loadpatents
name:-0.0087809562683105
name:-0.018335103988647
name:-0.002126932144165
Mountsier; Thomas W. Patent Filings

Mountsier; Thomas W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Mountsier; Thomas W..The latest application filed is for "high aspect ratio etch of oxide metal oxide metal stack".

Company Profile
1.15.6
  • Mountsier; Thomas W. - San Jose CA
  • Mountsier; Thomas W - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
High aspect ratio etch of oxide metal oxide metal stack
Grant 10,242,883 - Guha , et al.
2019-03-26
High Aspect Ratio Etch Of Oxide Metal Oxide Metal Stack
App 20180374712 - GUHA; Joydeep ;   et al.
2018-12-27
High aspect ratio etch with combination mask
Grant 9,659,783 - Guha , et al. May 23, 2
2017-05-23
Plasma activated conformal film deposition
Grant 9,230,800 - LaVoie , et al. January 5, 2
2016-01-05
High Aspect Ratio Etch With Combination Mask
App 20150200106 - GUHA; Joydeep ;   et al.
2015-07-16
High aspect ratio etch with combination mask
Grant 9,018,103 - Guha , et al. April 28, 2
2015-04-28
High Aspect Ratio Etch With Combination Mask
App 20150087154 - GUHA; Joydeep ;   et al.
2015-03-26
Plasma Activated Conformal Film Deposition
App 20140209562 - LaVoie; Adrien ;   et al.
2014-07-31
Plasma activated conformal film deposition
Grant 8,728,956 - LaVoie , et al. May 20, 2
2014-05-20
Diffusion barrier layers
Grant 8,053,861 - Mountsier , et al. November 8, 2
2011-11-08
Plasma Activated Conformal Film Deposition
App 20110256726 - LaVoie; Adrien ;   et al.
2011-10-20
Protection of Cu damascene interconnects by formation of a self-aligned buffer layer
Grant 8,030,777 - van Schravendijk , et al. October 4, 2
2011-10-04
Low-k b-doped SiC copper diffusion barrier films
Grant 7,842,604 - Yu , et al. November 30, 2
2010-11-30
Diffusion Barrier Layers
App 20100187693 - Mountsier; Thomas W. ;   et al.
2010-07-29
Boron-doped SIC copper diffusion barrier films
Grant 7,420,275 - Yu , et al. September 2, 2
2008-09-02
Protection of Cu damascene interconnects by formation of a self-aligned buffer layer
Grant 7,396,759 - van Schravendijk , et al. July 8, 2
2008-07-08
Low-k B-doped SiC copper diffusion barrier films
Grant 7,239,017 - Yu , et al. July 3, 2
2007-07-03
Method for patterning multilevel interconnects
Grant 6,875,699 - Lassig , et al. April 5, 2
2005-04-05
Chemical vapor deposition system including dedicated cleaning gas injection
Grant 6,200,412 - Kilgore , et al. March 13, 2
2001-03-13
High aspect ratio gapfill process by using HDP
Grant 5,872,058 - Van Cleemput , et al. February 16, 1
1999-02-16

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