objective and method for its manufacture Grant 8,944,615 - Mann , et al. February 3, 2	2015-02-03
Reflective Optical Element And Optical System For Euv Lithography App 20140199543 - EHM; Dirk Heinrich ; et al.	2014-07-17
Imaging Optical System And Projection Exposure System Including The Same App 20140132941 - Mann; Hans-Juergen ; et al.	2014-05-15
Deflection Mirror and Projection Exposure Apparatus for Microlithography Comprising Such a Deflection Mirror App 20140022525 - ENKISCH; Hartmut ; et al.	2014-01-23
Imaging optical system and projection exposure system including the same Grant 8,605,255 - Mann , et al. December 10, 2	2013-12-10
Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination Grant 8,585,224 - Ehm , et al. November 19, 2	2013-11-19
Projection objective of a microlithographic projection exposure apparatus designed forEUV and a method of optically adjusting a projection objective App 20130242278 - Enkisch; Hartmut ; et al.	2013-09-19
Optical Arrangement, In Particular Projection Exposure Apparatus For Euv Lithography, As Well As Reflective Optical Element With Reduced Contamination App 20130148200 - Ehm; Dirk Heinrich ; et al.	2013-06-13
Method for producing a multilayer coating, optical element and optical arrangement Grant 8,457,281 - Enkisch , et al. June 4, 2	2013-06-04
Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination Grant 8,382,301 - Ehm , et al. February 26, 2	2013-02-26
Mirror For The Euv Wavelength Range, Substrate For Such A Mirror, Projection Objective For Microlithography Comprising Such A Mirror Or Such A Substrate, And Projection Exposure Apparatus For Microlithography Comprising Such A Projection Objective App 20130038929 - MUELLENDER; Stephan ; et al.	2013-02-14
Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element Grant 8,164,077 - Wedowski , et al. April 24, 2	2012-04-24
Method For Producing A Multilayer Coating, Optical Element And Optical Arrangement App 20110222144 - ENKISCH; Hartmut ; et al.	2011-09-15
Microlithography Illumination System And Microlithography Illumination Optical Unit App 20110122392 - Fiolka; Damian ; et al.	2011-05-26
Imaging Optical System And Projection Exposure Installation App 20100265481 - Mann; Hans-Juergen ; et al.	2010-10-21
Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements Grant 7,763,870 - Ehm , et al. July 27, 2	2010-07-27
Projection Objective And Method For Its Manufacture App 20100149517 - Mann; Hans-Juergen ; et al.	2010-06-17
Optical Arrangement, In Particular Projection Exposure Apparatus For Euv Lithography, As Well As Reflective Optical Element With Reduced Contamination App 20090231707 - EHM; Dirk Heinrich ; et al.	2009-09-17
Projection Objective And Method For Its Manufacture App 20090015951 - Mann; Hans-Juergen ; et al.	2009-01-15
Optical System For Radiation In The Euv-wavelength Range And Method For Measuring A Contamination Status Of Euv-reflective Elements App 20080315134 - EHM; Dirk Heinrich ; et al.	2008-12-25
Projection objective and method for its manufacture Grant 7,429,116 - Mann , et al. September 30, 2	2008-09-30
Projection objective and method for its manufacture App 20050134980 - Mann, Hans-Juergen ; et al.	2005-06-23

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