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name:-0.043694019317627
name:-0.030211925506592
name:-0.013816118240356
MOTOSHIMA; Yasuyuki Patent Filings

MOTOSHIMA; Yasuyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for MOTOSHIMA; Yasuyuki.The latest application filed is for "pad-temperature regulating apparatus, and polishing apparatus".

Company Profile
13.26.39
  • MOTOSHIMA; Yasuyuki - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Pad-temperature Regulating Apparatus, And Polishing Apparatus
App 20220305617 - KAMIKI; Keisuke ;   et al.
2022-09-29
Method Of Calibrating Radiation Thermometer And System Thereof
App 20220228924 - Uozumi; Shuji ;   et al.
2022-07-21
Cleaning apparatus for heat exchanger and polishing apparatus
Grant 11,383,345 - Motoshima , et al. July 12, 2
2022-07-12
Temperature Regulating Apparatus And Polishing Apparatus
App 20220212312 - Kamiki; Keisuke ;   et al.
2022-07-07
Polishing Apparatus Having Surface-property Measuring Device Of Polishing Pad And Polishing System
App 20210370461 - KAMIKI; Keisuke ;   et al.
2021-12-02
Apparatus for cleaning substrate and substrate cleaning method
Grant 11,094,548 - Kajita , et al. August 17, 2
2021-08-17
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Polishing Pad Used In Polishing Apparatus
App 20210229235 - SONE; Tadakazu ;   et al.
2021-07-29
Polishing Apparatus
App 20210114164 - KABASAWA; Masashi ;   et al.
2021-04-22
Cleaning Apparatus For Heat Exchanger And Polishing Apparatus
App 20200306920 - Motoshima; Yasuyuki ;   et al.
2020-10-01
Cleaning Member Attaching Part, Cleaning Member Assembly And Substrate Cleaning Apparatus
App 20200276619 - UOZUMI; Shuji ;   et al.
2020-09-03
Dummy Disk, Dressing Disk, And Surface Height Measurement Method Using Dummy Disk
App 20200246936 - Kind Code
2020-08-06
Polishing method and polishing apparatus
Grant 10,710,208 - Maruyama , et al.
2020-07-14
Substrate Cleaning Device
App 20200188962 - UOZUMI; SHUJI ;   et al.
2020-06-18
Temperature Adjusting Device And Polishing Device
App 20200164480 - Motoshima; Yasuyuki
2020-05-28
Method Of Checking Leakage Of Fluid And Polishing Apparatus
App 20190389030 - Maruyama; Toru ;   et al.
2019-12-26
Substrate transfer hand
Grant 10,475,691 - Maruyama , et al. Nov
2019-11-12
Apparatus and method for regulating surface temperature of polishing pad
Grant 10,414,018 - Maruyama , et al. Sept
2019-09-17
Pad Temperature Adjustment Apparatus For Adjusting Temperature Of Polishing Pad, And Polishing Apparatus
App 20190193237 - MOTOSHIMA; Yasuyuki
2019-06-27
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Poli
App 20190168354 - SONE; Tadakazu ;   et al.
2019-06-06
Substrate Cleaning Device And Substrate Cleaning Method
App 20190164769 - KAJITA; Shinji ;   et al.
2019-05-30
Heat Exchanger For Regulating Temperature Of Polishing Surface Of Polishing Pad, Polishing Apparatus Having Such Heat Exchanger, Polishing Method For Substrate Using Such Heat Exchanger, And Computer-readable Storage Medium Storing A Program For Regulating Temperature Of Polishing Surface Of Polishi
App 20190126428 - MARUYAMA; Toru ;   et al.
2019-05-02
Polishing Method And Polishing Apparatus
App 20190118334 - MARUYAMA; Toru ;   et al.
2019-04-25
Method and apparatus for polishing a substrate
Grant 10,259,098 - Motoshima , et al.
2019-04-16
Polishing method and polishing apparatus
Grant 10,195,712 - Maruyama , et al. Fe
2019-02-05
Polishing apparatus including pad contact member with baffle in liquid flow path therein
Grant 10,099,340 - Motoshima October 16, 2
2018-10-16
Method And Apparatus For Polishing A Substrate
App 20180222007 - MOTOSHIMA; Yasuyuki ;   et al.
2018-08-09
Polishing method and polishing apparatus
Grant 10,035,238 - Maruyama , et al. July 31, 2
2018-07-31
Method and apparatus for polishing a substrate
Grant 9,969,046 - Motoshima , et al. May 15, 2
2018-05-15
Polishing Method And Polishing Apparatus
App 20180021917 - MARUYAMA; Toru ;   et al.
2018-01-25
Polishing Method And Polishing Apparatus
App 20170361420 - MARUYAMA; Toru ;   et al.
2017-12-21
Polishing method and polishing apparatus
Grant 9,782,870 - Maruyama , et al. October 10, 2
2017-10-10
Apparatus And Method For Regulating Surface Temperature Of Polishing Pad
App 20170239778 - MARUYAMA; Toru ;   et al.
2017-08-24
Polishing Apparatus
App 20170106492 - Motoshima; Yasuyuki
2017-04-20
Method and apparatus for polishing a substrate
Grant 9,579,768 - Motoshima , et al. February 28, 2
2017-02-28
Adjusting a substrate polishing condition
Grant 9,561,575 - Motoshima , et al. February 7, 2
2017-02-07
Polishing apparatus having temperature regulator for polishing pad
Grant 9,475,167 - Maruyama , et al. October 25, 2
2016-10-25
Substrate Transfer Hand
App 20160264365 - Maruyama; Toru ;   et al.
2016-09-15
Adjusting A Substrate Polishing Condition
App 20160096250 - MOTOSHIMA; Yasuyuki ;   et al.
2016-04-07
Adjusting a substrate polishing condition
Grant 9,233,448 - Motoshima , et al. January 12, 2
2016-01-12
Method And Apparatus For Polishing A Substrate
App 20150224621 - MOTOSHIMA; Yasuyuki ;   et al.
2015-08-13
Polishing Method And Polishing Apparatus
App 20150079881 - MARUYAMA; Toru ;   et al.
2015-03-19
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Polishing Pad Used In Polishing Apparatus
App 20140364040 - SONE; Tadakazu ;   et al.
2014-12-11
Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus
Grant 8,845,391 - Sone , et al. September 30, 2
2014-09-30
Substrate holding apparatus, substrate holding method, and substrate processing apparatus
Grant 8,777,198 - Sekimoto , et al. July 15, 2
2014-07-15
Polishing Method And Polishing Apparatus
App 20140127973 - MOTOSHIMA; Yasuyuki ;   et al.
2014-05-08
Method And Apparatus For Polishing A Substrate
App 20130023186 - MOTOSHIMA; Yasuyuki ;   et al.
2013-01-24
Polishing Apparatus Having Temperature Regulator For Polishing Pad
App 20120220196 - MARUYAMA; Toru ;   et al.
2012-08-30
Substrate Holding Apparatus, Substrate Holding Method, And Substrate Processing Apparatus
App 20120141246 - SEKIMOTO; Masahiko ;   et al.
2012-06-07
Substrate holding apparatus, substrate holding method, and substrate processing apparatus
Grant 8,141,513 - Sekimoto , et al. March 27, 2
2012-03-27
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Polishing Pad Used In Polishing Apparatus
App 20110159782 - SONE; Tadakazu ;   et al.
2011-06-30
Substrate Holding Apparatus, Substrate Holding Method, And Substrate Processing Apparatus
App 20110094442 - SEKIMOTO; Masahiko ;   et al.
2011-04-28
Substrate holding apparatus, substrate holding method, and substrate processing apparatus
Grant 7,886,685 - Sekimoto , et al. February 15, 2
2011-02-15
Substrate processing apparatus and substrate processing method
Grant 7,575,636 - Katsuoka , et al. August 18, 2
2009-08-18
Substrate processing apparatus and substrate processing method
Grant 7,442,257 - Katsuoka , et al. October 28, 2
2008-10-28
Substrate holding apparatus, substrate holding method, and substrate processing apparatus
App 20070070575 - Sekimoto; Masahiko ;   et al.
2007-03-29
Substrate processing apparatus and substrate processing method
App 20060243204 - Katsuoka; Seiji ;   et al.
2006-11-02
Substrate processing apparatus and substrate processing method
App 20060243205 - Katsuoka; Seiji ;   et al.
2006-11-02
Substrate processing apparatus and substrate processing method
App 20060236929 - Katsuoka; Seiji ;   et al.
2006-10-26
Substrate processing apparatus and substrate processing method
Grant 7,087,117 - Katsuoka , et al. August 8, 2
2006-08-08
Substrate processing apparatus and substrate processing method
App 20050072358 - Katsuoka, Seiji ;   et al.
2005-04-07

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